Patents Represented by Attorney Intellectual Property Law Offices
-
Patent number: 8314417Abstract: The present invention provides a memory device which has a memory element having a simple structure in which a composition layer is sandwiched between a pair of conductive layers. With this characteristic, a memory device which is involatile, easily manufactured, and additionally recordable can be provided. A memory device of the present invention has plural memory cells, plural bit lines extending in a first direction, and plural word lines extending in a second direction which is perpendicular to the first direction. Each of the plural memory cells has a memory element. The memory element comprises a first conductive layer forming the bit line, a second conductive layer forming the word line, and a composition layer to be hardened by an optical action. The composition layer is formed between a first conductive layer and a second conductive layer.Type: GrantFiled: December 1, 2005Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Ryoji Nomura, Yasuko Watanabe, Yoshitaka Moriya
-
Patent number: 8314009Abstract: A nitrogen-containing layer is formed over a semiconductor substrate; ions are added at a predetermined depth in the semiconductor substrate through the nitrogen-containing layer to form a separation layer; an insulating layer is formed over the nitrogen-containing layer; a surface of the insulating layer and a surface of a base substrate are bonded to each other; the semiconductor substrate is cleaved with the separation layer as a cleavage plane, so that single crystal semiconductor layer is formed over the base substrate with the insulating layer interposed therebetween. The ions are added by irradiating the semiconductor layer with an ion beam in a rectangular shape or a linear shape while moving the semiconductor substrate relative to the ion beam in a short side direction of the ion beam.Type: GrantFiled: September 11, 2008Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Shunpei Yamazaki
-
Patent number: 8313980Abstract: Electric characteristics and reliability of a thin film transistor are impaired by diffusion of an impurity element into a channel region. The present invention provides a thin film transistor in which aluminum atoms are unlikely to be diffused to an oxide semiconductor layer. A thin film transistor including an oxide semiconductor layer including indium, gallium, and zinc includes source or drain electrode layers in which first conductive layers including aluminum as a main component and second conductive layers including a high-melting-point metal material are stacked. An oxide semiconductor layer 113 is in contact with the second conductive layers and barrier layers including aluminum oxide as a main component, whereby diffusion of aluminum atoms to the oxide semiconductor layer is suppressed.Type: GrantFiled: March 12, 2012Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Kengo Akimoto
-
Patent number: 8313989Abstract: To provide an SOI substrate having a high mechanical strength, and a method for manufacturing the SOI substrate, a single crystal semiconductor substrate is irradiated with accelerated ions so that an embrittled region is formed in a region at a predetermined depth from a surface of the single crystal semiconductor substrate; the single crystal semiconductor substrate is bonded to a base substrate with an insulating layer interposed therebetween; the single crystal semiconductor substrate is heated to be separated along the embrittled region, so that a semiconductor layer is provided over the base substrate with the insulating layer interposed therebetween; and a surface of the semiconductor layer is irradiated with a laser beam so that at least a superficial part of the semiconductor layer is melted, whereby at least one of nitrogen, oxygen, and carbon is solid-dissolved in the semiconductor layer.Type: GrantFiled: October 16, 2009Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Hideto Ohnuma, Eiji Higa
-
Patent number: 8314010Abstract: There is provided a method of removing trap levels and defects, which are caused by stress, from a single crystal silicon thin film formed by an SOI technique. First, a single crystal silicon film is formed by using a typical bonding SOI technique such as Smart-Cut or ELTRAN. Next, the single crystal silicon thin film is patterned to form an island-like silicon layer, and then, a thermal oxidation treatment is carried out in an oxidizing atmosphere containing a halogen element, so that an island-like silicon layer in which the trap levels and the defects are removed is obtained.Type: GrantFiled: July 10, 2008Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Shunpei Yamazaki
-
Patent number: 8314018Abstract: A first embrittlement layer is formed by doping a first single-crystal semiconductor substrate with a first ion; a second embrittlement layer is formed by doping a second single-crystal semiconductor substrate with a second ion; the first and second single-crystal semiconductor substrates are bonded to each other; the first single-crystal semiconductor film is formed over the second single-crystal semiconductor substrate by a first heat treatment; an insulating substrate is bonded over the first single-crystal semiconductor film; and the first and second single-crystal semiconductor films are formed over the insulating substrate by a second heat treatment. A dose of the first ion is higher than that of the second ion and a temperature of the first heat treatment is lower than that of the second heat treatment.Type: GrantFiled: October 8, 2010Date of Patent: November 20, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Akihisa Shimomura, Naoki Okuno, Masaki Koyama, Yasuhiro Jinbo
-
Patent number: 8310650Abstract: It is an object to prevent disordered orientation of liquid crystal molecules which is due to division of substrates even when a liquid crystal dripping method is used, and to provide a method for manufacturing a liquid crystal display device in which liquid crystal is not adversely affected even when a sealant not cured and liquid crystal are in contact. In a method for manufacturing a liquid crystal display device using a liquid crystal dripping method, a scribe groove is provided for at least one of a pair of substrates with a diamond cutter or the like before the pair of substrates are attached under reduced pressure. After the scribing, the pair of substrates are attached under reduced pressure, heat treatment for curing the sealant and aligning the liquid crystal molecules is performed, and the substrates are divided by applying impact using a breaking apparatus.Type: GrantFiled: August 31, 2011Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Masahide Kanai, Takeshi Nishi
-
Patent number: 8309406Abstract: Electric characteristics of a thin film transistor including a channel formation region including a microcrystalline semiconductor are improved. The thin film transistor includes a gate electrode, a gate insulating film formed over the gate electrode, a microcrystalline semiconductor layer formed over the gate insulating film, a semiconductor layer which is formed over the microcrystalline semiconductor layer and includes an amorphous semiconductor, and a source region and a drain region which are formed over the semiconductor layer. A channel is formed in the microcrystalline semiconductor layer when the thin film transistor is placed in an on state, and the microcrystalline semiconductor layer includes an impurity element for functioning as an acceptor. The microcrystalline semiconductor layer is formed by a plasma-enhanced chemical vapor deposition method.Type: GrantFiled: December 28, 2011Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Makoto Furuno
-
Patent number: 8309429Abstract: A plurality of single crystal semiconductor substrates are arranged and then the plurality of single crystal semiconductor substrates which have been arranged are overlapped with a base substrate, so that the base substrate and the plurality of single crystal semiconductor substrates are bonded to each other. Then, each of the plurality of single crystal semiconductor substrates is separated to form a plurality of single crystal semiconductor layers over the base substrate. Next, in order to reduce crystal defects in the plurality of single crystal semiconductor layers, the plurality of single crystal semiconductor layers are irradiated with a laser beam. The plurality of single crystal semiconductor layers are thinned by being etched before or after irradiation with a laser beam.Type: GrantFiled: September 17, 2008Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Shunpei Yamazaki
-
Patent number: 8310474Abstract: When semi-amorphous TFTs are used for forming a signal line driver circuit and a pixel, a large amplitude is required for driving the pixel, and a large power supply voltage is thus needed. On the other hand, when a shift register is made up of transistors having a single conductivity, a bootstrap circuit is required, and a voltage over a power supply is applied to a specific element. Therefore, not both the driving amplitude and the reliability can be achieved with a single power supply. According to the invention, a level shifter having a single conductivity is provided to solve such a problem.Type: GrantFiled: February 17, 2009Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Jun Koyama, Keitaro Imai, Shinji Maekawa, Makoto Furuno, Osamu Nakamura, Shunpei Yamazaki
-
Patent number: 8309884Abstract: The present invention is to provide a laser irradiation apparatus for forming a laser beam which has a shape required for the annealing and which has homogeneous energy distribution, by providing a slit at an image-formation position of a diffractive optical element, wherein the slit has a slit opening whose length is changeable. The laser irradiation apparatus comprises a laser oscillator, a diffractive optical element, and a slit, wherein the slit has a slit opening whose length in a major-axis direction thereof is changeable, wherein a laser beam is delivered obliquely to a substrate, and wherein the laser beam is a continuous wave solid-state, gas, or metal laser, or a pulsed laser with a repetition frequency of 10 MHz or more.Type: GrantFiled: May 4, 2005Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Koichiro Tanaka
-
Patent number: 8310000Abstract: A nonvolatile semiconductor memory device is provided in such a manner that a semiconductor layer is formed over a substrate, a charge accumulating layer is formed over the semiconductor layer with a first insulating layer interposed therebetween, and a gate electrode is provided over the charge accumulating layer with a second insulating layer interposed therebetween. The semiconductor layer includes a channel formation region provided in a region overlapping with the gate electrode, a first impurity region for forming a source region or drain region, which is provided to be adjacent to the channel formation region, and a second impurity region provided to be adjacent to the channel formation region and the first impurity region. A conductivity type of the first impurity region is different from that of the second impurity region.Type: GrantFiled: October 25, 2011Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Tamae Takano, Shunpei Yamazaki
-
Patent number: 8310399Abstract: The invention provides a wireless chip which can secure the safety of consumers while being small in size, favorable in communication property, and inexpensive, and the invention also provides an application thereof. Further, the invention provides a wireless chip which can be recycled after being used for managing the manufacture, circulation, and retail. A wireless chip includes a layer including a semiconductor element, and an antenna. The antenna includes a first conductive layer, a second conductive layer, and a dielectric layer sandwiched between the first conductive layer and the second conductive layer, and has a spherical shape, an ovoid shape, an oval spherical shape like a go stone, an oval spherical shape like a rugby ball, or a disc shape, or has a cylindrical shape or a polygonal prism shape in which an outer edge portion thereof has a curved surface.Type: GrantFiled: February 13, 2012Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Konami Izumi
-
Patent number: 8309443Abstract: It is an object to achieve continuous crystal growth without optical interference using a compact laser irradiation apparatus. A megahertz laser beam is split and combined to crystallize a semiconductor film. At this point of time, an optical path difference is provided between the split beams to reduce optical interference. The optical path difference is set to have a length equivalent to the pulse width of the megahertz laser beam or more and less than a length equivalent to the pulse repetition interval; thus, optical interference can be suppressed with a very short optical path difference. Therefore, laser beams can be applied continuously and efficiently without energy deterioration.Type: GrantFiled: November 4, 2009Date of Patent: November 13, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Koichiro Tanaka, Hirotada Oishi
-
Patent number: 8305191Abstract: A position detection system is formed by network connection of a plurality of interrogators and a server. An RFID and the interrogators communicate wirelessly, whereby a distance from each interrogator to the RFID is searched to search a position of the RFID from the distance. In order to calculate the distance from the interrogator to the RFID, a signal is oscillated with a frequency corresponding to amplitude of a signal received in the RFID from the interrogator. A frequency of a signal oscillated in the RFID is detected in the RFID or by the interrogator, whereby a distance from the interrogator to the RFID is detected.Type: GrantFiled: May 21, 2007Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Hiroki Dembo, Yoshiyuki Kurokawa, Takayuki Inoue
-
Patent number: 8304350Abstract: A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber.Type: GrantFiled: February 12, 2010Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Hisashi Ohtani, Hiroyuki Shimada, Mitsunori Sakama, Hisashi Abe, Satoshi Teramoto
-
Patent number: 8304765Abstract: A display device includes a pixel portion in which a pixel electrode layer is arranged in a matrix, and an inverted staggered thin film transistor having a combination of at least two kinds of oxide semiconductor layers with different amounts of oxygen is provided corresponding to the pixel electrode layer. In the periphery of the pixel portion in this display device, a pad portion is provided to be electrically connected to a common electrode layer formed on a counter substrate through a conductive layer made of the same material as the pixel electrode layer. One objection of our invention to prevent a defect due to separation of a thin film in various kinds of display devices is realized, by providing a structure suitable for a pad portion provided in a display panel.Type: GrantFiled: September 10, 2009Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Kengo Akimoto, Shigeki Komori, Hideki Uochi, Rihito Wada, Yoko Chiba
-
Patent number: 8305109Abstract: An object is to obtain a desired threshold voltage of a thin film transistor using an oxide semiconductor. Another object is to suppress a change of the threshold voltage over time. Specifically, an object is to apply the thin film transistor to a logic circuit formed using a transistor having a desired threshold voltage. In order to achieve the above object, thin film transistors including oxide semiconductor layers with different thicknesses may be formed over the same substrate, and the thin film transistors whose threshold voltages are controlled by the thicknesses of the oxide semiconductor layers may be used to form a logic circuit. In addition, by using an oxide semiconductor film in contact with an oxide insulating film formed after dehydration or dehydrogenation treatment, a change in threshold voltage over time is suppressed and the reliability of a logic circuit can be improved.Type: GrantFiled: September 13, 2010Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Kenichi Okazaki, Yoshiaki Oikawa, Hotaka Maruyama, Hiromichi Godo, Shunpei Yamazaki
-
Patent number: 8305535Abstract: The present invention provides a liquid crystal display device including a liquid crystal layer disposed between a first substrate and a second substrate, a pixel electrode in a reflection region and a transmission region over the first substrate, a film for adjusting a cell gap in the reflection region over the first substrate, and an opposite electrode in the reflection region and the transmission region over the second substrate. The pixel electrode in the reflection region is provided over the film and reflects light. The pixel electrode in the transmission region transmits light. The pixel electrode in the reflection region and the transmission region includes a slit. The slit is overlapped with at least a part of a step portion which is provided by the film between the reflection region and the transmission region.Type: GrantFiled: February 29, 2012Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventor: Hajime Kimura
-
Patent number: 8304313Abstract: It is an object of the present invention to provide laser irradiation apparatus and method which can decrease the proportion of the microcrystal region in the whole irradiated region and can irradiate a semiconductor film homogeneously with a laser beam. A low-intensity part of a laser beam emitted from a laser oscillator is blocked by a slit, the laser beam is deflected by a mirror, and the beam is shaped into a desired size by using two convex cylindrical lenses. Then, the laser beam is delivered to the irradiation surface.Type: GrantFiled: August 12, 2005Date of Patent: November 6, 2012Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Koichiro Tanaka, Atsuo Isobe, Yoshiaki Yamamoto