Abstract: A method for producing micromechanical sensors for the AFM/STM/MFM profilometry is described in which a multiple step mask of cantilever beam and tip is transferred step by step into the wafer substrate by reactive ion etching. A particular highly anisotropic etching step is used for etching and shaping of the tip. This process step uses an Ar/C12 ambient at a pressure of about 100 .sup.6 bar and a self bias voltage of about 300 V DC. The ratio of pressure to self bias voltage determines the concave shape of the tip side-walls. This etching step is followed by a thermal oxidation step. The oxidation is carried out for a time until the oxidation fronts at the thinnest point of the tip shaft touch each other. A stripping process with buffered hydrofluoric acid gently removes the thermally grown oxide. The oxidation process allows--via oxidation time--a modification of tip height and angle in an extremely controllable manner.

Abstract: A scanning tunneling microscope is disclosed with the probe tip formed as an integral part of a membrane. A counter-electrode is formed on the membrane and four electrodes are provided spaced apart from the counter-electrode. The tip is scanned by means of these electrodes. Coarse positioning of the tip along the Z axis is done by applying pressure or vacuum to the membrane. Also disclosed is the method of making the scanning tunneling microscope.