Abstract: A composite objective lens for a particle beam lithographic system having deflection coils within the bore of the lens, a solenoidal excitation lens coil, a first set of two or more cylindrical pole pieces with a lens gap and a second set of cylindrical pole pieces arranged concentrically outside the first pole pieces but within the excitation lens coil. The second set of pole pieces is constructed of a high saturation material such as iron with a lens gap coextensive with the gap in the first set of pole pieces. The return flux from the deflection coils is carried by the inner cylindrical pole pieces only, while the flux generated by the lens coil is shared by both the inner and outer pole pieces. With this arrangement the linear relationship between the axial field strength and excitation current is maintained at all points along the axis of the lens, and saturation of the inner pole piece is avoided.

Abstract: Disclosed is a wafer handling device for a sputtering system where wafers, used in the manufacture of integrated circuits, are placed in a loading chamber, removed from the loading chamber and conveyed by a conveying device through a transportation chamber where they are individually picked from the conveying device by the wafer handling device and placed on a rotating table within the system sputtering chamber to be sputter processed. Concurrently within the placing of one unprocessed wafer on the rotating table, a processed wafer is picked from the rotating table and placed on a second conveying device or the same conveying device which brought unprocessed wafers to the wafer handling device for return to the loading chamber to be removed from the sputtering system for further handling and processing.

Abstract: Disclosed is a regulator circuitry (stabilizer) for controlling the output of an RF generator according to a programmable input signal. A power stage is responsive to the selected value of the programmable input signal to drive the RF generator at the desired power level. A forward power feedback control circuit monitors and controls the power output stage so that the desired RF output level is maintained at a constant level. In this particular mode of operation, RF output power is maintained constant and therefore independent of variations in gain due to temperature changes and other parameters which could effect the overall transfer function of said generator (and including mismatch of the generator into the load).

Abstract: A particle beam lithographic system and method using smaller address structure particle beam for generating masks for integrated circuit technology utilizing an electrostatic deflector system to sweep the beam in the serpentine path for increased throughput.

Abstract: A transducer assembly comprising an inner, primary, transducer having a pair of transducers fixed to a liner or cavity for providing the fluid compression sending and receiving signals for measuring the velocity and change of composition of fluid in the cavity which is being inspired and expired by a patient in a setting, such as in an intensive care unit of a hospital. The inner transducer is disposed in a heated housing to maintain the temperature of the inner transducer at a temperature above the saturation point of the fluid being measured and is further provided with (1) an acoustical absorber to prevent sound energy from the connection tubes, which connect the transducer assembly to endotracheal tubing, from adversely affecting fluid measurements and, (2) water absorbing material to prevent water, which might condense in the connecting tubing, from entering the inner transducer and affecting the fluid measurements.

Abstract: Electrical connections to thin film coatings, especially useful in a fluid flowmeter, have a conductive coating pressed against a rigid, relatively long, connector bar by conductively coated pads of elastomeric material at a selected controlled pressure, with the electrical connections to the film coating being made through the bar and pads. Utilizing this method, localized high stress areas which cause damage to the thin film are avoided, and low current densities are accomplished by the controlled contact pressure over a large area of the film coating.

Abstract: A method of depositing refractory metal silicides in a sputtering system on one or more substrates in an environment which supports a glow discharge from a pair of targets at an energy level sufficient to co-sputter and deposit the material from the targets onto the substrate(s). The method includes either a RF high voltage to be applied to one of the targets, or a DC voltage in the presence of a magnetic field to be applied to both targets so as to deposit silicon, either doped or pure, and refractory metal, either doped or pure, as the case may be, to provide a thin film of doped refractory metal silicide on the substrate(s).

Abstract: An electrostatic cassette assembly comprising, a cassette body having a central opening for receiving a wafer to be processed in a particle beam lithographic system, a charge plate with a top surface having a coating of dielectric (nonconductive) material or a plurality of nonconductive means, or both, on which the wafer is supported, means for forcing said charge plate and wafer into contact with stop means to hold the wafer rigidly in said cassette assembly, and means for applying a potential difference between the wafer and the charge plate to flatten said wafer by Coulombic force so that the wafer is held both mechanically and electrostatically in said cassette assembly. Means are also provided for insuring a good electrical contact with the wafer and for aligning the wafer in the cassette assembly.

Abstract: Disclosed is a detector for determining the location of wafers moving in a sputtering system, for example, to and from the sputtering chamber where the wafers are processed, including a capacitive transducer, located in the path of travel of the wafers, to which is coupled an oscillator supplying a constant current thereto. This current is detected by a sensor, whose output is processed and applied to a comparator. The comparator is preferably preset to supply a digital "0" when the current through the transducer is at a static or no-wafer condition, and a digital "1" when the capacity of the transducer changes due to the presence of a wafer in close proximity to the transducer which is sensed as an increase in current which is reflected as a change of voltage level applied to the comparator.

Abstract: In particle beam optical instrumentation, an array of conventional sputter ion pump cells distributed in a ring shaped array about the circumference of the volume (optical column) to be pumped. An axially symmetrical, hollow, toroid magnetic circuit, formed by axially symmetrical magnets, either of the permanent type or of the electromagnetic type (or a combination of both), is used and the pumping action is outward from the central throughbore in the column so that the bore space could be occupied by other instrumentation. The magnetic circit may be used for particle beam focusing (optical lens) as well as for the pumping action by introducing magnetic gaps in either a series or parallel configuration.

Abstract: The disclosed circuitry for integrating an analog voltage signal with respect to time, t, while simultaneously dividing the integral by time, t, is valuable for use in medical pulmonary analyzers and includes a ramp generator for developing a voltage level proportional to time, a duty cycle modulator for generating an inverted time signal, 1/t, a multiplier for multiplying the analog voltage signal, V, by the inverted time signal, 1/t, followed by an integrator to produce the required output of 1/t .intg.V dt.