Abstract: A method of growing superlattice crystals containing alternating layers of two semiconductor materials in which misfit and threading dislocations are eliminated by growing the layers of superlattice crystal to some thickness less than that which will generate new dislocations, and matching the average lattice parameter of the superlattice with that of substrate so misfit dislocations between the superlattice and the substrate are not formed.
Type:
Grant
Filed:
April 4, 1975
Date of Patent:
May 9, 1978
Assignee:
International Business Machines Corporation