Abstract: A tipless arc tube for a high intensity discharge lamp and method of manufacture wherein the arc tube may remain open to an uncontrolled atmosphere during the step of hermetically scaling the arc tube. The novel arc tube and method obviate the need to perform any process steps within a controlled atmosphere. The pressure of the fill gas sealed within the arc tube may be controlled by controlling the temperature of the fill gas during the step of hermetically sealing the arc tube. The novel arc tube and method obviate the need to use a pump to control the fill gas pressure.

Abstract: A system and method for covering or uncovering a trailer comprising supports adapted to be operatively connected to the ends of a trailer to position a roller, with a cover attached thereto, from one side of the trailer to the other side to thereby cover the trailer and any cargo loaded thereon. The system and method may be performed by a single person anywhere along the transportation route, and the apparatus may be located at a terminal and moved from trailer to trailer. The system and method may also be used to selectively position straps over the top of cargo loaded on a trailer for securing cargo onto the trailer.

Abstract: A disposable polish applying and buffing mitt comprising a multilayered mitt with a polish impervious layer removably attached to an impervious buffing mitt. A disposable polish applying and buffing mitt comprising a multilayered mitt with a sponge-like layer having an impervious backing removably attached to a buffing mitt. A disposable polish applying and buffing kit comprising a multilayered mitt with a first layer of polish impervious material removably secured to a second layer of polish impervious material forming a compartment therebetween which can hold a polish. The first layer of polish impervious material is removed from the second layer of polish impervious material to expose the polish for application. After the polish is applied to the object, the second layer of polish impervious material is removed to expose the buffing mitt.

Abstract: A method for establishing and maintaining a reliable ground for reactive sputtering systems. A spatially extended high density plasma is generated in a large region surrounding the sputtering target. The plasma electrically connects the target to a part of the coating machine that is not subject to deposition of sputtered material from the target. The plasma is generated by an applicator which is independent of the target.