Patents Represented by Attorney Jung-hua Kuo
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Patent number: 6465795Abstract: In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.Type: GrantFiled: March 28, 2000Date of Patent: October 15, 2002Assignee: Applied Materials, Inc.Inventors: Juan R. Madonado, Lee H. Veneklasen, Matthias Brunner, Ralf Schmid
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Patent number: 6463528Abstract: A method and apparatus which simplifies the configuration of CPEs of several models, potentially from several manufacturers. Each model may be employ a different syntax for the configuration commands. A portable system is implemented to issue commands with all such different syntaxes. The configuration parameters are retrieved from a central system and the commands are issued to each CPE to be configured. The issued commands have the syntax corresponding to the model of the configured CPE, and in some cases incorporate the retrieved parameters. The invention is particularly useful for service providers who may have the responsibility of configuring numerous CPEs of several different models.Type: GrantFiled: April 20, 1999Date of Patent: October 8, 2002Assignee: Covad Communications Group, Inc.Inventors: Yasantha Nirmal Rajakarunanayake, Thomas Edward Lilley
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Patent number: 6463079Abstract: An operational support system (OSS) processing orders for high bandwidth connections on based on digital subscriber loop (DSL) technology. The OSS pre-qualifies the services based on data identifying a user location and on the availability of any resources which may be needed exclusively for the user location to provide the service. A port on a DSL access multiplexor (DSLAM) is an example of such a resource. By reserving such resources around (before or after) the pre-qualification stage, the OSS may ensure that the service order can be fulfilled with an enhanced probability.Type: GrantFiled: July 2, 1999Date of Patent: October 8, 2002Assignee: Covad Communications Group, Inc.Inventors: Vinu Sundaresan, Krishna Sastry Garimella, Umesh Bellur, Arun Candadai, Michael Jean Walsh, Ralph Gordon Saavedra, Madhu Gopinathan, Yan Or
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Patent number: 6459702Abstract: An operational support system (OSS) securing a local loop to be used for providing digital subscriber loop (DSL) based services to a user location (e.g., home). Upon determination of the services (including bandwidth) to be provided, the OSS may automatically determine a port on a DSL access multiplexor (DSLAM) which is capable of providing the determined services. In turn, the DSLAM port may determine a port on a distribution frame. An order for a local loop specifying the port on the frame may be sent to an incumbent local exchange carrier (ILEC). The ILEC may provide a firm order commit (FOC) date for providing the local loop. The OSS may automatically test the local loop around the FOC date prior to determine whether the local loop has been accurately provided by the ILEC.Type: GrantFiled: July 2, 1999Date of Patent: October 1, 2002Assignee: Covad Communications Group, Inc.Inventors: Ralph Gordon Saaverda, Madhu Gopinathan, Michael Jean Walsh, Yan Or
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Patent number: 6455863Abstract: A charged particle beam column for generating a variable shaped (in cross section) charged particle beam. The charged particle beam column includes: a source of a charged particle beam; a first aperture defining a first opening positioned coaxial to the beam and spaced apart from the source; a second aperture defining a second opening positioned coaxial to the beam and spaced apart from the first aperture; a third aperture defining a third opening positioned coaxial to the beam and spaced apart from the second aperture; an imaging device coaxial to the beam, where the imaging device controls focusing of the beam; and at least two deflection devices coaxial to the beam which controls a path of the beam through the openings.Type: GrantFiled: June 9, 1999Date of Patent: September 24, 2002Assignee: Applied Materials, Inc.Inventors: Sergey Babin, Lee H. Veneklasen
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Patent number: 6436607Abstract: Dose conservation is used during pattern modification in the data preparation phase of scanning beam lithography. The features to be exposed on a substrate, such as a mask or direct written semiconductor wafer, are corrected while neighboring features suffer little or no change. Thus, the edge of a feature is moved in terms of its exposure location without appreciably affecting the scattering into its neighbors. This achieves a developed feature which meets the intended design edge location. This process also corrects for variations in resist profile angles which otherwise may vary depending upon localized feature packing density. Not only is the feature edge moved but its dose per area is adjusted while conserving total dose over the feature.Type: GrantFiled: March 2, 2000Date of Patent: August 20, 2002Assignee: Applied Materials, Inc.Inventors: Richard L. Lozes, Andrew Muray, Allen M. Carroll
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Patent number: 6433348Abstract: A scanning lithography tool exposes a medium in a raster scan. The raster scan is a multi-pass scan in which the shape of the beam, while fixed for any one pass, is altered between passes. Thus, certain pixels are exposed in one or more scans using a Gaussian (round) beam while other pixels are exposed in separate scans using, for instance, a shaped (e.g., square or rectangular) shaped beam. Beam shape here refers to the cross-sectional shape of the beam as incident on the medium. This process, especially when the shaped beam is applied at the corners and slanted edges of a feature being exposed, has been found to substantially reduce the problem of edge blur otherwise typical of raster scan lithography. This process is applicable to both electron beam and laser beam raster scanning lithography.Type: GrantFiled: July 25, 2000Date of Patent: August 13, 2002Assignee: Applied Materials, Inc.Inventors: Fayez E. Abboud, Jan M. Chabala
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Patent number: 6429443Abstract: Multiple beam electron beam lithography uses an array of vertical cavity surface emitting lasers (VCSELS) to generate laser beams, which are then converted to electron beams using a photocathode. The electron beams are scanned across a semiconductor substrate or lithography mask to imprint a pattern thereon. The use of VCSELs simplifies the design of the electron beam column and improves the throughput and writing resolution of the lithography system.Type: GrantFiled: June 6, 2000Date of Patent: August 6, 2002Assignee: Applied Materials, Inc.Inventors: Marian Mankos, Steven T Coyle, Andres Fernandez, Tai-Hon P Chang
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Patent number: 6420717Abstract: The present invention relates to methods and procedures for determining resist temperature during energy beam lithography and adjusting process parameters, including reducing the beam current, to compensate for increased resist sensitivity due to heating. The present invention relates to methods of predicting resist heating in real-time as the writing proceeds thereby enabling beam compensation to be performed in real-time. A linear superposition approximation is described that provides a procedure for estimating the resist temperature at the point presently being written from previously written points. The present invention makes use of the thermal history of the pattern previously written as that history is recorded in the line of pixels immediately preceding the line whose temperature is to be determined prior to e-beam exposure, and a single number representing the thermal history of lines written before the immediately preceding line.Type: GrantFiled: April 11, 2000Date of Patent: July 16, 2002Assignee: Applied Materials, Inc.Inventors: Sergey Babin, Robert Innes
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Patent number: 6388990Abstract: A method and system for provisioning remote user data access over digital subscriber lines (DSL's) through connection-oriented packet networks is described. According to a preferred embodiment, DSL terminal units are directed to train at a rate that is not substantially greater than the subscribed data rate, thereby avoiding network congestion due to data rate mismatches between the DSL connection and a corresponding permanent virtual circuit (PVC) channel through the connection-oriented packet network. According to another preferred embodiment, the DSL units are directed to test for the maximum trainable data rate before settling to the subscribed data rate, and to communicate this information to a network operations center computer, thereby allowing the maximum allowable DSL data rate to be compared to actual client traffic usage patterns and to the client's subscribed data rate.Type: GrantFiled: December 18, 1998Date of Patent: May 14, 2002Assignee: Covad Communications CompanyInventor: Gregory F. Wetzel
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Patent number: 6370578Abstract: A system and method for actively marketing products and services to a user of a client computer such as over a network are disclosed. A product information database comprising product summary files that facilitate determination of presence or absence of products associated with the client computer, a marketing rule knowledge base comprising opportunity rule files governing marketing opportunities, and an opportunity detection object for determination of marketing opportunities are utilized to determine active marketing opportunities and may be downloaded to the client computer from a service provider computer system. The opportunity detection object may comprise a scan engine, an opportunity analysis engine, and a presentation engine which collectively determine and present marketing information to the client computer user.Type: GrantFiled: February 16, 2001Date of Patent: April 9, 2002Assignee: McAfee.com, Inc.Inventors: Siddaraya B. Revashetti, Chandrasekar Balasubramaniam, Babu Katchapalayam, Ravi Lingarkar
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Patent number: 6369385Abstract: An apparatus for surface inspection and processing of a wafer includes a microcolumn and an associated scanning probe microscope. The microcolumn enables high speed scanning of the wafer at a relatively high resolution, while the scanning probe microscope provides atomic resolution of highly localized areas of the wafer. The microcolumn and scanning probe microscope can be partially fabricated out of the same substrate. Additionally, the microcolumn and scanning probe microscope can be a portion of an array of microcolumns and/or scanning probe microscopes. The apparatus may be used for imaging, lithography and spectroscopy.Type: GrantFiled: May 5, 1999Date of Patent: April 9, 2002Assignee: Applied Materials, Inc.Inventors: Lawrence P. Muray, Ho-Seob Kim, T. H. Philip Chang
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Patent number: 6336124Abstract: A computer implemented method of converting a document in an input format to a document in a different output format is disclosed. The method generally comprises locating data in the input document, grouping data into one or more intermediate format blocks in an intermediate format document, and converting the intermediate format document to the output format document using the intermediate format blocks. Each intermediate format block may be a paragraph, a line, a word, a table, or an image. The input document may be received over a network and the output document is sent over the network. A linked table of contents and/or an index may be generated. A computer executable program may be generated and inserted into the output document for selecting one output format for display.Type: GrantFiled: July 7, 1999Date of Patent: January 1, 2002Assignee: BCL Computers, Inc.Inventors: Hassan Alam, Koichi Ariyoshi, Rachmat Hartono, Timotius Tjahjadi, Scott Tupaj, Hanyen Widjaja
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Patent number: 6331711Abstract: In scanning lithography as used in the semiconductor industry, systematic variations in critical dimension feature size which depend on the substrate coordinates are compensated for in a lithography tool. This is done by determining (experimentally or theoretically) low frequency variations in the critical dimensions on the target caused by imperfections in the lithography tool and/or the resist and/or the process steps. These low frequency spatial errors are compensated for, after the primary scanning exposure using the original pattern data, by a secondary scanning exposure of the target using a weaker intensity and relatively larger diameter exposure beam. The secondary exposure is also carried out at a larger address size (address grid) than is the primary exposure so it is relatively fast in terms of throughput.Type: GrantFiled: August 6, 1999Date of Patent: December 18, 2001Assignee: Etec Systems, Inc.Inventor: Matthew F. Vernon
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Patent number: 6286049Abstract: Systems and methods for providing broadband content to high-speed access subscribers with layer 4-7 switching are disclosed. The system generally comprises an enhanced services complex (ESC) having at least one content server having Internet content stored or cached therein and a broadband access gateway (BAG) in communication with the ESC and to at least one Internet service provider (ISP), where the BAG is configured to transmit and receive data traffic to and from a client premise equipment (CPE) at a client premise, respectively. The BAG is configured to selectively route data traffic received from the CPE to an ESC content server or the ISP based on multiple instances of the content destination address.Type: GrantFiled: March 24, 2000Date of Patent: September 4, 2001Assignee: Covad Communications Group, Inc.Inventors: Yasantha N. Rajakarunanayake, Gregory F. Wetzel
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Patent number: 6246190Abstract: An electron gun assembly which integrates electronics required to power the electron gun and the electron gun itself in one module in a high voltage operating environment. The assembly has four major sections: interface cables; electronic circuits (active and high voltage); the electron emitter; and a mechanical enclosure for the assembly. The electronics portion of the assembly has two distinct sections: an active electronics section (which contains digital to analog converters, interface to a control computer, and analog outputs terminals to control the high voltage electronics) and a high voltage electronics section (which contains high-voltage multiplying circuits and feedback and filtering elements). These two sections are electrically connected and are present within an internal box at one end of the assembly, or alternately, the high voltage electronics section is disposed below the active electronics section and outside the internal box.Type: GrantFiled: July 30, 1999Date of Patent: June 12, 2001Assignee: Etec Systems, Inc.Inventor: Richard Prior
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Patent number: 6230199Abstract: A system and method for actively marketing products and services to a user of a client computer such as over a network are disclosed. A product information database comprising product summary files that facilitate determination of presence or absence of products associated with the client computer, a marketing rule knowledge base comprising opportunity rule files governing marketing opportunities, and an opportunity detection object for determination of marketing opportunities are utilized to determine active marketing opportunities and may be downloaded to the client computer from a service provider computer system. The opportunity detection object may comprise a scan engine, an opportunity analysis engine, and a presentation engine which collectively determine and present marketing information to the client computer user.Type: GrantFiled: October 29, 1999Date of Patent: May 8, 2001Assignee: McAfee.com, Inc.Inventors: Siddaraya B. Revashetti, Chandrasekar Balasubramaniam, Babu Katchapalayam, Ravi Lingarkar