Patents Represented by Attorney Kenneteh C. Brooks

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  • Step and repeat imprint lithography systems
    Patent number: 6900881
    Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: May 31, 2005
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin