Patents Represented by Attorney Kyla L. Harriel
  • Patent number: 5844299
    Abstract: An integrated inductor with filled etch includes a substrate of semiconductor material which includes a surface and a cavity disposed therein, a mass of dielectric material disposed within the cavity, a layer of dielectric material disposed upon the mass of dielectric material, and a patterned layer of conductive material disposed upon the layer of dielectric material, such that the integrated inductor is formed without an oxide bridge. Thus, the integrated inductor has a rugged architecture.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: December 1, 1998
    Assignee: National Semiconductor Corporation
    Inventors: Richard Billings Merrill, Donald M. Archer