Patents Represented by Attorney Philiph H. Von Neida

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  • Plasma apparatus and method
    Patent number: 6110540
    Abstract: A gas purged counter-electrode prevents the counter-electrode from being covered with dielectric material by flowing gas past a surface of a metal element. The gas purged counter-electrode produces a relatively high-density plasma which effectively acts as the counter-electrode for a coating system. The gas purged counter-electrodes can be used with PECVD or sputtering systems.
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: August 29, 2000
    Assignee: The BOC Group, Inc.
    Inventors: Joseph Countrywood, Sohrab Zarrabian, Abraham I. Belkind, Charlie Sherwood, Frank Jansen