Abstract: A method and structure for controlling a manufacturing tool includes measuring different manufacturing parameters of the tool, transforming a plurality of time series of the manufacturing parameters into intermediate variables based on restrictions and historical reference statistics, generating a surrogate variable based on the intermediate variables, if the surrogate variable exceeds a predetermined limit, identifying a first intermediate variable, of the intermediate variables, that caused the surrogate variable to exceed the predetermined limit and identifying a first manufacturing parameter associated with the first intermediate variable, and inhibiting further operation of the tool until the first manufacturing parameter has been modified to bring the surrogate value within the predetermined limit.

Abstract: A method and structure to determine timing windows in a static timing analysis of an integrated circuit design, determines for at least one node in the integrated circuit design, an initial set of sub-windows and merges the sub-windows of the initial set into a final set of sub-windows.

Abstract: A method and structure for determining a range and a shape of a kernel function of a lithographic system which includes exposing, in the lithographic system, a photosensitive layer on a top surface of a substrate through a mask having a mask image, the mask image being of sufficient width to ensure a transferred image will not exhibit foreshortening but will exhibit corner rounding; developing the photosensitive layer to form the transferred image in the photosensitive layer; measuring a distance from an intersection of projected extensions of edges of the transferred image to a point along one edge where corner rounding starts; and defining the range of the kernel function as the measured distance. The projected extension edges are an unaltered version of the mask image overlaid on the transferred image and the foreshortening is a reduction in length of transferred images when compared to the mask image. Corner rounding occurs as a result of light diffraction and photosensitive layer development processes.

Abstract: A method and structure for forming subfield regions includes mechanical definition of the substrate through machining or mold forming. The subfield regions are filled with a sacrificial layer before the thin membranes are deposited. Slots are mechanically machined through a substrate (the slots have dimensions of membrane subfields) and filled with a sacrificial material. The substrate is planarized. A membrane material is deposited over the substrate and patterned. The sacrificial layer is then removed. A mold can be utilized to form the slotted substrate in place of the machining operation.

Abstract: A mask includes an in-situ information storage mechanism on the mask, which stores mask pattern data that is supplied to a microlithographic tool (e.g., an optical stepper). The advantages of using the invention include immediate availability of pattern data of a particular mask to the microlithographic tool for improved integrated circuit productivity.

Abstract: A method and structure of clock optimization including creating an initial placement of clock feeding circuits according to clock signal requirements; identifying clusters of the clock feeding circuits, wherein each cluster includes a distinct clock signal supply device to which each clock feeding circuit within the cluster is connected; changing pin connections between the clock feeding circuits and clock signal supply devices to switch selected ones of the clock feeding circuits to different clusters to reduce lengths of wires between the clock feeding circuits and the clock signal supply devices within each cluster; and adjusting positions of the clock feeding circuits within design constraints to further reduce the lengths of the wires.

Abstract: A method is provided for designing an integrated circuit that includes receiving a graphical description of the integrated circuit, extracting shapes relating to a specific circuit function from the graphical description of the integrated circuit, and partitioning the extracted shapes into a plurality of segments. The method may form an electrical representation of the integrated circuit for each of the plurality of segments and solve a matrix equation (Gv=i) for each of the plurality of segments based on the electrical representation.

Abstract: A method and system for modifying power rails of an integrated circuit having improved wireability. This is accomplished by initially generating a power railing design of the integrated circuit into a three-dimensional rail based model. Next, analysis of the design is performed as to placement of the power rails in relation to neighboring elements that affects a predefined wireability. Finally, modification of a segment of each power rail that affects wireability is performed so that required power supply to the neighboring elements (e.g., pins, rails etc.) remains unaffected.

Abstract: A method and structure for controlling a manufacturing tool includes measuring different manufacturing parameters of the tool, transforming a plurality of time series of the manufacturing parameters into intermediate variables based on restrictions and historical reference statistics, generating a surrogate variable based on the intermediate variables, if the surrogate variable exceeds a predetermined limit, identifying a first intermediate variable, of the intermediate variables, that caused the surrogate variable to exceed the predetermined limit and identifying a first manufacturing parameter associated with the first intermediate variable, and inhibiting further operation of the tool until the first manufacturing parameter has been modified to bring the surrogate value within the predetermined limit.

Abstract: A method for hierarchical layout of an electronic design using an electronic computer aided design system, wherein the method includes generating a parameterized pattern library and using an existing netlist and analyze in a pattern recognizer, from which a list of associations between the pattern library and the netlist is created. Renesting then occurs wherein the netlist using the list of associations is used for generating a hierarchical layout of the electronic components in the design.

Abstract: A structure and method for extracting parasitic capacitance from a multi-layer wiring structure that creates, for each wiring layer in a wiring structure, a wiring density map and measures a plurality of metal segments in a wiring layer to determine an area occupied by the metal segments. The invention calculates an up area capacitance component for each of the metal segments by multiplying the area occupied by the metal segments by a wiring density from the wiring density map of an overlying wiring layer over the metal segments and by a capacitance coefficient of the overlying wiring layer. To calculate the down area capacitance component for each of the metal segments, the invention multiplies the area occupied by the metal segments by a wiring density, from the wiring density map of an underlying wiring layer under the metal segments and by a capacitance coefficient of the underlying wiring layer.

Abstract: Macro design techniques are disclosed for facilitating subsequent stage wiring across the macro. Whitespace areas within the macro are rearranged to accommodate the wiring. The rearrangement may take the form of physical rearrangement of the whitespace areas into routing tracks extending from one side of the macro to another; shielding using, for example, macro power bussing and/or macro wiring; routing power busses to the rearranged whitespace; and/or inserting active circuits with pins accessible to the wiring. In a preferred embodiment, active circuits are placed into rearranged macro whitespace during the design of subsequent stages. The rearrangement of the whitespace facilitates the wiring across the macro so that slew rate and path delay requirements of the subsequent stage wiring can be maintained, without excessive buffering or rerouting of wiring.

Abstract: Method for effecting edge bias correction of topography-induced linewidth variations which are encountered in printed or integrated circuits on substrates or semiconductor devices for electronic packages. The method modifies data for current levels which is predicated on prior level data and models, as to the manner in which topography will affect the resist and/or antireflective coating (ARC) thicknesses, so as to improve upon linewidth (LW) control and, in general, imparting improved processing windows. The method can be implemented in the form of computer-executable instructions which are embodied in one or more program modules stored on computer-usable media.

Abstract: A method and structure for performing parasitic extraction for a multi-fingered device comprising of establishing a maximum processing width of a finger of the device, dividing fingers of the device that exceed the maximum width into sub-fingers, determining whether ones of the fingers and the sub-fingers have similar characteristics, combining ones of the fingers and the sub-fingers that have similar characteristics into combined fingers, and extracting parasitic values from the fingers, the sub-fingers and the combined fingers.

Abstract: It is, therefore, an object of the present invention to provide a structure and method of blowing fuses in a semiconductor chip that includes creating a design for the chip using a library, generating test data from the design, extracting the fuse related information from the design to prepare a fuse blow table, building the chip with the design data, testing the chip to produce failed data, comparing the fuse blow table to the failed data to determine the fuse blow location data, and blowing the selected fuses based on the fuse blow location data. The extraction method can include creating a fuse map file based upon a correlation between physical pin locations on the chip and different fuse macros within the design, wherein an order of fuses within the fuse blow table matches an order of fuses within the fuse map file.

Abstract: An automated data processing system includes a relational database engine, storage devices having a database table, registry and binary large objects created and updated by the relational database engine and a user defined function engine retrieving data elements stored in the binary large objects. The registry includes data element classifications. The database table includes relational information of the data elements, the data element classifications and pointers to the binary large objects, and the relational database engine creates and updates the binary large objects based on the database table and the registry.

Abstract: A structure and method for performing a capacitance extraction on an integrated circuit, includes determining a parallel-plate capacitance between devices on different levels within the integrated circuit, adding extension shapes around each of the devices, reducing an area of overlapping extension shapes, multiplying a remaining area of the extension shapes by a constant to produce a fringe capacitance; and summing the parallel-plate capacitance and the fringe capacitance.

Abstract: A structure and method for improving yield during physical chip design comprises identifying non-critically timed minimum groundrule cells located within the chip design, determining if whitespace exists around the non-critically timed minimum groundrule cells, and replacing the non-critically timed minimum groundrule cells that have the whitespace with non-minimum groundrule cells if the replacing leaves a functionality of the circuit unaltered.

Abstract: A structure and method for evaluating an integrated circuit design includes adding a superseding layer of the integrated circuit design over a previous layer of the integrated circuit structure, identifying database pointers for regions and edges within the superseding layer and the previous layer, removing database pointers for regions of the previous layer overlapped by the superseding layer, classifying the superseding layer and the previous layer as the previous layer, and repeating the method until all layers of the integrated circuit are evaluated.

Abstract: A method and structure for controlling a manufacturing tool includes measuring different manufacturing parameters of the tool, transforming a plurality of time series of the manufacturing parameters into intermediate variables based on restrictions and historical reference statistics, generating a surrogate variable based on the intermediate variables, if the surrogate variable exceeds a predetermined limit, identifying a first intermediate variable, of the intermediate variables, that caused the surrogate variable to exceed the predetermined limit and identifying a first manufacturing parameter associated with the first intermediate variable, and inhibiting further operation of the tool until the first manufacturing parameter has been modified to bring the surrogate value within the predetermined limit.