Abstract: A building block training system and method of training of cleaners of facilities to be used on the job which utilizes a plurality of pictorial displays showing a specific set of steps to accomplish a cleaning operation in an efficient safe manner, e.g., dusting or vacuuming of a facility as well as a plurality of pictorial displays as to what must not be missed and must be avoided in performing the cleaning operation.
Type:
Grant
Filed:
April 23, 1997
Date of Patent:
December 22, 1998
Assignee:
The Butcher Company
Inventors:
Keith A. Alsheimer, Andrianne H. Fitzgerald
Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
Abstract: A composition and method for treatment of skin. The composition comprises a pharmaceutically acceptable carrier containing a bilayer component having one or more polar terminus groups and one or more non-polar terminus groups separated from said polar terminus groups capable of penetrating the outer surface of the skin to form an aligned bilayer within the stratum corneum. The bilayer assists in the formation of bilayer lamellae that is believed to replicate the bilayer lamellae present in healthy skin. The composition is topically applied to the skin as often as is required.
Type:
Grant
Filed:
November 26, 1997
Date of Patent:
December 22, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Donald R. Korb, Thomas Glonek, Jack V. Greiner
Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
Type:
Grant
Filed:
March 12, 1997
Date of Patent:
October 27, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
Abstract: A method for converting a kinetically stable multiester of a naphthoquinone and an o-quinone diazide sulfonyl halide to a thermodynamically stable compound. The method comprises the steps of dissolving a phenol having at least two free phenolic hydroxyl groups and an o-naphthoquinone diazide sulfonyl halide in an aprotic solvent in the presence of a strong base, there being at least one mole of said naphthoquinone diazide sulfonyl halide per mole of phenol, reacting said phenol with said o-napthoquinone diazide sulfonyl halide until essentially of said o-naphthoquinone diazide sulfonyl halide is reacted with said polyhydroxy phenol, and following completion of said reaction, permitting the reaction product to remain in said solvent for a period of time of at least 15 minutes before recovering said photoactive compound. The photoactive compound formed by the process is suitable for the formation of photoresists and is less apt to precipitate from solution during storage.
Abstract: The invention relates to a conductive dispersions used for diverse purposes such a base for electroplating nonconductors. The dispersion are characterized by use of a stabilizing quantity of a stabilizer having repeating alylkene oxide groups and a hydrophilic-lipophilic balance in excess of 12. It has been found that the stabilizers utilized in the subject compositions does result in a significant loss of conductivity in coatings formed from the dispersion.
Type:
Grant
Filed:
April 11, 1996
Date of Patent:
September 1, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Wade Sonnenberg, Patrick J. Houle, Thong B. Luong, James G. Shelnut, Gordon Fisher
Abstract: The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.
Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
Type:
Grant
Filed:
April 26, 1996
Date of Patent:
June 9, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
Abstract: A process for electroplating a metal clad substrate by coating the substrate with a coating of carbonaceous particles. The coating of particles is applied to the substrate from an aqueous dispersion and then the coating is saturated with an etchant for the metal cladding on the substrate to undercut the carbonaceous coating and facilitate its removal from areas where plating is undesired.
Type:
Grant
Filed:
January 19, 1996
Date of Patent:
April 14, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Steven M. Florio, Jeffrey P. Burress, Carl J. Colangelo, Edward C. Couble, Mark J. Kapeckas
Abstract: A composition and method for treatment of skin. The composition comprises a pharmaceutically acceptable carrier containing a bilayer component having one or more polar terminus groups and one or more non-polar terminus groups separated from said polar terminus groups capable of penetrating the outer surface of the skin to form an aligned bilayer within the stratum corneum. The bilayer assists in the formation of bilayer lamellae that is believed to replicate the bilayer lamellae present in healthy skin. The composition is topically applied to the skin as often as is required.
Type:
Grant
Filed:
November 3, 1995
Date of Patent:
April 14, 1998
Assignee:
Ocular Research of Boston, Inc.
Inventors:
Donald R. Korb, Thomas Glonek, Jack V. Greiner
Abstract: The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
Type:
Grant
Filed:
May 9, 1995
Date of Patent:
March 24, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
Abstract: The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.
Type:
Grant
Filed:
January 24, 1996
Date of Patent:
March 24, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Roger F. Sinta, James F. Cameron, Timothy G. Adams, Martha M. Rajaratnam, Michael F. Cronin
Abstract: The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.
Type:
Grant
Filed:
September 4, 1996
Date of Patent:
March 3, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Anthony Zampini, Peter Trefonas, III, Pamela Turci, Catherine C. Meister, Gerald C. Vizvary
Abstract: A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
Type:
Grant
Filed:
September 27, 1995
Date of Patent:
February 17, 1998
Assignee:
Shipley Company, L.L.C.
Inventors:
Roger F. Sinta, Daniel Y. Pai, Timothy G. Adams
Abstract: The invention is for a process of removing dissolved heavy metal cation contaminants from an organic solution. The process of the invention involves providing a mixture of a chelating ion exchange resin modified by removal of sodium ions therefrom and an anion exchange resin and contacting said organic solution with said exchange resins for a time sufficient to remove ionic metal impurities and acids. The invention is useful for removal of ionic contaminants from organic solutions requiring high purity.
Type:
Grant
Filed:
January 14, 1997
Date of Patent:
December 30, 1997
Assignee:
Shipley Company, L.L.C.
Inventors:
Dana A. Gronbeck, Kathleen M. O'Connell, William Andrew Burke, Michael N. Gaudet, Stefan J. Caporale
Abstract: The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
Type:
Grant
Filed:
May 9, 1995
Date of Patent:
December 23, 1997
Assignee:
Shipley Company, L.L.C.
Inventors:
James W. Thackeray, Roger F. Sinta, Mark D. Denison, Sheri L. Ablaza
Abstract: Radiation sensitive compositions, processes for using the compositions, and articles of manufacture comprising the compositions. The photoimageable compositions of the invention comprises a radiation sensitive component, a resin binder and a polybutadiene that comprises one or more internal epoxide groups. In preferred aspects, the compositions of the invention further comprise a crosslinking agent such as a melamine or an epoxidized material, or mixtures thereof.
Type:
Grant
Filed:
July 12, 1994
Date of Patent:
November 25, 1997
Assignee:
Shipley Company Inc.
Inventors:
Philip D. Knudsen, Charles R. Shipley, Daniel Y. Pai
Abstract: A process for electroplating a substrate by coating the substrate with a coating of conductive particles. The coating of conductive particles is applied to the substrate from an aqueous dispersion containing a dissolution agent for metallic regions of the substrate. The dissolution agent removes the top surface of the metal as the conductive particle coating is formed thereby facilitating removal of the same from the metallic regions of the substrate.
Type:
Grant
Filed:
May 23, 1996
Date of Patent:
November 4, 1997
Assignee:
Shipley Company, L.L.C.
Inventors:
Steven M. Florio, Jeffrey P. Burress, Carl J. Colangelo, Edward C. Couble, Mark J. Kapeckas
Abstract: The invention is for a process of removal of dissolved cation contaminants from a resin solution. The process of the invention involves providing a chelating ion exchange resin modified by treatment with an acid and contact of said solution with said modified exchange resin for a time sufficient to remove ionic metal impurities. The invention is useful for removal of ionic contaminants from resin solutions used in the preparation of photoresists.