Patents Represented by Attorney Russo & Hale LLP
  • Patent number: 7458056
    Abstract: Proximity effect correction has become a necessary step in the fabrication of integrated circuit in order to improve the pattern fidelity of current lithography processes. Current methodology is limited by data volume increase and correction inaccuracy due to extrapolation of the correction. The invention describes a methodology based on the interpolation of the correction between selected evaluation points of the target layout. By connecting the correction points this technique also provides a mean of reducing data volume and simplifying the mask writing, inspection and repair processes. The same methodology can be applied to layouts with non-printing assist features, where the correction of the assist features is based on the quality of the image of the main feature. For vector-scan mask write tool the segments interpolating the corrections can be fractured in segments with suitable angles.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: November 25, 2008
    Assignee: Takumi Technology Corp.
    Inventor: Christophe Pierrat
  • Patent number: 7435955
    Abstract: A system for controlling the operation of a scanning probe microscope that greatly simplifies the microscope's operation is disclosed. The software design incorporates several advanced features such as a sample designator file, video tutorials, automation algorithms, and the ability to remotely load sample designator files and video tutorials.
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: October 14, 2008
    Inventor: Paul E. West
  • Patent number: 7340693
    Abstract: A digital design system and method are provided for re-programmable hardware platforms, such as field programmable gate arrays (FPGAs) and other re-programmable system designs. The design system and method bridge the gap between what has previously been a development and prototyping platform used during the design phase of an electronic design system (EDS) project, and commercially viable re-programmable product platforms to replace non-programmable platforms, such as discrete processors and ASICs.
    Type: Grant
    Filed: February 24, 2005
    Date of Patent: March 4, 2008
    Inventors: Nick Martin, Dejan Stankovic, Ben Wells, Denzil Crasta, Johnny F. Russell, Michael Rodway
  • Patent number: 7318315
    Abstract: Applicant's preferred embodiment utilizes municipal wastewater effluent to replenish a depleted geothermal field. Condensate produced by expanding steam produced in the geothermal field through a steam turbine-generator may be pooled with cooked water collected from said field, and then directed through a penstock from a higher elevation to a lower elevation where further energy is extracted through a traditional hydroelectric turbine-generator. The cooked water and condensate may be treated to produce potable water and/or distributed for public consumption either before or after being directed to the hydroelectric turbine-generator. The effluent is pumped up to the geothermal field during off-peak periods of electric consumption, and the hydroelectric generation is accomplished during periods of peak electric demand. A fraction of the effluent may be used as cooling water for the steam turbine-generator and its associated condenser before injection into the geothermal field.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: January 15, 2008
    Inventor: Leonard L. Stewart
  • Patent number: 7253408
    Abstract: An environmental cell for use with a scanning probe microscope includes a cell chamber, a probe mounted to the cell chamber, a puck selectively connected to the cell chamber, a sample holder selectively inserted in the puck, and a translation mechanism coupled to the sample holder to move the sample holder. Gasses or liquids may be introduced to the environmental cell through channels formed in either the puck, sample holder, or cell chamber.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: August 7, 2007
    Inventor: Paul E. West
  • Patent number: 7055127
    Abstract: The manufacturing of integrated circuits relies on the use of optical proximity correction (OPC) to correct the printing of the features on the wafer. The data is subsequently fractured to accommodate the format of existing mask writer. The complexity of the correction after OPC can create some issues for vector-scan e-beam mask writing tools as very small slivers are created when the data is converted to the mask write tool format. Moreover the number of shapes created after fracturing is quite large and are not related to some important characteristics of the layout like for example critical areas. A new technique is proposed where the order of the OPC and fracturing steps is reversed. The fracturing step is done first in order to guarantee that no slivers are created and that the number of shapes is minimized. The shapes created can also follow the edges of critical zones so that critical and non-critical edges can be differentiated during the subsequent OPC step.
    Type: Grant
    Filed: October 27, 2003
    Date of Patent: May 30, 2006
    Assignee: Takumi Technology Corp.
    Inventors: Christophe Pierrat, Alfred K. Wong
  • Patent number: 7010764
    Abstract: Proximity effect correction has become a necessary step in the fabrication of integrated circuit in order to improve the pattern fidelity of current lithography processes. Current methodology is limited by data volume increase and correction inaccuracy due to extrapolation of the correction. The invention describes a methodology based on the interpolation of the correction between selected evaluation points of the target layout. By connecting the correction points this technique also provides a mean of reducing data volume and simplifying the mask writing, inspection and repair processes. The same methodology can be applied to layouts with non-printing assist features, where the correction of the assist features is based on the quality of the image of the main feature. For vector-scan mask write tool the segments interpolating the corrections can be fractured in segments with suitable angles.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: March 7, 2006
    Assignee: Takumi Technology Corp.
    Inventor: Christophe Pierrat
  • Patent number: 6961186
    Abstract: Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended through the use of phase-shifting masks, off-axis illumination, and proximity effect correction. More recently, liquid immersion lithography has been proposed as a way to extend even further the limits of optical lithography. This invention described a methodology based on contact printing using a projection lens to define the image of the mask onto the wafer. As the imaging is performed in a solid material, larger refractive indices can be obtained and the resolution of the imaging system can be increased.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: November 1, 2005
    Assignee: Takumi Technology Corp.
    Inventors: Christophe Pierrat, Alfred Kwok-Kit Wong
  • Patent number: 6907552
    Abstract: A system performs a two-step skew compensation procedure by first correcting for any phase error alignment between a parallel link clock and data signal edges of each data channel, thereby allowing the received data bits to be correctly sampled. Then, a second step is performed to “word-align” the bits into the original format, which is accomplished with a Skew Synchronizing Marker (SSM) byte in a data FIFO of each data channel. The SSM byte is transmitted on each data channel and terminates the skew compensation procedure. When the SSM byte is detected by logic in the data FIFO of each data channel, the data FIFO employs the SSM byte to initialize the read and write pointers to properly align the output data.
    Type: Grant
    Filed: August 29, 2001
    Date of Patent: June 14, 2005
    Assignee: TriCN Inc.
    Inventor: Hansel A. Collins
  • Patent number: 6884147
    Abstract: A method for planarizing the surface of a semiconductor wafer or device during manufacture. Dependencies of polish rate and substrate thickness on process parameters of downforce and polish speed, and on the characteristic product high feature area on the wafer, are explicitly defined and used to control Chemical-Mechanical Polish in Run-to-Run and real-time semiconductor production control applications.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: April 26, 2005
    Assignee: Yield Dynamics, Inc.
    Inventor: Anthony J. Toprac
  • Patent number: 6862886
    Abstract: Applicant's preferred embodiment utilizes municipal wastewater effluent to replenish a depleted geothermal field. Condensate produced by expanding steam produced in the geothermal field through a steam turbine-generator may be pooled with cooked water collected from said field, and then directed through a penstock from a higher elevation to a lower elevation where further energy is extracted through a traditional hydroelectric turbine-generator. The cooked water and condensate may be treated to produce potable water and/or distributed for public consumption either before or after being directed to the hydroelectric turbine-generator. The effluent is pumped up to the geothermal field during off-peak periods of electric consumption, and the hydroelectric generation is accomplished during periods of peak electric demand. A fraction of the effluent may be used as cooling water for the steam turbine-generator and its associated condenser before injection into the geothermal field.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: March 8, 2005
    Inventor: Leonard L. Stewart
  • Patent number: 6848085
    Abstract: A computer aided hardware design system for enabling design of an actual hardware implementation for a digital circuit using a high-level algorithmic programming language. The system converts an algorithmic representation for a hardware design initially created in the high-level programming language, such as ANSI C, to a hardware design implementation, such as an FPGA or other programmable logic or an ASIC. The C-type program representative of the hardware design is compiled into a register transfer level (RTL) hardware description language (HDL) that can be synthesized into a gate-level hardware representation. The system additionally enables simulation of the HDL design to verify design functionality. Finally, various physical design tools can be utilized to produce an actual hardware implementation. The system also permits the use of other non-C-type high-level programming languages by first translating to a C-type program.
    Type: Grant
    Filed: April 30, 2001
    Date of Patent: January 25, 2005
    Assignee: Synopsys, Inc.
    Inventors: Yuri V. Panchul, Donald A. Soderman, Denis R. Coleman
  • Patent number: 6827135
    Abstract: A cooling system for apparatus powered by electricity, that generates a substantial amount of heat during operation, and the heat must be dissipated to avoid failure of electrical and/or electronic components, such as semiconductor devices and integrated circuits, comprising the electrical apparatus. The cooling system employs water impinged on a heat sink thermally coupled with electrical apparatus, at subatmospheric pressure. The attendant phase change of the water to steam at a reduced temperature due to the subatmospheric pressure improves removal of waste heat to prevent failure of the electrical apparatus.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: December 7, 2004
    Inventors: Gary W. Kramer, Richard S. Frankel
  • Patent number: 6793007
    Abstract: A cooling system for apparatus powered by electricity, that generates a substantial amount of heat during operation, and the heat must be dissipated to avoid failure of electrical and/or electronic components, such as semiconductor devices and integrated circuits, comprising the electrical apparatus. The cooling system employs liquid ice impinged on a heat sink thermally coupled with electrical apparatus. The attendant phase changes of the liquid ice first to water and then to steam remove a substantial amount of waste heat to prevent failure of the electrical apparatus.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: September 21, 2004
    Inventors: Gary W. Kramer, Richard S. Frankel
  • Patent number: 6535890
    Abstract: A computer based apparatus and method which provide access to complex technical information employed to maintain and repair complicated equipment, such as aircraft, to enable compliance with regulatory requirements.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: March 18, 2003
    Assignee: Aircraft Technical Publishers
    Inventor: Michael A. Sandifer
  • Patent number: 6438515
    Abstract: A method and apparatus for displaying dual texts in a manner to facilitate language learning, by presenting a highly visible “study text,” divided into individual units of thought, or “chunks of meaning,” which are preferably formatted in association with less visible units of a “teach text,” provided in proximity, preferably upon a separate focal plane, thus effecting a bitextual, bifocal presentation. The method and apparatus clearly relate the study text and the teach text, associating their individually related chunks of meaning, storing these associations in computer memory, as “.txt” or “Unicode equivalent” files, which, when organized into folders, allow computer programs to access these associations and automatically produce bitextual, preferably bifocal, presentations.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: August 20, 2002
    Inventors: Richard Henry Dana Crawford, Urivan A. Saaib
  • Patent number: 6334093
    Abstract: A system for measuring differences in a physical variable, such as temperature, by utilizing predictable behavior in the relative time drift of offset curves for various circuit elements, including two sensors connected to a difference signal amplifier, an ambient condition amplifier, and an analog to digital converter. In an initial calibration mode, the system records several offset curves, stored in memory, correlating ambient condition measurements to offset measurements acquired from the ambient condition amplifier and the difference signal amplifier. Offset curves recorded in the initial calibration mode, correlating ambient condition measurements to measurements from the difference signal amplifier, include one curve recorded with both inputs of the difference signal amplifier held at equal potential and another curve recorded with both sensors held at the same value of the physical variable, over a given ambient condition range.
    Type: Grant
    Filed: March 19, 1999
    Date of Patent: December 25, 2001
    Inventor: Edward S. More
  • Patent number: D539683
    Type: Grant
    Filed: July 15, 2005
    Date of Patent: April 3, 2007
    Assignee: KHN Solutions LLC
    Inventors: David Shaw, Keith Nothacker
  • Patent number: D475507
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: June 10, 2003
    Inventor: Wayne H. Myers
  • Hat
    Patent number: D481524
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: November 4, 2003
    Inventor: Wayne H. Myers