Abstract: The fixed charge in a borophosphosilicate glass insulating film deposited on a semiconductor device is reduced by reacting an organic precursor such as TEOS with O.sub.3. When done at temperatures higher than approximately 480 degrees C., the carbon level in the resulting film appears to be reduced, resulting in a higher threshold voltage for field transistor devices.
Type:
Grant
Filed:
November 18, 1997
Date of Patent:
August 3, 1999
Assignee:
Micron Technology Inc.
Inventors:
Ravi Iyer, Randhir P. S. Thakur, Howard E. Rhodes