Patents Represented by Attorney Sterne, Kessler, Goldstein & Fox, LLC

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  • Lithographic apparatus and device manufacturing method
    Patent number: 7391499
    Abstract: A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: June 24, 2008
    Assignee: ASML Netherlands B.V.
    Inventor: Robert-Han Munnig Schmidt