Abstract: Methods for the preparation of multilayered resists are described. To efficiently pattern large contiguous areas rapidly, a procedure has been developed using spot-size modulation of the focused laser beam to more efficiently pattern interior portions. Critical portions at the perimeter are patterned at high resolutions. The spot-size is progressively increased towards the interior allowing a controlled transition to coarser spot-sizes without impacting the exposure dose in critical portions. Patterning times are significantly reduced since in effect shells are patterned. An algorithm is defined to subdivide a layer into different zones, determine the appropriate focused spot-sizes used for each zone, and define the laser scan trace within a zone to enable efficient patterning of broad areas in positive tone resists.

Abstract: The invention relates to compositions, kits, and methods for detecting, characterizing, preventing, and treating prostate cancer. FKBP markers are provided, wherein changes in the levels of expression of one or more of the FKBP markers is correlated with the presence of prostate cancer.

Abstract: The present invention provides a beam stop for use in an ion implantation system that includes a base formed of a thermally conductive material, and a heat transfer layer formed of a semi-elastic material that is disposed on a surface of the base. The beam stop further includes one or more tiles, each formed of a thermally conductive refractory material, that are disposed on the semi-elastic layer so as to face an ion beam in the implantation system. The heat transfer layer transfers heat generated in the tile in response to ion beam impact to the base. The base in turn can be coupled to a heat sink to remove heat from the base. The thickness and the thermal conductivity of the base, and those of the heat transfer layer and the tile are chosen so as to ensure uniform expansion of the base and the tile when the beam stop is heated by ion beam impact.

Abstract: A radiation sensitive resin composition including a photo-acid generator and an aliphatic polymer having one or more electron withdrawing groups adjacent to or attached to a carbon atom bearing a protected hydroxyl group, wherein the protecting group is labile in the presence of in situ generated acid is described. The radiation sensitive resin composition can be used as a resist suitable for image transfer by plasma etching and enable one to obtain an etching image having high precision with high reproducibility with a high degree of resolution and selectivity.

Abstract: The present invention is directed to an anchoring balloon structure for use with catheters. The anchoring balloon structure contains an expandable balloon disposed about a port on a catheter, and a pressure-relief valve for regulating the pressure in the balloon and for providing irrigation to a body lumen. The pressure-relief valve is located external to the expandable balloon. The balloon, when filled with fluid, expands and is engaged in direct contact with the tissue. The increase in pressure caused by the balloon against the tissue causes any additional fluid to migrate into the valve region, whereby excess pressure is released and irrigation is provided to the body lumen.

Abstract: Wafer-holding structures formed from thermosetting resins are disclosed for use in semiconductor processing including, for example, SIMOX wafer processing. In one embodiment a pin is disclosed that is adapted to receive a wafer edge, and is coupled with a wafer holder assembly. The pin can be filled with a conductive material to provide an electrical pathway between the wafer and the wafer holder assembly, which can be coupled to a ground. This arrangement provides a conductive path for inhibiting electrical discharges from the wafer during the ion implantation process. The pin exhibits thermal isolation characteristics and sufficient hardness so as to not effect localized thermal dissipation of the wafer, yet is sufficiently soft so as to not mark or otherwise damage the wafer.

Abstract: The present invention provides photoresist materials for use in photolithography at wavelengths less than about 248 nm. More particularly, the photoresists of the invention are particularly suited for use in 157 nm lithography. A photoresist composition of the invention includes a polymer having at least one monomeric unit having an aromatic moiety. The monomeric unit further includes at least a group, such as an electron withdrawing group, attached to the aromatic moiety. The attached group includes at least one CF bond. The polymer further includes an acidic hydroxyl group. A photoresist composition of the invention can have an absorbance in a range of 1-5 &mgr;m−1 at 157 nm, rendering it particularly suitable for use as a single layer resist in 157 nm lithography.

Abstract: The present invention provides a method for creation of high quality semiconductor-on-insulator structures, e.g., silicon-on-insulator structures, using implantation of sub-stoichiometric doses of oxygen at multiple energies. The method employs sequential steps of ion implantation and high temperature annealing to produce structures with a top silicon layer having a thickness ranging from 10-250 nm and a buried oxide layer having a thickness 30-300 nm. The buried oxide layer has a breakdown field greater than 5 MV/cm. Further, the density of silicon inclusions in the BOX region is less than 2×107 cm−2. The process of the invention can be used to create an entire SOI wafer, or be used to create patterned SOI, regions where SOI regions are integrated with non-SOI regions.

Abstract: The present invention describes encapsulated inorganic resists which are compatible with conventional resist processing such as spin casting from organic solvents and development with aqueous 2.38% TMAH developers. The resist includes encapsulated inorganic materials as resist components, a fact that significantly increases the plasma etch selectivity of the resists compared to conventional polymeric resists. In effect, these resist systems act as a photoimagable single layer hard mask, although use as the top layer in a bilayer resist scheme is contemplated.

Abstract: The invention provide methods and compositions for localized delivery of a vector comprising a therapeutic agent to a specific region of the brain that is overstimulated in neurodegenerative diseases. In particular, the invention provides methods and compositions used to deliver an adeno-associated virus vector (AAV) comprising a nucleotide sequence encoding glutamic acid decarboxylase (GAD) to cells in the subthalmic nucleus of the basal ganglia, mesaphilia and thalmus.

Abstract: Methods for the preparation of multilayered resists are described. A first layer of photoresist is deposited onto a substrate. First portions of the first layer are exposed to a first dose of radiant energy. A second layer of photoresist is deposited at atop the first layer and second portions of the second layer are exposed to a second varied dose of radiant energy. The dose is modulated over different portions of a layer to preferentially enhance development within the interior of the structure to reduce total development times.

Abstract: A wafer holder assembly includes first and second main structural members from which first and second wafer-holding arms extend. The first arm is secured to the main structural members by a graphite distal retaining member. The second arm is pivotally biased to a wafer-hold position by a graphite bias member. This arrangement provides a conductive path from the wafer to the assembly for inhibiting electrical discharges from the wafer during the ion implantation process. The assembly can further include additional graphite retaining members for maintaining the structural integrity of the assembly during the extreme conditions associated with SIMOX wafer processing without the need for potentially wafer-contaminating adhesives and conventional fasteners. The wafer-contacting pins at the distal end of the arms can be formed from silicon. The silicon pins can be coated with titanium nitride to enhance electrical contact with the wafer and to provide an abrasion resistant surface.

Abstract: The present invention provides a high switching capacity network device in one telco rack including both physical layer switch/router subsystems and an upper layer switch/router subsystem. Instead of providing a single physical layer switch/router subsystem, multiple physical layer switch/router subsystems are provided. Segmenting the physical layer switch/router into multiple, for example, four, subsystems better utilizes routing resources by allowing etches for the physical layer subsystems to be moved away from the center of the mid-plane/back-plane of the network device. Moving the physical layer subsystem etches away from the center of the mid-plane enables the network device to include an upper layer/switch router subsystem with etches toward the center of the mid-plane.

Abstract: The invention is directed to methods for producing a decellularized organ or part of an organ. A decellularized organ is produced using an isolated organ mechanically agitated to remove cellular membranes surrounding the isolated organ without destroying the interstitial structure of the organ. After the cellular membrane is removed, the isolated organ is exposed to a solubilizing fluid that extracts cellular material without dissolving the interstitial structure of the organ. A washing fluid is used to remove the solubilized components, leaving behind a decellularized organ.

Abstract: The present invention provides a heating assembly that includes a thermally conductive, lamp-mounting block manufactured from aluminum or a similar material, which can be machined as a single-piece (e.g., unibody) block. The unibody block includes one or more networks of inner passageways bored or otherwise machined within the block for transporting one or more cooling fluids. The mounting block can also have a reflective coating on one or more of its surfaces that face the lamps to efficiently reflect heat and/or light generated by the lamps onto a desired surface, for example, a semiconductor wafer. Thermal isolation devices, e.g., pads, provide for both physical mounting of the heating lamps to the mounting block and also provide thermal isolation between the heating lamp and its electrical connections are also disclosed to protecting heat-sensitive elements of the heating assembly such as seals.

Abstract: The present invention provides a computer system having a control process and a device driver process that is in communication with the control process, and a local back-up process, independent of both the control process and the device driver process. The local back-up process facilitates recovery of the device driver process. In one aspect of the invention, the computer system is a network device that includes a control plane and a data plan. The control plane includes a control process, and the data plane includes a device driver process. A local back-up process, independent of both the control process and the device driver process, facilitates recovery of the device driver process if the device driver process is terminated.

Abstract: Methods for the preparation of multilayered resists include exposure of the a first layer to radiation followed by exposure to an oxidizing agent. The oxidizing agent alters the surface characteristics of the first resist layer such that it is rendered more hydrophilic than the original resist layer. A second layer of resist is then applied to the oxidized surface of the first resist layer and exposed to radiation. This process can be repeated for thousands of coating layers, thereby permitting stereolithographic patterning of parts and construction of micromachines. A final treatment with a dissolution solution will dissolve unwanted resist material. Dependent upon the type of resist material used in the multilayered resist, the dissolution solution can remove the radiation exposed areas, e.g., a positive resist, or remove unexposed areas, e.g., a negative resist.

Abstract: The present invention provides an intra-ocular lens (IOL) whose focusing performance can be modified after its implantation in the eye without a need for any invasive procedure. An IOL of the invention has an optical chamber having at least a flexible region that is deformable under influence of a fluid. The IOL further include a reservoir for storing an optical fluid in fluid communication with the optical chamber, and a valve that regulates the fluid communication between the reservoir and the optical chamber. The lens can also include a pump that is actuated by an external energy source to transfer the optical fluid between the reservoir and the optical chamber to change the amount of fluid in the optical chamber, thereby modifying the focusing performance of the IOL.

Abstract: A method and apparatus are provided for radiation treatment on a patient by use fiber laser and/or a tunable laser, a tunable fiber laser being used for preferred embodiments. Wavelength may be controlled to control depth of penetration and/or radiation absorption and may be scanned to scan depth of penetration.

Abstract: Computer systems and methods of data processing are disclosed in which hierarchical levels of fault/event management are provided that intelligently monitor hardware and software and proactively take action in accordance with a defined fault policy. A fault policy based on a defined hierarchy ensures that for each particular type of failure the most appropriate action is taken. In one embodiment, a master Software Resiliency Manager (SRM) serves as the top hierarchical level fault/event manager, with one or more slave SRMs serving as the next hierarchical level fault/event manager. The software applications resident on each board can also include sub-processes (e.g., local resiliency managers or LRMs) that serve as the lowest hierarchical level fault/event managers.