Patents Assigned to A-Tech Corporation
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Patent number: 11994529Abstract: The object of the invention is to avoid a decrease in dispensing accuracy of a sample, a reagent, or the like as a temperature changes. In an automatic analyzer, a dispensing nozzle sucks the sample from a sample container holding the sample and discharges the sample to a reaction container. A syringe pump controls an amount of change in a volume of water. A first pipe connects the dispensing nozzle and the syringe pump. An electromagnetic valve flows or stops the water. A second pipe connects the electromagnetic valve and the syringe pump. A branch pipe branches the water. A third pipe connects the electromagnetic valve and the branch pipe. A case accommodates at least the syringe pump, the first pipe, the electromagnetic valve, the second pipe, the branch pipe, and the third pipe. Further, the third pipe includes a heat exchange unit that performs heat exchange of the water.Type: GrantFiled: April 19, 2023Date of Patent: May 28, 2024Assignee: Hitachi High-Tech CorporationInventors: Shinji Azuma, Isao Yamazaki, Masashi Fukaya, Takumi Ito
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Patent number: 11990311Abstract: A charged particle source is provided that exhibits small energy dispersion for charged particle beams emitted under a high angular current density condition and allows stable acquisition of large charged particle currents even for a small light source diameter. The charged particle source has a spherical virtual cathode surface from which charged particles are emitted, and the virtual cathode surface for charged particles emitted from a first position on a tip end surface of an emitter and the virtual cathode surface for charged particles emitted from a second position on the tip end surface of the emitter match each other.Type: GrantFiled: April 4, 2023Date of Patent: May 21, 2024Assignee: Hitachi High-Tech CorporationInventors: Masahiro Fukuta, Kazuhiro Honda
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Patent number: 11987880Abstract: Provided is a manufacturing method of an interior member of a plasma processing apparatus, which improves processing yield. The interior member is disposed inside a processing chamber of the plasma processing apparatus and includes, on a surface thereof, a film of a material having resistance to plasma. The manufacturing method includes: a step of moving a gun by a predetermined distance along the surface of the interior member to spray the material to form the film, and disposing a test piece having a surface having a shape simulating a surface shape of the interior member within a range of the distance within which the gun is moved and forming the film of the material on the surface of the test piece; and a step of adjusting, based on a result of detecting a crystal size of the film on the surface of the test piece and presence or absence of a residual stress or inclusion of a contaminant element, a condition of forming the film on the surface of the interior member by the gun.Type: GrantFiled: December 23, 2019Date of Patent: May 21, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Kazuhiro Ueda, Masaru Kurihara, Kazuyuki Ikenaga, Tomoyuki Tamura
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Publication number: 20240159789Abstract: The present invention enables automatic detection of failure in a plunger in a syringe pump unit by an automated analysis device, which includes a sample dispensing mechanism; a reagent dispensing mechanism; and a control unit for controlling operation of the sample dispensing mechanism and the reagent dispensing mechanism and analyzing the sample. The sample dispensing mechanism and the reagent dispensing mechanism each have a plunger for suctioning in and expelling liquid, and a plunger drive unit for driving the plunger. The control unit controls operation with the plunger drive unit of the reagent dispensing mechanism so that the plunger moves reciprocally by a backlash distance a predetermined number of times. Failure of the plunger is detected by detecting, using the liquid level sensing function, the amount of liquid discharged into the liquid storage container.Type: ApplicationFiled: December 3, 2021Publication date: May 16, 2024Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yuichi Iwase, Takushi Miyakawa, Shunsuke Miyamoto, Masafumi Miyake
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Patent number: 11982681Abstract: Provided is an electrolyte analyzing device in which contamination caused by contacting different reagents with a suction nozzle is prevented when reagent replacement is performed by a user. The electrolyte analyzing device includes a reagent container setting unit 502 that sets a dilute solution bottle 101-1 which houses a dilute solution, an internal standard solution bottle 101-2 which houses an internal standard solution, and a reference electrode solution bottle 101-3 which houses a reference electrode solution. The reagent container setting unit includes a partition wall between the dilute solution bottle 101-1 and the internal standard solution bottle 101-2, and the reference electrode solution bottle 101-3 when the dilute solution bottle 101-1, the internal standard solution bottle 101-2, and the reference electrode solution bottle 101-3 are set.Type: GrantFiled: March 26, 2019Date of Patent: May 14, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Takushi Miyakawa, Masaki Hara, Tetsuji Kawahara
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Patent number: 11982655Abstract: The present invention makes it possible to realize an analysis apparatus having a plurality of liquid chromatographs capable of judging separation performance and the like at the right timing and improving analysis performance early. Analysis starts and a mixed sample is prepared by adding a non-retaining ingredient to a measurement object sample and is introduced into an analysis flow path (S401 to S404). The mixed sample is separated into components by a separation column, the components are outputted as chromatogram data by a detector, and the analysis finishes (S404 to S406). Retention time and peak information are acquired from the chromatogram outputted from the detector, whether or not a measurement result is within an allowable range is judged, and the process shifts to next analysis when the measurement result is within the allowable range (S407 to S409).Type: GrantFiled: November 19, 2019Date of Patent: May 14, 2024Assignee: Hitachi High-Tech CorporationInventors: Daisuke Akieda, Makoto Nogami, Iwao Suzuki, Masako Kawarai, Izumi Ogata, Shinya Ito
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Patent number: 11982631Abstract: A defect detection device including an illumination optical system, an image capturing optical system configured to capture an image of scattered light generated by the illumination optical system irradiating the wafer, and an image processing unit configured to process a picture of the image of the scattered light to extract a defect on the wafer. The image capturing optical system includes an objective lens, a filter unit configured to shield a part of light transmitted through the objective lens, and an imaging lens configured to form an image of light transmitted through the filter unit. The filter unit includes a first microlens array configured to condense parallel light transmitted through the objective lens, a shutter array including a light transmission unit at a focus position of the first microlens array, and a second microlens array disposed opposite to the first microlens array with respect to the shutter array.Type: GrantFiled: March 12, 2019Date of Patent: May 14, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yuko Otani, Kazuo Aoki, Shunichi Matsumoto, Yuta Urano
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Patent number: 11983659Abstract: The present invention realizes a medical material transport system that is low-cost, stable, and safe, the medical material transport system being such that even if a failure occurs in an individual specimen transport device, the failure does not extend to the system as a whole. Collection of a specimen is requested from a specimen collection request terminal 107, and a management unit (108) issues a reception command 110 for the specimen. A drone 101 that has received the reception command 110 for the specimen departs from a standby dock 105 on the basis of the received information and flies to a specimen recovery location 106, and a specimen tray for placing the specimen is taken out from a specimen holder 102. A specimen container is contained in the specimen tray, and the specimen tray is returned to the specimen holder 102 and locked using a lock mechanism.Type: GrantFiled: February 5, 2020Date of Patent: May 14, 2024Assignee: Hitachi High-Tech CorporationInventor: Hikaru Takizawa
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Patent number: 11978612Abstract: A plasma processing apparatus includes a processing chamber in which a sample is subjected to plasma processing, a first radio frequency power supply that supplies radio frequency power for generating plasma, a sample stage on which the sample is mounted, and a second radio frequency power supply that supplies radio frequency power to the sample stage, the plasma processing apparatus further includes a DC power supply that applies a DC voltage, that is changed according to a periodically repeated waveform, to the sample stage, and the waveform of one cycle has a period in which amplitude changes by a predetermined amount or more during a predetermined time. Accordingly, charged particles on a wafer surface are removed, a trench shape with high verticality can be obtained, and damage to a film that is not to be etched inside a trench can be reduced.Type: GrantFiled: July 11, 2022Date of Patent: May 7, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Isao Mori, Masaru Izawa, Naoki Yasui, Norihiko Ikeda, Kazuya Yamada
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Patent number: 11977035Abstract: A surface shape detection device using differential interference optics achieves restoration error reduction of a surface shape while maintaining resolution.Type: GrantFiled: April 8, 2019Date of Patent: May 7, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Kenichiro Yamada, Shinsuke Onoe, Makoto Hosaka
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Patent number: 11977099Abstract: A method for manufacturing a semiconductor device in which probes and the layout of the electrode pads of a test element group (TEG) are associated is provided. As a semiconductor device is miniaturized, a scribe area on a wafer also tends to decrease. Accordingly, it is necessary to reduce the size of a TEG arranged in the scribe area, and efficiently arrange an electrode pad for probe contact. Thus, it is necessary to associate the probes and the layout of the electrode pad. According to the method, a layout of a TEG electrode pad corresponding to a plurality of probes arranged in a fan shape or probes manufactured by Micro Electro Mechanical Systems (MEMS) technology is provided.Type: GrantFiled: February 6, 2018Date of Patent: May 7, 2024Assignee: Hitachi High-Tech CorporationInventors: Tomohisa Ohtaki, Takayuki Mizuno, Ryo Hirano, Toru Fujimura, Shigehiko Kato, Yasuhiko Nara, Katsuo Ohki, Akira Kageyama, Masaaki Komori
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Patent number: 11977050Abstract: An analysis unit 111 for automatically analyzing a sample comprises a sample dispensing nozzle 2 for dispensing the sample and an electrolyte measurement unit 114 for carrying out internal standard liquid measurement one or more times at least before measuring the electric potential of the sample. If the electrolyte measurement unit 114 is to carry out the electric potential measurement of the sample in succession, a different internal standard liquid measurement operation is carried out before the electric potential measurement than if the electric potential measurement is not to be carried out in succession and there are to be gaps between measurement intervals. This results in the provision of an automated analyzer, automatic analysis system, and automatic sample analysis method that make it possible to reduce the influence of ambient temperature on electrolyte measurement, ensure measurement accuracy, and enhance overall device processing capacity.Type: GrantFiled: October 30, 2019Date of Patent: May 7, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Masashi Fukaya, Akihiro Yasui
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Patent number: 11977026Abstract: This invention addresses the abovementioned problem, and the purpose of this invention is to provide a far-infrared spectroscopy device that uses an is-TPG method to generate far-infrared light, and is capable of efficiently detecting is-TPG light without a detection optical system being fine-tuned. Even if the far-infrared light incidence angles on an Si prism for detection are the same when far-infrared light having a first frequency is incident on a non-linear optical crystal for detection and when far-infrared light having a second frequency is incident on the non-linear optical crystal for detection, this far-infrared spectroscopy device adjusts the incidence surface angle of pump light in relation to the non-linear optical crystal for detection such that the angle of the far-infrared light in relation to the pump light within the non-linear optical crystal for detection can be appropriately set for each far-infrared light frequency (see FIG. 1A).Type: GrantFiled: December 27, 2019Date of Patent: May 7, 2024Assignee: Hitachi High-Tech CorporationInventors: Mizuki Mohara, Kei Shimura, Kenji Aiko
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Patent number: 11978609Abstract: An electron gun EG in which mixing of secondary electrons is suppressed is provided. The electron gun EG has an electron source 1, an extraction electrode 2 for extracting an electron beam E1 from the electron source 1, and an acceleration electrode for accelerating the extracted electron beam E1. The extraction electrode 2 includes a diaphragm 4 for allowing a part of the electron beam E1 to pass through, a shield 5 positioned above the diaphragm 4 apart from the diaphragm 4, and a shield 6 positioned below the diaphragm 4 apart from the diaphragm 4. The diaphragm 4 has an opening OP4 having an opening diameter D4, the shield 5 has an opening OP5 having an opening diameter D5 which is greater than the opening diameter D4, and the shield 6 has an opening OP6 having an opening diameter D6 which is greater than the opening diameter D4.Type: GrantFiled: May 21, 2019Date of Patent: May 7, 2024Assignee: Hitachi High-Tech CorporationInventor: Minoru Kaneda
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Publication number: 20240142477Abstract: Provided is an automatic analyzer without necessity of manual air vent in a pump. This automatic analyzer comprises a water supply tank, a supply path connected to each mechanism of an automatic analyzer from the water supply tank, a water supply pump which supplies water to each mechanism from the water supply tank through the supply path, a detector which detects abnormality in the supply path, a waste liquid path branched from the supply path in a branch pipe provided in the supply path, a relief valve provided in the waste liquid path, and a control unit which controls the operation of each mechanism in the automatic analyzer, in which the control unit opens the relief valve while driving the water supply pump, based on the abnormality in the supply path detected by the detector.Type: ApplicationFiled: February 17, 2022Publication date: May 2, 2024Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yasuhisa Oguro, Hiroyuki Takayama, Kouhei Nonaka
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Patent number: 11971423Abstract: An automatic analyzer is capable of transporting a sample at an optimum timing and a method of transporting the sample. An automatic analyzer includes an analysis unit which measures a sample, a transport unit which transports the sample to the analysis unit, and a control unit which controls the analysis unit and the transport unit. A sample is transported to the analysis unit by a time of starting an aspirating operation on the sample by allowing the analysis unit to perform a pre-measurement operation for each measuring method which needs to be performed before aspirating the sample even when the sample is still in the transport unit.Type: GrantFiled: May 16, 2019Date of Patent: April 30, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Naoto Suzuki, Masashi Akutsu, Akihiro Yasui
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Patent number: 11971425Abstract: An automatic analysis device has a plurality of types of photometers having different quantitative ranges, and an analysis control unit for quantifying the desired component in specimens based on measurement values of one or more photometers selected from among the plurality of types of photometers. The analysis control unit: sets a switching region in an overlap region of respective quantitative ranges of the plurality of types of photometers, said switching region having a greater width than does the variation in quantitative values of the desired component based on the measurement values of photometers having the same specimen; compares the quantitative value of a quantitative range portion that corresponds to the switching region and the quantitative values of the desired component based on the measurement values of the photometers; and selects a photometer to be used in quantitative output of the desired component from among the plurality of types of photometers.Type: GrantFiled: April 28, 2023Date of Patent: April 30, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yuto Kazama, Masahiko Iijima, Sakuichiro Adachi
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Patent number: 11971426Abstract: An automatic analysis device that avoids carryover and prevents deterioration of analysis performance without controlling reaction cell position is provided with: a reaction cell in which a sample and a reagent are mixed and allowed to react; a light source that radiates light onto the mixed liquid of the sample and the reagent; a detector that detects the light radiated from the light source; and a cleaning mechanism that cleans the reaction cell. The cleaning mechanism includes an intake nozzle that draws in liquid from the reaction cell and a discharge nozzle that discharges the liquid into the reaction cell; the intake nozzle and the discharge nozzle can move vertically; and the intake nozzle is cleaned by lowering the intake nozzle into the reaction cell, in which a cleaning liquid or cleaning water have been accumulated, without drawing in the cleaning liquid or the cleaning water.Type: GrantFiled: January 23, 2019Date of Patent: April 30, 2024Assignee: Hitachi High-Tech CorporationInventors: Rei Konishi, Nobuhiko Sasaki, Masahiko Iijima
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Patent number: D1028792Type: GrantFiled: November 23, 2022Date of Patent: May 28, 2024Assignee: Hitachi High-Tech CorporationInventors: Akira Kojima, Hiroki Takahashi, Tomohiro Inoue, Tomoko Tomiyama
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Patent number: D1029023Type: GrantFiled: April 23, 2021Date of Patent: May 28, 2024Assignee: Hitachi High-Tech CorporationInventors: Yayoi Konishi, Fuka Matsudaira, Masaki Takano, Masataka Okayama, Hideki Watanabe, Jin Shimizu