Patents Assigned to ABB Ricerca SpA
  • Patent number: 6392331
    Abstract: A bistable actuator for residual-current devices, including a lamina having at least one face, a first end, and a second end, and configured to actuate from a first stable position to a second stable position; at least one layer of piezoelectric material provided on the at least one face of the lamina at the first end of the lamina, and configured to stimulate the lamina to shift from the first stable position to the second stable position in response to an electrical activation signal; and a support element including an interlock coupling, and configured to support the first end and the second end of the lamina, wherein the interlock coupling is configured to interlock the first end of the lamina to the support element, and the second end of the lamina is rigidly coupled to the support element in order to keep the lamina in the first stable position.
    Type: Grant
    Filed: December 23, 1999
    Date of Patent: May 21, 2002
    Assignee: ABB Ricerca SpA
    Inventors: Aldo Sciacca, Pietro Mandurino, Donato Colonna, Franco Moriconi
  • Patent number: 6242845
    Abstract: An electronic driving circuit for a bistable actuator activated by piezoelectric elements, particularly for residual-current devices, the circuit including a voltage step-up device suitable to step up and store a voltage generated across a secondary winding of a current sensor. The step-up device is connected to a threshold setting device suitable to determine an intervention threshold of a bistable actuator activated by piezoelectric elements, whose activation is determined by an excitation voltage applied across the bistable actuator which is higher than the voltage threshold set by the threshold setting device.
    Type: Grant
    Filed: December 23, 1999
    Date of Patent: June 5, 2001
    Assignee: ABB Ricerca SpA
    Inventors: Franco Colombo, Donato Colonna, Angelo Manara, Walter Turati, Salvatore Brandonisio
  • Patent number: 6235236
    Abstract: An emission treatment apparatus for manufacturing plants including an inlet duct, a decantation chamber and an outlet duct. The emission treatment apparatus advantageously includes elements located inside of the decantation chamber for rendering uniform the flow of the emissions.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: May 22, 2001
    Assignee: ABB Ricerca SpA
    Inventors: Gianfranco Velcich, Enrico Malfa, Francesca Nappini