Abstract: An apparatus, system, and method for managing an electrostatic charge of a workpiece are disclosed. The method comprises coupling an electrostatic voltmeter to a conductor, coupling a charge-adjustment system to the conductor, and coupling the conductor to the workpiece. A level of charge in the workpiece is adjusted, via the conductor, with the charge-adjustment circuit and a voltage of the workpiece is monitored, via the conductor, with the electrostatic voltmeter. A controller may be used to adjust the charge on the workpiece based upon the monitored voltage.

Abstract: Bias supplies and plasma processing systems are disclosed. One bias supply comprises an output node, a return node, and a switch network and at least one power supply coupled to the output node and the return node. The switch network and the at least one power supply configured, in combination, to apply an asymmetric periodic voltage waveform and provide a corresponding current waveform at the output node relative to the return node. A metrology component is configured to receive and sample voltage and current signals indicative of a full cycle of the periodic voltage waveform and the corresponding current waveform to provide digital representations of a full cycle of the asymmetric periodic voltage waveform and a full cycle of the corresponding current waveform.

Abstract: The invention provides a control circuit for controlling the operation of a power converter having a switch connected to an output of the power converter, said control circuit comprising a first amplifier for sensing an output voltage of the power converter and a second amplifier configured to derive a frequency compensated error signal output, to provide a frequency control compensation loop to an input of the power converter and the output of the second amplifier is connected to the switch of the power converter.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheath(s) proximate to the bias electrodes.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: Systems and methods for plasma processing are disclosed. A method includes applying pulsed power to a plasma processing chamber with an excitation source during a first processing step with a first duty cycle and applying, during the first processing step, an asymmetric periodic voltage waveform to a substrate support to produce a first plasma sheath voltage between a substrate and a plasma. Pulsed power is applied to the plasma processing chamber with the excitation source during a second processing step with a second duty cycle and during the second processing step, a different asymmetric periodic voltage waveform is applied to the substrate support to produce a different plasma sheath voltage between the substrate and the plasma.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: An optical gas concentration measurement apparatus is disclosed. The optical gas concentration measurement apparatus includes a thermally insulated enclosure that has a gas sample cell situated within. A thermally-insulating, light-guiding element passes through an access port of the thermally insulated enclosure and is configured to direct light from a light source outside of the thermally insulated enclosure to the gas sample cell. A light detector outside of the thermally insulated enclosure is optically coupled to the gas sample cell and an electronic assembly outside of the thermally insulated enclosure is configured to receive information from the light detector.

Abstract: A plasma processing chamber optical temperature sensor is disclosed. The plasma processing chamber optical temperature sensor includes a light source, a light detector, and a means for transmitting light through a wall of a plasma processing chamber. An optical temperature sensing element is thermally coupled to a plasma processing chamber component within the plasma processing chamber. The optical temperature sensing element includes a monolithic crystalline phosphor element configured to be excited by light from the light source and to emit light back to the light detector indicative of a temperature of the monolithic crystalline phosphor element.

Abstract: This disclosure describes systems, methods, and apparatus for reducing current imbalances between phases in a multi-phase converter as well as reducing instances of particular phases switching twice within a single pulse-width modulated cycle, or other time period. Phases that have not switched for a longest period of time can be compared to see if swapping their firing patterns would reduce current imbalances, and if so, then those firing patterns can be swapped.

Abstract: This disclosure describes systems, methods, and apparatus for non-invasive wafer chuck monitoring using a low voltage AC signal injected into a high voltage DC chucking voltage provided to a wafer chuck. Monitoring the injected signal can provide insight into the wafer chucking state and remedial actions, such as realignment of the wafer with the wafer chuck, can be carried out. Because of the low voltage nature of the AC signal, wafer chuck monitoring can be performed without influencing chucking performed by the higher voltage DC chucking voltage.

Abstract: A power supply system controls the source impedance of a generator utilizing two amplifiers having asymmetrical power profiles in reference to a nominal load impedance that are diametrically opposite in reference to the nominal load impedance. Variations in power profiles may be achieved by using different topologies for each of the amplifiers or implementing a phase delay network. The output power from the first and second amplifiers may be combined using a combiner circuit or device and the output power from the combiner is transmitted to a plasma load. The output power of each amplifier may be independently controlled to alter one or more characteristics of the output power signal provided by the individual amplifiers. By changing the ratio of the output power of the first amplifier to the output power of the second amplified, the source impedance of the generators may be varied.

Abstract: A virtual resistive load feedback circuit for driving a piezoelectric actuator is provided that accounts for a hysteresis error and drift within the movement of the actuator. The circuit may include a voltage divider and charge divider. A voltage monitor signal corresponding to a voltage of a driver signal and a current monitor signal corresponding to a current provided to the amplifier are combined by an operational amplifier and include electrical characteristics of the actuator such that the circuit approximates a virtual load across the actuator. A feedback portion of the operational amplifier may include a resistor and capacitor connected in parallel to provide the voltage and charge divide functions. The use of the virtual resistive circuit allows for the piezoelectric actuator to be ground referenced, with no external components connected directly to the actuator while gaining the feedback effect to counter the hysteresis and drifts errors of the actuator.

Abstract: Plasma processing systems and methods are disclosed. The plasma processing system includes a high-frequency generator configured to deliver power to a plasma chamber and a low-frequency generator configured to deliver power to the plasma chamber. A filter is coupled between the plasma chamber and the high-frequency generator, and the filter suppresses mixing products of high frequencies produced by the high-frequency generator and low frequencies produced by the low-frequency generator.

Abstract: A generator produces output such as delivered power, voltage, current, forward power etc. that follows a prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling sections of the pattern based on measurements taken one or more repetition periods in the past. A variable impedance match network may control the impedance presented to a radio frequency generator while the generator produces the output that follows the prescribed pattern of output versus time where the pattern repeats with a repetition period by controlling variable impedance elements in the match during sections of the pattern based on measurements taken one or more repetition periods in the past.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber comprising a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: This disclosure relates to apparatus and methods for radio-frequency (RF) switching circuits, and more particularly for a PIN diode driver circuit for high speed, high repetition rate and/or high power applications. The PIN diode driver may include a dual voltage reverse bias provided to the PIN diode, which dual voltage reverse bias may be provided by a first, relatively lower voltage, power supply and a second, relatively higher voltage, power supply. The relatively lower voltage is to discharge an intrinsic layer of the PIN diode at a lower voltage than during reverse bias of the PIN diode at the second relatively higher bias voltage in order to reduce overall power consumption.

Abstract: This disclosure describes systems, methods, and apparatus for a digital-to-analog (DAC) converter, that can be part of a variable capacitor and/or a match network. The DAC can include a digital input, an analog output, N contributors (e.g., switched capacitors), and an interconnect topology connecting the N contributors, generating a sum of their contributions (e.g., sum of capacitances), and providing the sum to the analog output. The N contributors can form a sub-binary sequence when their contributions to the sum are ordered by average contribution. Also, the gap size between a maximum contribution of one contributor, and a minimum contribution of a subsequent contributor, is less than D, where D is less than or equal to two time a maximum contribution of the first or smallest of the N contributors.

Abstract: Systems, methods, and an apparatus for current monitoring are disclosed. A current monitor comprises a high-voltage side configured to obtain a signal indicative of current through a conductor and apply different levels of gain to different frequency bands of the signal to produce an adjusted signal. A low-voltage side of the current monitor is electrically isolated from the high-voltage side and is configured to split the adjusted signal to produce a plurality of output signals that are each indicative of a level of current at one of the different frequency bands. An isolation amplifier is configured to communicate the adjusted signal from the high-voltage side to the low-voltage side while electrically isolating the high-voltage side from the low-voltage side.