Patents Assigned to Advanced Process Technologies, LLC
  • Semiconductor cleaning using superacids
    Patent number: 7923424
    Abstract: A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: April 12, 2011
    Assignee: Advanced Process Technologies, LLC
    Inventor: Robert J. Small