Abstract: An apparatus and method for reprocessing waste piranha containing contaminated H.sub.2 SO.sub.4 from, for example, a semiconductor processing operation is described. The apparatus and method include a first distillation flask which is maintained under a substantial vacuum. The first distillation flask includes a first column packed with a column packing material and an input pipe for refluxing to retard loss of H.sub.2 SO.sub.4 in the first distillation. The second distillation flask boils off substantially pure H.sub.2 SO.sub.4 and provides for a continuous automatic purge of the contaminants from the second distillation flask thus improving the purity of the H.sub.2 SO.sub.4. The substantially pure H.sub.2 SO.sub.4 flows through a column which is coupled to a condenser which condenses substantially pure H.sub.2 SO.sub.4.

Abstract: An apparatus and method for reprocessing waste oxidant solution containing contaminated H.sub.2 SO.sub.4 from, for example, a semiconductor processing operation to supply reprocessed ultrapure H.sub.2 SO.sub.4 and ozone is described. The apparatus and method include a two distillation flasks which are maintained under a substantial vacuum. The first distillation flask includes a first column with a column packing means and a reflux means to retard loss of H.sub.2 SO.sub.4 in the first distillation. The second distillation flask boils off substantially pure H.sub.2 SO.sub.4 through a column which is coupled to a condenser which condenses substantially pure H.sub.2 SO.sub.4. The apparatus and method further include an ozone generator and ozone addition module to saturate the substantially pure H.sub.2 SO.sub.4 with ozone to provide an oxidant solution for the semiconductor processing operation.

Abstract: An apparatus and method for reprocessing waste piranha containing contaminated H.sub.2 SO.sub.4 from, for example, a semiconductor processing operation is described. The apparatus and method include a first distillation flask which are maintained under a substantial vacuum. The first distillation flask includes a first column with a column packing means and a reflux means to retard loss of H.sub.2 SO.sub.4 in the first distillation. The second distillation flask boils off substantially pure H.sub.2 SO.sub.4 through a column which is coupled to a condenser which condenses substantially pure H.sub.2 SO.sub.4.

Abstract: A two-step distillation process provides semiconductor purity, concentrated hydrofluoric acid. Further, the distillation process, occurring under reduced pressures eliminates essentially pure water after the first distillation step. The product output of the second distillation process provides an acid of weight percent greater than 27 weight percent. The product acid is carefully diluted to the required concentrations during the dilution step.