Patents Assigned to AmberWave Systems Coporation
  • Defect Reduction Using Aspect Ratio Trapping
    Publication number: 20080099785
    Abstract: Lattice-mismatched epitaxial films formed proximate non-crystalline sidewalls. Embodiments of the invention include formation of facets that direct dislocations in the films to the sidewalls.
    Type: Application
    Filed: September 7, 2007
    Publication date: May 1, 2008
    Applicant: AmberWave Systems Coporation
    Inventors: Jie Bai, Ji-Soo Park, Anthony Lochtefeld