Patents Assigned to ancosys GmbH
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Publication number: 20240044039Abstract: Electrochemical analysis method and system for monitoring and controlling the quality of electrochemical deposition and/or plating processes. The method uses a fingerprinting analysis method of an output signal to indicate whether the chemistry and/or process is operating in the normally expected range and utilizes one or more substrates as working electrode(s) and a) whereby the potential between the one or more working electrodes and one or more reference electrodes is analyzed to provide an output signal fingerprint which is represented as potential difference as a function of time or b) the input power of a process power supply to provide input energy in the form of current and/or potential between the working electrode(s) and a counter-electrode whereby the method utilizes the potential between the one or more working electrode(s) and at least one of: one or more reference electrodes; or one or more counter-electrodes; to provide an output signal fingerprint.Type: ApplicationFiled: July 3, 2023Publication date: February 8, 2024Applicant: ANCOSYS GMBHInventors: Juerg Stahl, Norbert Schroeder, Fred Richter
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Patent number: 11692282Abstract: Electrochemical analysis method and system for monitoring and controlling the quality of electrochemical deposition and/or plating processes. The method uses a fingerprinting analysis method of an output signal to indicate whether the chemistry and/or process is operating in the normally expected range and utilizes one or more substrates as working electrode(s) and a) whereby the potential between the one or more working electrodes and one or more reference electrodes is analyzed to provide an output signal fingerprint which is represented as potential difference as a function of time or b) the input power of a process power supply to provide input energy in the form of current and/or potential between the working electrode(s) and a counter-electrode whereby the method utilizes the potential between the one or more working electrode(s) and at least one of: one or more reference electrodes; or one or more counter-electrodes; to provide an output signal fingerprint.Type: GrantFiled: September 9, 2020Date of Patent: July 4, 2023Assignee: ancosys GmbHInventors: Juerg Stahl, Norbert Schroeder, Fred Richter
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Patent number: 10996093Abstract: Device for metering powder, in particular in clean-rooms, which includes a vessel containing powder and a sealing head with a septum for the vessel, wherein the sealing head is connectable powder-tight with the vessel and the septum powder-tight with the sealing head and the device further includes a vessel holder, which serves to hold the sealing head of the vessel, and the vessel with its opening points downwards, so that the powder can flow out of the vessel, wherein a gap is provided between the sealing head and a holding bowl of the vessel holder, in which a gas flow between the holding bowl and the sealing head can be created. The invention also relates to a use of the device and a metered addition method.Type: GrantFiled: March 14, 2017Date of Patent: May 4, 2021Assignee: ANCOSYS GMBHInventors: Juerg Stahl, Irene Popova, Christian Rueckl
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Patent number: 10982987Abstract: Device for metering powder, in particular in clean-rooms, which includes a vessel containing powder and a sealing head with a septum for the vessel, wherein the sealing head is connectable powder-tight with the vessel and the septum powder-tight with the sealing head and the device further includes a vessel holder, which serves to hold the sealing head of the vessel, and the vessel with its opening points downwards, so that the powder can flow out of the vessel, wherein a gap is provided between the sealing head and a holding bowl of the vessel holder, in which a gas flow between the holding bowl and the sealing head can be created. The invention also relates to a use of the device and a metered addition method.Type: GrantFiled: March 6, 2020Date of Patent: April 20, 2021Assignee: ANCOSYS GMBHInventors: Juerg Stahl, Irene Popova, Christian Rueckl
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Patent number: 10876219Abstract: The invention relates to an electrochemical analysis method for monitoring and controlling the quality of electrochemical deposition and/or plating processes whereby the electrochemical analysis method uses a fingerprinting analysis method of an output signal to have an indicator of whether the chemistry and/or process is operating in the normally expected range, whereby the method utilizes one or more substrates as working electrode(s) and a) whereby the potential between the one or more working electrodes and one or more reference electrodes being analyzed to provide an output signal fingerprint which is represented as potential difference as a function of time or b) the input power of a process power supply to provide input energy in the form of current and/or potential between the working electrode(s) and a counter-electrode whereby the method utilizes the potential between the one or more working electrode(s) and at least one of: one or more reference electrodes; or one or more counter-electrodes; to proType: GrantFiled: July 2, 2014Date of Patent: December 29, 2020Assignee: ANCOSYS GMBHInventors: Juerg Stahl, Norbert Schroeder, Fred Richter
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Patent number: 10156019Abstract: Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.Type: GrantFiled: November 3, 2017Date of Patent: December 18, 2018Assignees: International Business Machines Corporation, Ancosys GmbHInventors: Charles L. Arvin, Jürg Stahl
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Publication number: 20180051385Abstract: Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.Type: ApplicationFiled: November 3, 2017Publication date: February 22, 2018Applicants: International Business Machines Corporation, Ancosys GmbHInventors: Charles L. Arvin, Jürg Stahl
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Patent number: 9863051Abstract: Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.Type: GrantFiled: August 20, 2015Date of Patent: January 9, 2018Assignees: International Business Machines Corporation, Ancosys GmbHInventors: Charles L. Arvin, Jürg Stahl
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Patent number: 9481940Abstract: Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.Type: GrantFiled: June 26, 2014Date of Patent: November 1, 2016Assignees: International Business Machines Corporation, Ancosys GMBHInventors: Charles L. Arvin, Jürg Stahl
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Patent number: 8528593Abstract: Method for carrying out a bleed and feed of process solutions in a process tank. The feed solution is pumped out of a first tank into a first receiving space. The first receiving space is subsequently emptied into the process tank of with a pump. The volume of delivered feed solution in the process tank is measured. The bleed solution is pumped from the process tank with a pump into a second receiving space. The volume of delivered bleed solution in the second receiving space is measured. The bleed solution in the second receiving space is subsequently emptied into the second tank. The first receiving space differs from the second receiving space. A correction factor is calculated by comparing the measured and calculated volumes of the bleed and feed solution delivered by the pumps, with which correction factor the nominal delivery volume of the pumps are corrected in the next cycle.Type: GrantFiled: January 18, 2011Date of Patent: September 10, 2013Assignee: ancosys GmbHInventor: Juerg Stahl