Abstract: The present invention relates to a coating plant, especially a vacuum coating plant, with a charging lock, especially a rectangular vacuum lock for a coating chamber, with a lock aperture (13) having a length of at least 1000 mm that comprises a shutter (6) for closing and opening the lock aperture and a latch (7) to secure the shutter, wherein there are provided means for moving the shutter and the latch from a first open position to a second closed position, and vice versa, these means assuring also that the movements of the shutter (6) and the latch (7) will be coupled with each other in such manner that the shutter (6) will be automatically secured by the latch (7) after the shutter has been closed and will be released again before it is opened.

Abstract: The invention relates to moulded bodies which comprise evaporation-sputtered layers, and pipes or tubes which comprise these types of layers for increasing the barrier properties.

Abstract: A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.

Abstract: In a slide valve, especially for coating installations, for fluidic separation of two modules or chambers, interconnected through an opening, containing at least one slide plate, integrated in a housing transfixed by said opening, and which may be bidirectionally moved between an inactive position, releasing said opening, and an operating position, completely covering said opening, and at least a closing drive, which may be activated to act upon said slide plate in its operating position and for its sealing contact in a closed position against a sealing surface transfixing said housing, according to the invention, at least one of said closing drives is firmly attached inside housing, relative to the activating movement of said slide plate.

Abstract: A material with spectrally selective reflection in the primary valences of red, green and blue is applied preferably onto laser projection screens in order to make possible the projection even in daylight. In a first embodiment, a first layer of a material that is highly reflective over the entire range of visible light, e.g., aluminum is applied onto a substrate, e.g., glass or a synthetic material, followed by a second layer of a material that is essentially non-absorbing over the entire range of visible light, e.g., SiO2. A third layer in contact with air is applied to the second layer and is made of a material that is partially transmissive over the entire range of visible light, e.g., of NiCr An alternative embodiment comprise five layers, The first layer is made a material with a high index of refraction, e.g.; TiO2, a second of a material with a low index of refraction, e.g., SiO2, the third of a material with a high index of refraction, e.g.

Abstract: A system 1 for coating a substrate 3, in particular a transparent substrate, comprises at least one coating chamber 2, at least one pump means 5 for producing a vacuum within the coating chamber 2, and at least one sputtering cathode 9. One or more cathodes 9 are integrated within an insert 8 together with system components which undergo process-induced dirt pick-up, for example shields, covers or transport rollers 6 for conveying a substrate 3 through the process chamber 2. The insert 8 can slide, like a drawer, through a lateral opening 10 within the chamber wall 2a, into the interior of the chamber. For maintenance purposes, any components of the coating system 1 which require thorough maintenance and cleaning can be removed easily from the interior of the coating chamber 2 by means of the insert 8. The removed insert 8 can be replaced directly by an insert that has just been serviced.

Abstract: In a method for producing ITO layers on substrates, especially for the production of organic light-emitting diodes, part of the ITO layer thickness is applied first by sputter-deposition, at a controlled temperature profile, in such manner that the formation of crystallization nuclei is prevented; subsequently, the partially coated substrate is heated to a temperature above the recrystallization temperature of the ITO layer, and then the rest of the ITO layer is sputter-deposited.

Abstract: The invention relates to a magnetron sputtering device particularly comprising at least one vacuum chamber and being intended for the coating of multicomponent films on a substrate by means of magnetron co-sputtering; said device is provided with a cylindrical cathode (1, 1?) mounted rotatably around the axial longitudinal shaft and is further provided with a magnetic system arranged inside the cylindrical cathode (1, 1?). The cylindrical cathode (1, 1?) includes at least two segments (2, 2?, 3, 3?, 4, 4?, 5, 5?) having different target materials. In addition, the invention relates to a method of coating multicomponent films on a substrate by way of magnetron co-sputtering in a vacuum coating system.

Abstract: This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means equalizes the circumference velocity v1 of the coating roll and the circumference velocity v2 of the takeup guide roll. Hence, v1=v2. Therefore, the takeup guide roll never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.

Abstract: A continuous coating system has several treatment chambers (1, 2) that are arranged one after the other in such a way that in each case, a wall (3) of one treatment chamber (1) having a passage (5) contacts a wall (4) in the adjacent treatment chamber (2) that also has a passage (6). One of the passages (5) is provided in a sealing insert (7), which supports itself on the same side with a first support surface (9) on the wall (3) of one treatment chamber (1) and with a second support surface (10) against the wall (4) of the adjacent treatment chamber (2). Between the two support surfaces (9, 10) and the respective walls (3, 4), in each case there is a surrounding gasket (13, 14) against the respective support surface (9, 10) and the wall (3, 4).

Abstract: An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably, a motion-producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to he first material component on the cathode material surface (25).

Abstract: The invention relates to a device for the regulation of a plasma impedance in a vacuum chamber, wherein at least one electrode is connected to an AC generator. This AC generator is a free-running [oscillator], whose frequency adjusts to the resonance frequency of the load upon which it acts. This load comprises fixed circuit elements and a variable plasma impedance. If the plasma impedance is changed, with it the resonance frequency is also changed. The plasma impedance can thus be varied by acquisition of the resonance frequency and by presetting of a reference frequency value, for example thereby that the voltage, the current, the power or the gas inflow is varied as a function of the difference between resonance frequency and reference frequency value.

Abstract: The invention relates to a method and device for the determination of the gas permeability of a container, for example, a PET bottle. Said container is enclosed by a sheath, which hermetically seals the container from the environment. The intermediate space, between the container and the sheath, has only a very small volume in comparison to the volume of the container. The determination of the gas permeability is begun by bringing said intermediate space to, for example, atmospheric pressure, whilst the container is filled with a test gas by means of a special feed, until the container is at an overpressure relative to the intermediate space. The pressure in the intermediate space increases by means of the resulting diffusion of the test gas through the wall of the container into said intermediate space. The increase in pressure per unit time is a measure of the permeability of the container.

Abstract: A treatment device (2) for treating a band-shaped substrate (1) with a gas containing a source (5) for the gas. An endless pattern band (7) that serves as the pattern carrier is guided in revolving fashion around the gas source (5) by means of several deflection rollers (8, 9, 10, 11). The pattern band (7) is formed of a screen foil that is provided with a cover (14) to produce regions on the substrate (1) that are not treated with the gas.