Abstract: A method of removing titanium nitride hardmask is described. The hardmask resides above a low-k dielectric layer prior to removal and the low-k dielectric layer retains a relatively low net dielectric constant after the removal process. The low-k dielectric layer may be part of a dual damascene structure having copper at the bottom of the vias. A non-porous carbon layer is deposited prior to the titanium nitride hardmask removal to protect the low-k dielectric layer and the copper. The titanium nitride hardmask and the non-porous carbon layer are removed with a gas-phase etch using plasma effluents formed in a remote plasma from a chlorine-containing precursor. Plasma effluents within the remote plasma are flowed into a substrate processing region where the plasma effluents react with the non-porous carbon layer and the titanium nitride.

Abstract: A universal coupler for a self aligning linear actuator for a valve assembly. The self aligning linear actuator utilizes a drive screw or other threaded drive means to drive a plunger for a throttle valve. The drive screw rotates within a frame while a threaded collar or ball screw coupled to a drive coupler drives the plunger parallel to the drive screw. The universal coupler relieves any bending strain induced by misalignment between the drive screw and the plunger by allowing pivotal movement of the drive coupler relative to the drive screw.