Patents Assigned to Asahi Denka Kogyo K.K.
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Patent number: 5434196Abstract: The present invention relates to a resin composition for optical molding which comprises (a) an actinic radical-curable and cationically polymerizable organic substance and (b) an actinic radiation-sensitive initiator for cationic polymerization. This composition can be cured without being affected by atomospheric oxygen.Type: GrantFiled: July 1, 1994Date of Patent: July 18, 1995Assignee: Asahi Denka Kogyo K.K.Inventors: Kazuo Ohkawa, Seiichi Saito
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Patent number: 5391596Abstract: An emulsifying epoxy resin composition having excellent emulsifiability and storage stability, which comprises a specific epoxy resin (I), an emulsifiable epoxy compound (II) prepared by reacting an urethane compound (II-1), prepared by the reaction of a polyalkylene polyether polyol compound (II-1-1) having a number average molecular weight of 200 to 12,000 and an ethylene oxide content of 80% by weight or above with an excess amount of a polyisocyanate compound (II-1-2), with a specific epoxy compound (II-2) and an alkylphenol ethoxylate (II-3) having a number average molecular weight of 300 to 5,000 at a specific ratio, and water (III). A curable composition having a high cure rate and the cured product obtained these from having excellent film strength, water resistance and so on, which comprises the above-described emulsifiable epoxy resin composition and an active organic amino compound (IV) is also within the scope of the present invention.Type: GrantFiled: May 13, 1993Date of Patent: February 21, 1995Assignees: Asahi Denka Kogyo K.K., A.C.R. Co., Ltd.Inventors: Kiyoshi Muto, Hiroshi Suzuki
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Patent number: 5372743Abstract: The degreasing composition comprises a surfactant composition comprising a compound (a) represented by the general formula (1):R.sup.1 O(AO).sub.n H (1)wherein R.sup.1 is a substituted or unsubstituted hydrocarbon group having 6 or more carbon atoms; A is at least one group selected from the group consisting of an ethylene group, a propylene group, a butylene group and a styrene group, provided that an ethylene group in A is 5 mol or more per 1 mol of R.sup.1, and that the ethylene group is 50 mol % or more per 100 mol % of said A; and n is an integer of 5-50;a compound (b1) represented by the general formula (2): ##STR1## wherein R.sup.2 is a substituted or unsubstituted hydrocarbon group having 6 or more carbon atoms, E is an ethylene group, and n is an integer of 1-20; and a compound (b2) represented by the general formula (3): ##STR2## wherein R.sup.Type: GrantFiled: August 9, 1993Date of Patent: December 13, 1994Assignees: Nippon Paint Co., Ltd., Asahi Denka Kogyo K.K.Inventors: Satoshi Miyamoto, Isao Kawasaki, Kaoru Komiya
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Patent number: 5371159Abstract: An improved solution polymerization process is provided wherein vinyl monomers are polymerized in the presence of at least one reactive modifier which is a substituted alpha-olefin that incorporates at least three ether groups, is hydrophilic, and has a molecular weight of at least about 200. The modified vinyl polymers so produced are characterized by various improved physical properties including, in particular, electrical characteristics such as antistatic capacity.Type: GrantFiled: February 2, 1993Date of Patent: December 6, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Masahide Tsuzuki, Kaoru Komiya
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Patent number: 5360873Abstract: An actinic radiation-reactive pressure-sensitive adhesive composition which can be cured in air at a high speed, without irritation and bad smell, comprises1 a pressure-sensitive adhesive compound comprising an acrylate copolymer and2 an actinic radiation-curable resin comprising (1) one or more polythiol compounds and (2) one or more polyene compounds each having an least two actinic radiation-reactive acrylate carbon-to-carbon double bonds in the molecule.Type: GrantFiled: August 20, 1993Date of Patent: November 1, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Kazuo Ohkawa, Seiichi Saito
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Patent number: 5352845Abstract: A process for manufacturing an optically active saturated compound of the general formula (25): ##STR1## wherein R.sub.20 represents a group for protecting a hydroxy group, R.sub.21, R.sub.22, and R.sub.23 independently represent a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, is disclosed.Type: GrantFiled: March 25, 1993Date of Patent: October 4, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Seiichi Takano, Kunio Ogasawara
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Patent number: 5350809Abstract: Disclosed herein is a process for the preparation of a chlorinated rubber, wherein chlorine gas is caused to act on a polyisoprene rubber to prepare the chlorinated rubber. Chlorine gas is blown into a high-acidity aqueous dispersion of the polyisoprene rubber to chlorinate the polyisoprene rubber, whereby a chlorinated isoprene rubber with high performance is prepared stably in an aqueous medium.Type: GrantFiled: January 22, 1993Date of Patent: September 27, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Hiroshi Tsuchiya, Makoto Kokura, Yutaka Ozawa, Takaaki Sugimura
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Patent number: 5348080Abstract: A latent heat storage apparatus is provided and a latent heat storage solution therefor stores and retrieves a cool heat substantially in or from a latent heat thereof necessary for air conditioning, cooling, refrigerating, and so forth. The latent heat storage apparatus has an aqueous solution of a plurality of inorganic salts as a latent heat storage solution in a heat storage tank, formed to retrieve a cold heat from a stored latent heat, the latent heat storage apparatus. The latent heat storage solution is formed of (N-1) kinds of inorganic salts in at least an N-component aqueous solution where N.gtoreq.3. The latent heat storage solution stores the cold heat as the latent heat thereof. The cold heat is retrievable from the stored latent heat at a desired temperature almost invariably within a range higher than the N-component eutectic point and lower than any one of binary eutectic points of salts with water.Type: GrantFiled: December 17, 1991Date of Patent: September 20, 1994Assignees: Tokyo Electric Power Company, Maekawa Mfg. Co., Ltd., Asahi Denka Kogyo K.K.Inventors: Syoichi Kuroda, Soichiro Shibata, Nonyuki Shimamura, Shigetake Kawasaki, Keisuke Kasahara, Seiichi Sakuma, Fujio Komatsu, Masaya Ishikawa, Kunio Sugiyama, Mitsuo Mashimo, Yuzuru Shindo, Kuniaki Kawamura
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Patent number: 5306460Abstract: A method of providing hollow cast products using a filling unit wherein a non-solid material is filled into elastic molds having open bag shaped interior filling sections by a filling nozzle insertable internally of the filling sections of the elastic molds and a blowing nozzle for blowing air into the filling section, which includes: partly filling the filling sections of the elastic molds with the non-solid material, and blowing air into the partly filled filling sections before the material solidifies to blow the material upward and solidify the material on the inner peripheral surface of the filling sections.Type: GrantFiled: October 13, 1992Date of Patent: April 26, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Yoshiyuki Hidawa, Toshiya Fujishima, Satoru Takeda, Toshihiro Hayashi, Hiroshige Kohno
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Patent number: 5278199Abstract: An actinic radiation-reactive pressure-sensitive adhesive composition can be cured in air at a high speed, without irritation and bad smell, and comprises1 a pressure-sensitive adhesive organic compound, and2 an actinic radiation-curable resin comprising (1) one or more polythiol compounds and (2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule.Type: GrantFiled: December 21, 1990Date of Patent: January 11, 1994Assignee: Asahi Denka Kogyo K.K.Inventors: Kazuo Ohkawa, Seiichi Saito
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Patent number: 5264572Abstract: A process for producing an isocyanate trimer and a process for producing an urethane with a catalyst for isocyanate trimerization or urethane formation, which comprises cesium fluoride or a tetraalkylammonium fluoride.Type: GrantFiled: September 1, 1992Date of Patent: November 23, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Takeshi Endo, Yoko Nambu
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Patent number: 5262552Abstract: An optically active (S)- or (R)-pentane compound of the general formula (11): ##STR1## wherein R.sub.11, R.sub.12 and R.sub.13 independently represent a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, R.sub.14 represents a hydroxy, protected hydroxy or oxo group, if R.sub.14 is an oxo group, the ring denoting benzene in the above formula (11) is benzoquinone, R.sub.15 represents a hydrogen atom, hydroxy or acyloxy group, R.sub.16 represents a hydroxy or acyloxy group, and the chiral central carbon marked with a symbol * in said formula (11) alternatively has one of an R-configuration and an S-configuration, is disclosed. Further, intermediate products of the compound of the formula (11) are also disclosed. Still further, a process for manufacturing the above compounds is disclosed. The compound of the formula (11) is easily synthesized from an easily available optically active starting material.Type: GrantFiled: February 20, 1991Date of Patent: November 16, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Seiichi Takano, Kunio Ogasawara
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Patent number: 5243096Abstract: An optically active pentane compound of the general formula (I): ##STR1## wherein R.sub.1 represents a lower alkyl group having 1 to 4 carbon atoms, R.sub.2 represents a lower alkoxycarbonyl group having an alkoxy moiety of 1 to 4 carbon atoms, or a straight-chain or branched alkyl group having 1 to 7 carbon atoms which is unsubstituted or substituted with a hydroxy or protected hydroxy group, A represents a halogen atom, hydroxy, protected hydroxy, or ethynyl group, or a group of the formula ##STR2## B represents a hydrogen atom, hydroxy, protected hydroxy or acyloxy group, D represents a hydrogen atom, or A and B together can form an acetal or epoxy group, A and D together can form an ethylidene group, and B and D together can form a carbon-carbon direct bond, and the chiral central carbon atoms marked with symbols *, # and .thrfore.Type: GrantFiled: April 30, 1992Date of Patent: September 7, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Seiichi Takano, Kunio Ogasawara
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Patent number: 5238979Abstract: Stabilizers for enhancing the resistance of synthetic resins to deterioration when exposed to elevated temperatures and/or ultraviolet light comprising from about 0.001 to about 10 parts by weight of a bisphenol phosphite having the formula ##STR1## wherein R.sub.1 is tertiary-butyl or tertiary-amyl, R.sub.2 is alkyl having from one to about nine carbon atoms, R.sub.3 is hydrogen or alkyl having from one to about four carbon atoms, and R.sub.4 is alkyl having from one to about thirty carbon atoms; and from about 0.001 to about 10 parts by weight of a phenol having the formula ##STR2## wherein R.sub.5 is alkyl having from one to about four carbon atoms; and R.sub.6 is hydrogen or alkyl having from one to about four carbon atoms; and stabilized synthetic resin compositions comprising such stabilizers.Type: GrantFiled: March 12, 1990Date of Patent: August 24, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Tohru Haruna, Kazunori Nishikawa
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Patent number: 5236967Abstract: An optical molding composition is used for casting and does not cause irritation to the skin or possess a bad smell. This composition comprises1. an actinic radiation-curable, radical-polymerizable organic compound comprising(1) one or more polythiol compounds and(2) one or more polyene compounds each having at least two actinic radiation-reactive carbon-to-carbon double bonds in the molecule, and2. an actinic radiation-sensitive radical polymerization initiator.Type: GrantFiled: February 18, 1992Date of Patent: August 17, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Kazuo Ohkawa, Seiichi Saito
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Patent number: 5233056Abstract: An optically active (S)- or (R)-chroman-2-ethanol compound of a general formula (I) ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms, and a chiral central carbon atom marked with a symbol * in the formula (I) alternatively has one of an R-configuration and an S-configuration, is disclosed. Further, intermediate products of the compound of the formula (I) are also disclosed. Still further, a process for manufacturing the above compounds is disclosed. The compound of the formula (I) is easily synthesized from an easily available optically active starting material.Type: GrantFiled: November 8, 1991Date of Patent: August 3, 1993Assignee: Asahi Denka Kogyo K.K.Inventors: Seiichi Takano, Kunio Ogasawara
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Patent number: 5178996Abstract: Disclosed is a photographic element having a support, at least one layer for carrying an image on the support and a protective coated layer cured by an active energy ray thereon, wherein the protective coated layer is one obtained by curing, by irradiation of an active energy ray, an active energy ray curable composition containing a prepolymer containing at least 2 epoxy groups in the molecule and a polymerization initiator which can be activated by the active energy ray; and the active energy ray curable composition is coated on the layer carrying the image; and the layer carrying the image has a water content of 20.0% by weight or less. Disclosed is also a process for preparing the photographic element constituted as the above.Type: GrantFiled: June 11, 1992Date of Patent: January 12, 1993Assignees: Konica Corporation, Asahi Denka Kogyo K.K.Inventors: Tohru Kobayashi, Yasuo Nishi, Nakaya Nakano, Kazuo Ohkawa, Hiroyuki Tachikawa
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Patent number: 5142050Abstract: A novel tri-substituted triphenyl isocyanurate is defined by the following formula and useful as a crosslinking agent for resins. ##STR1## wherein X represents --O-- or --COO--; and R represents a hydrogen atom, a straight-chain or branched alkyl group having 1 to 10 carbon atoms, which may be either unsubstituted or substituted with a hydroxyl group, an aryl group or an R'.sub.3 Si group (wherein a plurality of R' groups may be the same or different from each other and each represents a straight-chain or branched alkyl group having 1 to 10 carbon atoms or a phenyl group), except when X is --O-- and R is CH.sub.3.Type: GrantFiled: February 26, 1991Date of Patent: August 25, 1992Assignee: Asahi Denka Kogyo K.K.Inventors: Takeshi Endo, Yoko Nambu
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Patent number: 5136061Abstract: An optically active pentane compound of the general formula (I): ##STR1## wherein R.sub.1 represents a lower alkyl group having 1 to 4 carbon atoms, R.sub.2 represents a lower alkoxycarbonyl group having an alkoxy moiety of 1 to 4 carbon atoms, or a straight-chain or branched alkyl group having 1 to 7 carbon atoms which is unsubstituted or substituted with a hydroxy or protected hydroxy group, A represents a halogen atom, hydroxy, protected hydroxy, or ethynyl group, or a group of the formula ##STR2## B represents a hydrogen atom, hydroxy, protected hydroxy or acyloxy group, D represents a hydrogen atom, or A and B together can form an acetal or epoxy group, A and D together can form an ethylidene group, and B and D together can form a carbon-carbon direct bond, and a chiral central carbon atoms marked with symbols *, # and .thrfore. in said formula (I) alternatively have one of an R-configuration and an S-configuration.Type: GrantFiled: June 13, 1991Date of Patent: August 4, 1992Assignee: Asahi Denka Kogyo K.K.Inventors: Seiichi Takano, Kunio Ogasawara
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Patent number: 5089377Abstract: Acridine compounds such as 1,4-butylenebis-.beta.-(acridin-9-yl)acrylate, or the like, are high in light sensitivity and suitable as a photopolymerization initiator.Type: GrantFiled: December 12, 1990Date of Patent: February 18, 1992Assignee: Asahi Denka Kogyo K.K.Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo