Patents Assigned to Asahi Kasel Kabushiki Kaisha
  • Patent number: 11573128
    Abstract: An object of the present invention is to provide a radiation temperature measuring device capable of preventing reduction in the accuracy of temperature measurement due to an electromagnetic wave reflected by a measurement target. A radiation temperature measuring device includes a reflective polarizing plate configured to reflect a polarized wave of one direction in an electromagnetic wave radiated from an object to be measured and transmit or absorb a polarized wave of a direction perpendicular to the one direction and an infrared sensor configured to detect the polarized electromagnetic wave of the one direction reflected by the reflective polarizing plate.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: February 7, 2023
    Assignee: Asahi Kasel Kabushiki Kaisha
    Inventors: Hiroyuki Sasaki, Masaru Sugiyama
  • Patent number: 11416593
    Abstract: The present disclosure provides an electronic device, a control method therefor, and a control program therefor capable of preventing an operation for activating a function protected by user authentication from becoming complicated. An electronic device includes: a keyword management DB for storing identification information of a registrant and a registered keyword in association with each other; a command management DB for storing a command and required authentication scores in association with each other; a data generator for creating grammar data including a registered keyword and a command; an utterance recognizer for matching the grammar data and extracted data extracted from an utterance of a user and acquiring a recognized authentication score and a recognized command; and an authenticator for determining that the command is recognized by comparing the required authentication score associated with the command determined to be the same as the recognized command and the recognized authentication score.
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: August 16, 2022
    Assignee: Asahi Kasel Kabushiki Kaisha
    Inventor: Toshiyuki Miyazaki
  • Patent number: 11309456
    Abstract: This invention provides a nitride semiconductor light emitting device in which current concentration is suppressed without excessively increasing resistance at a low cost without increasing a manufacturing process. The planar shape of a mesa portion configuring a nitride semiconductor light emitting device is a shape containing a convex-shaped tip portion 352b formed by a curved line or a plurality of straight lines and abase portion 352a continuous to the convex-shaped tip portion 352b, in which an obtuse angle is formed by adjacent two straight lines in the convex-shaped tip portion formed by the plurality of straight lines. The first electrode layer 4 has visible outlines 411 and 412 along a visible outline 302 of the mesa portion through a gap 9 in planar view. The relationship between a gap W1 in the convex-shaped tip portion 352b and a gap W2 in the base portion 352a is W1>W2.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: April 19, 2022
    Assignee: Asahi Kasel Kabushiki Kaisha
    Inventor: Kosuke Sato
  • Patent number: 11191487
    Abstract: A contact state estimating device includes: a first and a second electrode brought into contact with an object to be measured; a direct current voltage supply unit; a signal switching unit configured to switch a first pathway through which the direct current voltage supply unit supplies direct current voltage to the first electrode and an output signal from the second electrode is output and a second pathway through which the direct current voltage supply unit supplies direct current voltage to the second electrode and an output signal from the first electrode is output to each other; and a contact state estimating unit configured to estimate a contact state of the first electrode or the second electrode with the object, based on the output signal acquired at a timing at which a pulse noise is anticipated to occur in association with switching between the first pathway and the second pathway.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: December 7, 2021
    Assignee: Asahi Kasel Kabushiki Kaisha
    Inventors: Kei Kodama, Masashi Yamada
  • Publication number: 20170283672
    Abstract: A resin composition including at least (A) an epoxy resin, (B) a curing agent and (C) an inorganic filler, satisfies the following conditions: (I-I) the minimum modulus is no greater than 104 MPa when evaluated at a set temperature of 200° C. after temperature increase from room temperature to 200° C. at 50° C./min by evaluation with a rheometer, and the final modulus is 105 MPa or greater from 10 minutes after the initial temperature increase; (I-II) the softening point of the epoxy resin (A) is 35° C. or higher; (I-III) the residual solvent in the resin composition is no greater than 0.1%; and (I-IV) the equivalent value of the curing agent (B) is no greater than 90 g/eq and the softening point is 105° C. or higher.
    Type: Application
    Filed: March 29, 2017
    Publication date: October 5, 2017
    Applicant: ASAHI KASEl KABUSHIKI KAISHA
    Inventors: Akinori Inoue, Shozo Takada
  • Patent number: 6346638
    Abstract: A method for continuously producing a (A) dialkyl carbonate and a (B) diol, comprising continuously feeding a cyclic carbonate and an aliphatic monohydric alcohol to a continuous multi-stage distillation column to thereby effect a transesterification therebetween, thereby continuously producing a dialkyl carbonate and a diol, while continuously withdrawing a low boiling point mixture containing the produced dialkyl carbonate (A) in a gaseous form from an upper portion of the distillation column and continuously withdrawing a high boiling point mixture containing the produced diol (B) in a liquid form from a lower portion of the distillation column, wherein the transesterification is performed under conditions wherein: (a) the reaction pressure of the column bottom is 5×104 Pa or less; (b) the reaction temperature of the column bottom is in the range of from −20° C. to less than 60° C.; and (c) the distillation column has an F-factor in the range of from 0.2 to 5.
    Type: Grant
    Filed: November 6, 2000
    Date of Patent: February 12, 2002
    Assignee: Asahi Kasel Kabushiki Kaisha
    Inventors: Masahiro Tojo, Kazuhiro Oonishi