Patents Assigned to ASI/Silica Machinery, LLC
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Patent number: 11370691Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.Type: GrantFiled: September 24, 2019Date of Patent: June 28, 2022Assignee: ASI/SILICA MACHINERY, LLCInventor: David McDonald Stirling
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Patent number: 10464838Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.Type: GrantFiled: January 13, 2015Date of Patent: November 5, 2019Assignee: ASI/SILICA MACHINERY, LLCInventor: David McDonald Stirling
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Patent number: 8205472Abstract: A method of manufacturing a cylindrical glass optical waveguide preform having a low water content centerline region, for use in the manufacture of optical waveguide fiber, is disclosed. The centerline region of the glass optical waveguide preform has a water content sufficiently low such that an optical waveguide fiber producible from the glass optical waveguide preform of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km, at a measured wavelength of 1380 nm. Method of manufacture of a porous core mandrel used in the manufacture of such a glass optical waveguide preform is also disclosed.Type: GrantFiled: March 18, 2011Date of Patent: June 26, 2012Assignee: ASI/Silica Machinery, LLCInventors: David McDonald Stirling, Franklin W. Dabby, Gordon Randall Gould, Henry Willner
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Patent number: 7930905Abstract: A method of manufacturing a cylindrical glass optical waveguide preform having a low water content centerline region, for use in the manufacture of optical waveguide fiber, is disclosed. The centerline region of the glass optical waveguide preform has a water content sufficiently low such that an optical waveguide fiber producible from the glass optical waveguide preform of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km, at a measured wavelength of 1380 nm. Method of manufacture of a porous core mandrel used in the manufacture of such a glass optical waveguide preform is also disclosed.Type: GrantFiled: October 8, 2004Date of Patent: April 26, 2011Assignee: ASI/Silica Machinery, LLCInventors: David McDonald Stirling, Franklin W. Dabby, Gordon Randall Gould, Henry Willner
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Publication number: 20090038543Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: October 9, 2008Publication date: February 12, 2009Applicant: ASI/SILICA MACHINERY, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Publication number: 20090038346Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: October 9, 2008Publication date: February 12, 2009Applicant: ASI/SILICA MACHINERY, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 7451624Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: November 4, 2004Date of Patent: November 18, 2008Assignee: Asi/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 7451623Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: July 23, 2004Date of Patent: November 18, 2008Assignee: ASI/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 6789401Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: June 28, 2001Date of Patent: September 14, 2004Assignee: ASI/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian