Patents Assigned to Asia Pacific Systems Inc.
  • Patent number: 8346068
    Abstract: Disclosed is a substrate rotating and oscillating apparatus for a rapid thermal process (RTP), that oscillates an oscillation plate using an oscillation motor moved by an elevating unit. Rotational shafts of the oscillation motor comprise lower and upper center rotational shafts mounted on a central axis of the motor, and an eccentric shaft mounted between the lower and the upper center rotational shafts as deviated from the central axis. An oscillation cam is mounted to the eccentric cam. The oscillation plate has an oscillation hole for inserting the oscillation cam therein. A bearing is mounted between the oscillation cam and the eccentric shaft such that the oscillation cam rotates independently from the eccentric shaft. The oscillation plate supports the whole multipole-magnetized magnetic motor or maglev motor. Accordingly, the substrate can be uniformly heated by both rotating and all-directionally oscillating the substrate.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: January 1, 2013
    Assignee: Asia Pacific Systems Inc.
    Inventors: Jang Woo Shim, Sang Seok Lee, Woon Ki Cho, Jun Her
  • Publication number: 20110255847
    Abstract: In the rapid heat treatment apparatus according to the present invention, the pyrometer comprises a light receiving rod that is used to receive radiated light emitted from a wafer; a light source that is installed to radiate light onto a wafer through the light receiving load; and a light sensing part that receives radiated light reflected after being radiated from the light source to the wafer and light emitted from the wafer to measure the temperature of the wafer, wherein a transparent protective cap is installed on the light receiving load so that the light receiving load is not contaminated by by-products formed after the wafer is heated. According to the present invention, contamination is prevented by the transparent protective cap so that any difficulty experienced from replacing an expensive light receiving rod is eliminated, and the need for initial setting of the pyrometer is also eliminated, so that process downtime is reduced and process efficiency is enhanced.
    Type: Application
    Filed: November 27, 2009
    Publication date: October 20, 2011
    Applicant: ASIA PACIFIC SYSTEMS, INC
    Inventor: Sang Hyun Ji
  • Publication number: 20110002676
    Abstract: Disclosed is a separation type heater block of a rapid thermal processing apparatus, including a lamp housing formed in a plate shape, and provided with a plurality of lamp insertion holes, into which heating lamps are respectively inserted; a socket housing, into which sockets of the heating lamps are inserted, separably covered on the lamp housing; and a reflector housing provided with light emission holes at positions corresponding to the lamp insertion holes, separably installed under the lamp housing such that lower ends of the heating lamps are respectively inserted into the light emission holes, side walls of the light emission holes serving as barriers, wherein a cooling water channel, through which cooling water flows, is formed through the side walls of the light emission holes of the reflector housing.
    Type: Application
    Filed: December 1, 2008
    Publication date: January 6, 2011
    Applicant: Asia Pacific Systems Inc.
    Inventors: Jang Woo Shim, Seung Yong Kim, Jun Her, Dae-Cheon Hwang