Patents Assigned to ASML Nethlands B. V.
  • METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH
    Publication number: 20220163899
    Abstract: Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.
    Type: Application
    Filed: February 10, 2020
    Publication date: May 26, 2022
    Applicants: ASML Nethlands B. V., Cymer, LLC
    Inventors: Willard Earl CONLEY, Joshua Jon THORNES, Duan-Fu Stephen HSU