Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers formed on a wafer is proposed. The device includes a light source, a first beam splitter configured to split a beam emitted from the light source into two beams, a first color filter configured to adjust a center wavelength and a band width of one of the beams split by the first beam splitter so that the center wavelength and the band width of one of the beams become suitable for acquiring an image of the first overlay mark.

Abstract: There is provided a deep learning-based overlay key centering system and a method thereof that may precisely measure and examine an alignment state of fine patterns of a semiconductor substrate. The method includes collecting an input data set from at least one device, the input data set comprising measurement image data of an overlay key and label data including information on a position and bounding box size of the overlay; and training the model by inputting the input data set to a model for deep learning. The step of training the model may include a step of calculating a loss function by comparing result data predicted by the model with the label data; and a step of optimizing an algorithm of the model by modifying a weight of the model so that a loss value calculated with the loss function may become smaller than a reference value.

Abstract: A non-transitory computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.

Abstract: A non-transitory computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include: information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device. The overlay measurement device includes: a light source, an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark, a detector that acquires an image of the first overlay mark and an image of the second overlay mark, a transceiver, and a processor electrically connected to the transceiver.

Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an objective lens that concentrates a beam from the light source on a measurement position of the wafer, and gathers the beam being reflected in the measurement positon; a lens focus actuator that adjusts a distance between the objective lens and the wafer such that a focus surface is placed at the first overlay mark or the second overlay mark; an auto focus module that adjusts a focus by adjusting the lens focus actuator; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.

Abstract: A non-transitory computer-readable storage medium that records a data computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device that measures an error between a first overlay mark and a second overlay mark formed on different layers of a wafer. The data include information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.

Abstract: An overlay measurement device for measuring an error between a first overlay mark and a second overlay mark respectively formed on different layers of a wafer, includes: a light source; an aperture that changes a beam from the light source to be suitable for photographing the first overlay mark or the second overlay mark; a detector for obtaining an image of the first overlay mark or an image of the second overlay mark; a transmission and receipt part; and a processor connecting to the transmission and receipt part electrically.

Abstract: There is provided a deep learning-based overlay key centering system and a method thereof that may precisely measure and examine an alignment state of fine patterns of a semiconductor substrate. The method includes collecting an input data set from at least one device, the input data set comprising measurement image data of an overlay key and label data including information on a position and bounding box size of the overlay; and training the model by inputting the input data set to a model for deep learning. The step of training the model may include a step of calculating a loss function by comparing result data predicted by the model with the label data; and a step of optimizing an algorithm of the model by modifying a weight of the model so that a loss value calculated with the loss function may become smaller than a reference value.

Abstract: There is provided a target-based shortest path extracting method. The method includes recognizing three or more sites within a designated area of a target and setting a start site among the recognized sites; extracting a tree graph by connecting sites within the designated area, starting with the start site; and extracting the shortest path between sites within the designated area of the target by connecting tree lines of the tree graph, starting with the start site.

Abstract: There is provided an overlay measurement device controlling a focus movement, which includes: a lighting part being configured to orient lighting toward an overlay measurement target; a collection part comprising an objective lens and a detector for obtaining one or more of images of each focus in the overlay measurement target; a lens focus actuator moving the objective lens to adjust a distance between the objective lens and a wafer; and a processor controlling an operation of the lens focus actuator. The processor obtains a focus graph respectively in relation to two layers from one or more of the images of each focus, and the processor identifies a reference focus in relation to the obtained focus graphs to move the objective lens.

Abstract: A wavelength-tunable fiber optic light source and an overlay measurement device including a wavelength-tunable fiber optic light source are provided. A wavelength-tunable fiber optic light source may include a broadband light source configured to emit light; a light source housing to receive the broadband light source, wherein in the light source housing, a first window and a second window through which the light emitted from the broadband light source passes are formed; a first variable filter configured to adjust a wavelength band of a first illumination; a second variable filter configured to adjust a wavelength band of a second illumination; and a fiber combiner including an output port through which a combination of the first illumination and the second illumination is output.

Abstract: An overlay measurement device includes a transmission and receipt part and a processor connecting to the transmission and receipt part electrically. The processor obtains data transmitted from a user terminal through the transmission and receipt part, analyzes a recipe included in the data, and performs optimization of measurement options of a wafer, based on the recipe, after the recipe is analyzed.

Abstract: There are provided a computer-readable storage medium and an overlay measurement device therefor that records a data structure for storing data controlling an operation of an overlay measurement device. In a computer-readable storage medium that records a data structure for storing data controlling an operation of an overlay measurement device in one embodiment, the data includes information of a recipe that is input to allow the overlay measurement device to measure characteristics of a wafer through a manager program installed in a user terminal, and unique information of the overlay measurement device.

Abstract: An apparatus for transferring an optical instrument, includes: a transferring block, wherein the optical instrument is coupled to a front surface thereof; a fixed block disposed at a rear side of the transferring block and coupled to a granite surface plate; a wedge stage module disposed on the fixed block to move the transferring block in a vertical direction; a vertical guide disposed at a side end of the transferring block to guide the transferring block in the vertical direction; and a horizontal stage module connected between the wedge stage module and the transferring block to guide a movement in a horizontal direction.

Abstract: A method of centering a correlation-based overlay includes resizing an overlay target image to a size smaller than an entire image size, defining first and second templates that are symmetrical to each other based on a diagonal in the resized image, and calculating a rough center coordinate by calculating a first correlation value representing a similarity symmetrical with respect to the diagonal between images of the first and second templates; defining first and second templates symmetrical based on a diagonal passing through the rough center coordinates in an original image of the overlay target image, calculating a fine center coordinate of the overlay target image by calculating a second correlation value representing a similarity symmetrical with respect to the diagonal between the images of the first and second templates; and centering an overlay key by moving a stage to a target position based on the fine center coordinates.

Abstract: An apparatus for transferring an optical instrument, includes: a transferring block, wherein the optical instrument is coupled to a front surface thereof; a fixed block disposed at a rear side of the transferring block and coupled to a granite surface plate; a wedge stage module disposed on the fixed block to move the transferring block in a vertical direction; a vertical guide disposed at a side end of the transferring block to guide the transferring block in the vertical direction; and a horizontal stage module connected between the wedge stage module and the transferring block to guide a movement in a horizontal direction.

Abstract: A method for measuring a characteristic of a thin film is disclosed. The method includes a) obtaining a measured spectrum from a target region on the substrate by using a spectroscopic ellipsometer, b) obtaining a physical model capable of obtaining an estimated parameter value related to the characteristic of the thin film through regression analysis of the measured spectrum, c) obtaining a machine learning model capable of obtaining a reference parameter value related to the characteristic of the thin film by using the measured spectrum, and d) obtaining an integrated model which uses an integrated error function capable of considering both of a first error function and a second error function, and obtaining an optimum parameter value through regression analysis of the integrated model.

Abstract: An overlay measurement apparatus that can quickly measure an overlay error between layers with a large height difference is provided. The overlay measurement apparatus measures an error between a first overlay mark and a second overlay mark formed in a pair on different layers of a wafer. The overlay measurement apparatus includes an imaging system configured to acquire alignment images of a pair of first and second overlay marks at a plurality of focus positions, and a controller communicatively coupled to the imaging system. The overlay measurement apparatus can rapidly and accurately measure an overlay error between layers with a large height difference.

Abstract: There is provided a polarization analysis apparatus that adjusts an angle of incidence or a numerical aperture by using an aperture. The apparatus includes: a first aperture that transmits a lighting beam reflected from a sample on a substrate; a second aperture that transmits a lighting beam having passed through the first aperture; and a detector that detects a lighting beam having passed through the second aperture and selects an angle of incidence of the lighting beam and numerical apertures of the first aperture and the second aperture.

Abstract: There are provided an overlay measuring device and a method for controlling a focus and a program therefor. An overlay measuring device controlling a focus in one embodiment includes an objective lens; a memory; a lens focus actuator operating the objective lens to adjust a distance between the objective lens and a wafer; and a processor controlling operations of the memory and the lens focus actuator, wherein the processor is configured to obtain a first height value in relation to each site of the wafer, match the obtained first height value and a corresponding site and store the same, and as initial measurement in relation to each site of the wafer starts, control the lens focus actuator, based on the stored first height value of the site, to control a Z-axis movement of the objective lens.