Patents Assigned to B.G. NeaevTechnoloaies and Apolications Ltd.
  • Patent number: 11276545
    Abstract: A method, a non-transitory computer readable medium and a system for compensating for an electromagnetic interference induced deviation of an electron beam. The method may include obtaining measurement information about a magnetic field within an electron beam tool, the measurement information is generated by at least one planar Hall Effect magnetic sensor that is located within the electron beam tool; wherein the at least one planar Hall Effect magnetic sensor comprises at least one magnetometer integrated with at least one magnetic flux concentrator; estimating the electromagnetic interference induced deviation of the electron beam, the estimating is based on the magnetic field; and setting a trajectory of the electron beam to compensate for the electromagnetic interference induced deviation of the electron beam.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: March 15, 2022
    Assignees: APPLIED MATERIALS ISRAEL LTD., BAR ILAN UNIVERSITY, B.G. NeaevTechnoloaies and Apolications Ltd.
    Inventors: Yosef Basson, Yuri Belenky, Mordechai Rozen, Lior Klein, Asaf Grosz