Patents Assigned to BenQ Materials Corporation
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Publication number: 20140355116Abstract: A polarizer for a dimming device. The polarizer includes a polarization layer with an absorption axis; and a patterned retarder layer on the polarization layer and comprising patterned alignment microstructures and a liquid crystal layer disposed on the patterned alignment microstructures, wherein the patterned alignment microstructures are formed by embossing and the optical axis of the patterned retarder layer is continuous.Type: ApplicationFiled: May 29, 2014Publication date: December 4, 2014Applicant: Benq Materials CorporationInventors: Lung-Hai Wu, Cyun-Tai Hong, Chun-Nan Shen, Meng-Chieh Wu
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Publication number: 20140355115Abstract: A dimming device includes a first polarizer, a second polarizer, a first retarder layer and a second retarder layer. The dimming device can generate full-light transmission state, dark state and a transitional state of various kinds of repeat patterns formed by a plurality of full-light transmission areas and dark areas.Type: ApplicationFiled: May 29, 2014Publication date: December 4, 2014Applicant: BENQ MATERIALS CORPORATIONInventors: Lung-Hai Wu, Cyun-Tai Hong, Chun-Nan Shen, Meng-Chieh Wu
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Publication number: 20140356688Abstract: The present disclosure provides a separator for lithium battery, particularly to a separator including a middle layer formed by a punch method. Also, a manufacturing method of the separator is provided. The separator formed by the punch method has a better heat-resistant property in an elevated temperature and features a high mechanical strength.Type: ApplicationFiled: February 13, 2014Publication date: December 4, 2014Applicant: BenQ Materials CorporationInventors: Wei-Ting YEH, Kang-Ming PENG
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Publication number: 20140350185Abstract: The invention provides an adhesive composition for conduction between electrical elements, comprising 25 to 46 parts by weight of nitrile-butadiene rubber with Mooney viscosity ranged from 50 to 75 (ML 1+4@100)° C., 25 to 45 parts by weight of acrylic oligomer, 16 to 32 parts by weight of thermoplastic resin, two organic peroxides having different one-minute half-life temperatures from each other, and a coupling agent. The thermoplastic resin is selected from the group consisting of phenoxy resin, poly(methyl)methacrylate copolymer, polystyrene copolymer and Novolak resin.Type: ApplicationFiled: May 23, 2014Publication date: November 27, 2014Applicant: BenQ Materials CorporationInventors: Tsung-Ju HSU, Yu-Chen YEH, Kai-Hsuan CHANG
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Patent number: 8887396Abstract: A method for producing a roller used for manufacturing a retarder film is provided. The method includes providing the roller having a roller surface; providing an embossing tool having an embossing end and embossing the roller surface with the embossing tool. The embossing end has a plurality of first microgroove structures and second microgroove structures. The first and second micro-groove structures are both parallel structures. Each one of the first microgroove structures is symmetric to each one of the second microgroove structures with respect to a symmetry line. An included angle of the symmetry line between each first micro-groove structure and that between each second micro-groove structure are 45±8 degrees.Type: GrantFiled: May 30, 2012Date of Patent: November 18, 2014Assignee: Benq Materials CorporationInventors: Lung-Hai Wu, Cyun-Tai Hong, Fung-Hsu Wu
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Patent number: 8882879Abstract: The invention provides a method for preparing nano silver particles comprising mixing polyvinyl pyrrolidone (PVP) and silver nitrate (AgNO3) in a solvent to form a reactive solution, heating the reactive solution to a temperature less than the boiling point of the solvent for the formation reaction of nano silver particles, adding an accelerating agent into the reactive solution during the formation reaction of the nano silver particles, and terminating the formation reaction when the size of the nano silver particles formed in the reaction solution reaches about 50 nm to 120 nm in diameter.Type: GrantFiled: February 3, 2012Date of Patent: November 11, 2014Assignee: BenQ Materials CorporationInventors: Tsung-Ju Hsu, An-Ting Kuo
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Publication number: 20140268325Abstract: Disclosed herein is a patterned retarder film for 3D display. The patterned retarder film includes a substrate, a patterned retarder layer and a micro-louver structure. The patterned retarder layer on the surface of the substrate has a plurality of first retardation micro structures and a plurality of second retardation micro structures and can split the image into two phase of images to form stereo image; the micro-louver structure is disposed between the substrate and the patterned retarder layer at the boundary of the first retardation micro structures and the second retardation micro structures. The micro-louver structure can decrease the crosstalk of the 3D display at vertical viewing angle and does not decrease the brightness of the 3D display at normal viewing angle.Type: ApplicationFiled: March 18, 2013Publication date: September 18, 2014Applicant: BENQ MATERIALS CORPORATIONInventor: Fung-Hsu WU
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Publication number: 20140240627Abstract: An anti-peeping privacy device is provided, including a polarizing element, a liquid crystal member and a diffusing element. The liquid crystal member is disposed on the polarizing element. The diffusing element is disposed on the liquid crystal member, comprising a transparent layer and a liquid crystal layer. The transparent layer having a refractive index and adjacent to the liquid crystal member includes a plurality of concave-convex stripe microstructures on the top side thereof, wherein the plurality of concave-convex stripe microstructure is arranged in a direction substantially orthogonal to the polarized light. The liquid crystal layer disposed on the concave-convex stripe microstructures of the transparent resin layer.Type: ApplicationFiled: March 18, 2013Publication date: August 28, 2014Applicant: BENQ MATERIALS CORPORATIONInventor: Fung-Hsu WU
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Patent number: 8817209Abstract: Disclosed is a patterned retarder film which comprises a substrate, a patterned configuration layer and a liquid crystal layer. The patterned configuration layer includes a plurality of first regions and a plurality of second regions A liquid crystal layer is disposed on the patterned configuration layer, wherein liquid crystal molecules above the first regions is arranged irregularly because of the protrusions, the liquid crystal molecules above the second regions are aligned with the aligning micro-structures. The liquid crystal layer in above the first regions provides a first phase retardation, the liquid crystal layer above the second regions provides a second phase retardation, and the difference between the first phase retardation and the second phase retardation is 180°. The method for manufacturing the same is disclosed.Type: GrantFiled: July 13, 2012Date of Patent: August 26, 2014Assignee: BenQ Materials CorporationInventors: Chen-Kuan Kuo, Che-Kuei Kang
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Publication number: 20140221523Abstract: The invention provides a material for contact lenses, including a first siloxane macromer with the number average molecular weight of about 1,000 to 10,000, wherein the first siloxane macromer has a crosslinking function and is represented by the following formula (I): formula (I); a second siloxane macromer is selected from the group consisting of a siloxane macromer represented by the following formula (II) and a siloxane macromer represented by the following formula (III): at least one hydrophilic monomer; and an initiator.Type: ApplicationFiled: March 18, 2013Publication date: August 7, 2014Applicant: BENQ MATERIALS CORPORATIONInventor: Fan-Dan JAN
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Patent number: 8780318Abstract: A patterned phase retardation film is disclosed, which includes substrate, a phase retardation layer on the substrate comprising a plurality of first regions of liquid crystal materials and a plurality of second regions of curable resin, wherein the first regions and the second regions are in a grating stripe structure which is parallel and interleaved with each other the top part of the second regions is formed with at least one inclined plane; and a planarization layer for planarizing the phase retardation layer; wherein the first regions provide a first phase retardation and second regions provide a second phase retardation, the first phase retardation and the second phase retardation have a phase difference of 180°. The method for manufacturing the patterned phase retardation film is also disclosed.Type: GrantFiled: May 21, 2012Date of Patent: July 15, 2014Assignee: BenQ Materials CorporationInventors: Lung-Hai Wu, Chen-Kuan Kuo, Fung-Hsu Wu, Cyun-Tai Hong, Chih-Haw Wang
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Patent number: 8709285Abstract: An ionic compound has the formula (I): in which, R1 is selected from the group consisting of hydrogen, a C1-C20 alkyl, and an aromatic group; R2 is selected from the group consisting of a carbonyl and a C1-C10 alkyl; and R3 is selected from the group consisting of an imidazole ring, a C1-C20 alkyl, an acrylic group, and an aromatic group; X? is selected from the group consisting of Cl?, Br?, I?, NO3?, AlCl4?, BF4?, CF3SO3?, (CF3SO3)?, CF3COO?, CH3COO?, and PF6?; and k is an integer 1 or 2. The ionic compound can be added in a pressure-sensitive adhesive of a polarizer of a liquid crystal display panel to avoid the phenomenon of the static electricity residual when the release film is removed from the pressure-sensitive adhesive.Type: GrantFiled: September 6, 2010Date of Patent: April 29, 2014Assignee: BenQ Materials CorporationInventors: Cheng-Chung Liao, Min-Chih Lin
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Publication number: 20140027169Abstract: An anisotropic conductive film is disclosed. The anisotropic conductive film includes a substrate, a plurality of insulating resin walls on the substrate and conductive materials. Each insulating resin wall is disposed on the substrate in parallel to each other. The conductive materials are arranged between the insulating resin walls and have conductivity along a direction parallel to the insulating resin walls.Type: ApplicationFiled: December 20, 2012Publication date: January 30, 2014Applicant: BENQ MATERIALS CORPORATIONInventors: Chien-Huang HUANG, Chen-Kuan KUO, Lung-Hai WU
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Patent number: 8603291Abstract: Acrylic resin is used as a protection film of a polyvinyl alcohol polarizer film to compose a polarizer plate, wherein the glass transition temperature of the acrylic resin is higher than 50° C. A preparation method of the polarizer plate is also disclosed.Type: GrantFiled: April 8, 2011Date of Patent: December 10, 2013Assignee: BenQ Materials CorporationInventors: Cheng-Hsin Tsai, Shu-Yi Chang, Tsung-Han Lee
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Publication number: 20130300010Abstract: The invention provides a method for manufacturing contact lenses, including: (a) mixing a siloxane macromer represented by formula (I), a siloxane macromer represented by formula (II), a hydrophilic monomer, a crosslinking agent and an initiator to form a mixture for manufacturing contact lenses, wherein the mixture for manufacturing contact lenses is free of solvent; and (b) injecting the mixture into a mould of contact lenses and conducting a UV irradiating treatment or a thermal treatment to form contact lenses, wherein formula (I) and formula (II) are shown in following: in formula (I), R1, R2 and R3 are C1-C4 alkyl groups and m is an integer of 10-40, and in formula (II), R4, R5 and R6 are C1-C4 alkyl groups or alcohol groups, R7 is a C1-C4 alkyl group, and n is an integer of 10-130. Also provided are the contact lenses manufactured from the method.Type: ApplicationFiled: December 28, 2012Publication date: November 14, 2013Applicant: BenQ Materials CorporationInventors: Mei-Yun CHANG, Jui-Feng CHUNG
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Publication number: 20130183397Abstract: An engraving apparatus of rubbing rollers for manufacturing retarder films is provided. The engraving apparatus comprises a body and an engraving end including a plurality of micro-groove structures. The plurality of micro-groove structures of the engraving end are arranged in parallel or irregularly. The engraving apparatus rubs on the rollers using the engraving end in a predetermined direction. Then the predetermined pattern structures are rubbed on the roller. In the rubbing process, the engraving apparatus can rub different pattern structures backwards and forwards directly without to move the engraving apparatus to the starting position of engraving paths. It keeps the manufacturing speed to manufacture the retarder film for saving the process time and the manufactured retarder film with the accuracy.Type: ApplicationFiled: January 18, 2013Publication date: July 18, 2013Applicant: BENQ MATERIALS CORPORATIONInventor: BENQ MATERIALS CORPORATION
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Publication number: 20130178551Abstract: This invention discloses an antistatic coating composition and antistatic film coated with the same. The antistatic coating composition comprises a hard coating solution and an antistatic solution. The hard coating solution comprises from 20 to 35 parts by weight of an acrylic oligomer, from 5 to 10 parts by weight of an acrylic monomer, from 40 to 60 parts by weight of a solvent and from 1 to 5 parts by weight of a photoinitiator. The antistatic solution comprises from 0.5 to 5 parts by weight of polyacrylic acid and from 1 to 20 parts by weight of ionic liquid. The antistatic film formed by coating the antistatic coating composition has a pencil hardness of 2H and an initial surface resistivity in the range of 108˜1011?/?, and the surface resistivity will maintain in the range of 1010˜1012?/? after isopropanol (IPA) washing.Type: ApplicationFiled: December 20, 2012Publication date: July 11, 2013Applicant: BENQ MATERIALS CORPORATIONInventor: BENQ MATERIALS CORPORATION
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Publication number: 20130107194Abstract: A patterned phase retardation film is disclosed, which includes substrate, a phase retardation layer on the substrate comprising a plurality of first regions of liquid crystal materials and a plurality of second regions of curable resin, wherein the first regions and the second regions are in a grating stripe structure which is parallel and interleaved with each other the top part of the second regions is formed with at least one inclined plane; and a planarization layer for planarizing the phase retardation layer; wherein the first regions provide a first phase retardation and second regions provide a second phase retardation, the first phase retardation and the second phase retardation have a phase difference of 180°. The method for manufacturing the patterned phase retardation film is also disclosed.Type: ApplicationFiled: May 21, 2012Publication date: May 2, 2013Applicant: BENQ MATERIALS CORPORATIONInventors: Lung-Hai WU, Chen-Kuan KUO, Fung-Hsu WU, Cyun-Tai HONG, Chih-Haw WANG
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Publication number: 20130107192Abstract: Disclosed is a patterned retarder film which comprises a substrate, a patterned configuration layer and a liquid crystal layer. The patterned configuration layer includes a plurality of first regions and a plurality of second regions A liquid crystal layer is disposed on the patterned configuration layer, wherein liquid crystal molecules above the first regions is arranged irregularly because of the protrusions, the liquid crystal molecules above the second regions are aligned with the aligning micro-structures. The liquid crystal layer in above the first regions provides a first phase retardation, the liquid crystal layer above the second regions provides a second phase retardation, and the difference between the first phase retardation and the second phase retardation is 180°. The method for manufacturing the same is disclosed.Type: ApplicationFiled: July 13, 2012Publication date: May 2, 2013Applicant: BENQ MATERIALS CORPORATIONInventors: Chen-Kuan KUO, Che-Kuei KANG
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Publication number: 20130083415Abstract: A color filter and a method for manufacturing the same are provided. The method comprises the steps of providing a substrate having a color filter layer; forming an alignment material layer on the color filter layer; embossing the alignment material layer with an embossing means to transfer a microstructure from the surface structure of the embossing means onto the alignment material layer to form an alignment layer, wherein the alignment layer has a plurality of spacers and a plurality of alignment protrusions, and the height of each of the spacer is greater than the height of each of the alignment protrusion; and curing the alignment layer.Type: ApplicationFiled: October 2, 2012Publication date: April 4, 2013Applicant: BENQ MATERIALS CORPORATIONInventor: BenQ Materials Corporation