Patents Assigned to Braggone Oy
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Patent number: 10690847Abstract: The invention is based on the idea of providing a light emitting diode (OLED) device which contains a substrate with a photonic crystal, whereby the formed film structure induces enhancement of the liberation of photons trapped inside the light emitting device structure. The photonic crystal structure is a film structure on a substrate produced using a combination of high and low refractive index materials, at least one of the materials being based on a liquid phase deposited metal-oxide or metalloid oxide material. By means of the invention light trapped due to total internal reflection in a waveguide acting light emitting structure can be extracted efficiently from the device by introducing the photonic crystal device structure between the substrate and conductive anode layer.Type: GrantFiled: June 15, 2006Date of Patent: June 23, 2020Assignee: BRAGGONE OYInventor: Ari Karkkainen
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Patent number: 9284455Abstract: An organic-inorganic composition, which has a backbone containing —Si—O— units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned and a desired Si-content of the anti-reflective coating composition can be obtained—a high Si-content will give good mechanical and thermal properties and also the required wet etch and dry etch properties.Type: GrantFiled: June 13, 2007Date of Patent: March 15, 2016Assignee: Braggone OyInventor: Ari Kärkkäinen
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Patent number: 9273209Abstract: A siloxane composition and a method of producing the same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane is cross-linked during condensation polymerization to increase molecular weight thereof. The composition can be used in high-resolution negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.Type: GrantFiled: November 28, 2008Date of Patent: March 1, 2016Assignee: Braggone OyInventors: Ari Kärkkäinen, Milja Hannu-Kuure, Sacha Legrand, Admir Hadzic, Graeme Gordon
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Patent number: 9158195Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: GrantFiled: May 5, 2014Date of Patent: October 13, 2015Assignee: BRAGGONE OYInventor: Ari Karkkainen
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Patent number: 9062229Abstract: Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerising said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerisation to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.Type: GrantFiled: April 30, 2012Date of Patent: June 23, 2015Assignee: Braggone OyInventor: Ari Kärkkäinen
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Patent number: 9051491Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: GrantFiled: June 13, 2007Date of Patent: June 9, 2015Assignee: Braggone OyInventor: Ari Kärkkäinen
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Patent number: 8852690Abstract: The present invention relates to metal oxide coating materials that can be used as thin film thin film coatings on various substrate surfaces. The invention also concerns a method of making metal oxide material which are stable in aqueous phase and that can be deposited on a substrate by liquid phase deposition, such as spin-on deposition. The new materials can be patterned lithographically or non-lithographically and are applicable for building up various electronic and opto-electronic device structures, such as anti-reflection layers, high-k interlayer and gate oxide structures for ICs, etch stop layer, CMP stop layer, solar cells, OLEDs packaging, optical thin film filters, optical diffractive grating applications and hybrid thin film diffractive grating structures.Type: GrantFiled: June 15, 2005Date of Patent: October 7, 2014Assignee: Braggone OyInventor: Ari Karkkainen
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Patent number: 8765899Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: GrantFiled: November 6, 2008Date of Patent: July 1, 2014Assignee: Braggone OyInventor: Ari Kärkkäinen
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Patent number: 8524441Abstract: A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.Type: GrantFiled: February 25, 2008Date of Patent: September 3, 2013Assignees: AZ Electronic Materials USA Corp., Braggone OyInventors: Ruzhi Zhang, WooKyu Kim, David J. Abdallah, PingHung Lu, Mark O. Neisser, Ralph R. Dammel, Ari Karkkainen
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Publication number: 20120302688Abstract: Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerising said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerisation to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.Type: ApplicationFiled: April 30, 2012Publication date: November 29, 2012Applicant: BRAGGONE OYInventor: Ari Kãrkkãinen
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Patent number: 8168740Abstract: Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerizing said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerization to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.Type: GrantFiled: February 26, 2008Date of Patent: May 1, 2012Assignee: Braggone OyInventor: Ari Kärkkäinen
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Publication number: 20100252917Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: ApplicationFiled: November 6, 2008Publication date: October 7, 2010Applicant: BRAGGONE OYInventor: Ari Karkkainen
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Publication number: 20100016488Abstract: Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerising said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerisation to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.Type: ApplicationFiled: February 26, 2008Publication date: January 21, 2010Applicant: Braggone OyInventor: Ari Karkkainen
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Publication number: 20090243018Abstract: An organic-inorganic composition, which has a backbone containing —Si—O— units with chromophore groups attached directly to at least a part of the silicon atoms. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned and a desired Si-content of the anti-reflective coating composition can be obtained—a high Si-content will give good mechanical and thermal properties and also the required wet etch and dry etch properties.Type: ApplicationFiled: June 13, 2007Publication date: October 1, 2009Applicant: Braggone OyInventor: Ari Kärkkäinen
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Publication number: 20090203839Abstract: A silicon polymer material, which has a silicon polymer backbone with chromophore groups attached directly to at least a part of the silicon atoms, the polymer further exhibiting carbosilane bonds. The film forming composition and resulting coating properties can be tailored to suit the specific exposure wavelength and device fabrication and design requirements. By using two different chromophores the refractive index and the absorption co-efficient can be efficiently tuned. By varying the proportion of carbosilane bonds, and a desired Si-content of the anti-reflective coating composition can be obtained.Type: ApplicationFiled: June 13, 2007Publication date: August 13, 2009Applicant: Braggone OyInventor: Ari Karkkainen
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Publication number: 20090142694Abstract: A siloxane composition and a method of producing the Same. The composition comprises a siloxane prepolymer with a backbone exhibiting a group which is capable of being deprotonated in an aqueous base solution. Further, there are reactive functional groups, which are capable of reacting during thermal or radiation initiated curing. The siloxane polymer is provided in a solvent which also contains a photo reactive compound. The composition can be used in negative tone lithographic fabrication processes where a water based developer system is applied in the development step of the lithography process.Type: ApplicationFiled: November 30, 2007Publication date: June 4, 2009Applicant: BRAGGONE OYInventors: Ari Karkkainen, Milja Hannu-Kuure, Sacha Legrand, Admir Hadzic, Graeme Gordon
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Publication number: 20080284320Abstract: The invention is based on the idea of providing a light emitting diode (OLED) device which contains a substrate with a photonic crystal, whereby the formed film structure induces enhancement of the liberation of photons trapped inside the light emitting device structure. The photonic crystal structure is a film structure on a substrate produced using a combination of high and low refractive index materials, at least one of the materials being based on a liquid phase deposited metal-oxide or metalloid oxide material. By means of the invention light trapped due to total internal reflection in a waveguide acting light emitting structure can be extracted efficiently from the device by introducing the photonic crystal device structure between the substrate and conductive anode layer.Type: ApplicationFiled: June 15, 2006Publication date: November 20, 2008Applicant: BRAGGONE OYInventor: Ari Karkkainen
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Patent number: 7393560Abstract: Organo-tin compound having the formula I: [R—(Y)a]b—SnX4-b wherein R stands for a polycyclic hydrocarbyl residue which optionally carries one or several substituents; Y stands for a bivalent linker group; X represents a hydrolysable group; a is an integer 0 or 1; and b is an integer 1 or 2. The preferably stands for an unsubstituted or substituted fused hydrocarbon ring system selected from naphthalene, antracene, phenanthrene, and pentacene. The novel compounds are useful for producing polymers which can be employed as thin film materials in optoelectronic devices.Type: GrantFiled: May 2, 2006Date of Patent: July 1, 2008Assignee: Braggone OYInventors: Milja Hannu-Kuure, Ari Kärkkäinen
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Publication number: 20060263621Abstract: Organo-tin compound having the formula I: [R—(Y)a]b—SnX4-b wherein R stands for a polycyclic hydrocarbyl residue which optionally carries one or several substituents; Y stands for a bivalent linker group; X represents a hydrolysable group; a is an integer 0 or 1; and b is an integer 1 or 2. The preferably stands for an unsubstituted or substituted fused hydrocarbon ring system selected from naphthalene, antracene, phenanthrene, and pentacene. The novel compounds are useful for producing polymers which can be employed as thin film materials in optoelectronic devices.Type: ApplicationFiled: May 2, 2006Publication date: November 23, 2006Applicant: Braggone OyInventors: Milja Hannu-Kuure, Ari Karkkainen
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Patent number: 7094709Abstract: The present invention relates to metal oxide coating materials that can be used as thin film thin film coatings on various substrate surfaces. The invention also concerns a method of making metal oxide material which are stable in aqueous phase and that can be deposited on a substrate by liquid phase deposition, such as spin-on deposition. The new materials can be patterned lithographically or non-lithographically and are applicable for building up various electronic and opto-electronic device structures, such as anti-reflection layers, high-k interlayer and gate oxide structures for ICs, etch stop layer, CMP stop layer, solar cells, OLEDs packaging, optical thin film filters, optical diffractive grating applications and hybrid thin film diffractive grating structures.Type: GrantFiled: June 15, 2004Date of Patent: August 22, 2006Assignee: Braggone OyInventor: Ari Kärkkäinen