Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.
Type:
Grant
Filed:
December 28, 2004
Date of Patent:
October 3, 2006
Assignee:
Brion Tecnologies, Inc.
Inventors:
Jun Ye, Yen-Wen Lu, Yu Cao, Luoqi Chen, Xun Chen