Abstract: The present invention relates to a filter substrate for filtering and optically characterizing microparticles. The filter substrate comprises a wafer having a thickness of at least 100 pm and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. Furthermore, the surface of the front side and/or the surface of the rear side of the wafer is completely or partially provided with an antireflective layer, which prevents the optical reflection of radiation in the wavelength range of 200 nm to 10000 nm. Moreover, the wafer has, at least in some regions, filter holes having a diameter of 1 pm to 5 mm. With the filter substrate according to the invention, microparticles can be filtered and the microparticles on the filter substrate can be subsequently optically characterized with very high measurement quality.
Type:
Grant
Filed:
April 11, 2019
Date of Patent:
January 23, 2024
Assignees:
FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V., HOCHSCHULE ANHALT (FH), BUNDESANSTALT FÜR MATERIALFORSCHUNG UND-PRÜFUNG (BAM)
Inventors:
Christian Hagendorf, Kai Kaufmann, Ulrike Braun
Abstract: The present invention relates to a filter substrate for filtering and optically characterizing microparticles. The filter substrate comprises a wafer having a thickness of at least 100 pm and a transmittance of at least 10% for radiation in the wavelength range of 2500 nm to 15000 nm. Furthermore, the surface of the front side and/or the surface of the rear side of the wafer is completely or partially provided with an antireflective layer, which prevents the optical reflection of radiation in the wavelength range of 200 nm to 10000 nm. Moreover, the wafer has, at least in some regions, filter holes having a diameter of 1 pm to 5 mm. With the filter substrate according to the invention, microparticles can be filtered and the microparticles on the filter substrate can be subsequently optically characterized with very high measurement quality.
Type:
Application
Filed:
April 11, 2019
Publication date:
November 25, 2021
Applicants:
Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V., Hochschule Anhalt (FH), Bundesanstalt für Materialforschung und -prüfung (BAM)
Inventors:
Christian HAGENDORF, Kai KAUFMANN, Ulrike BRAUN
Abstract: A reinforcement element, comprises at least one sensor fiber adapted for strain measurements based on stimulated Brillouin scattering within said sensor fiber.
Type:
Grant
Filed:
May 16, 2007
Date of Patent:
June 12, 2012
Assignee:
Bundesanstalt für Materialforschung und -Prüfung (BAM)
Inventors:
Wolfgang Habel, Katerina Krebber, Elke Thiele, Rolf Arnold, Rainer Glötzl
Abstract: A monitoring unit for a measuring instrument (100) with a pointer (120) and a face (110), pointer (120) and face (110) having mutually differing reflection behaviors for light, comprising at least one first detecting means (210) with a light source (220) and a sensor (230), and at least one fastening means (250) for fastening the detecting means (210) on the measuring instrument (100), it being possible to arrange the detecting means (210) with the aid of the fastening means (250) such that the first sensor (230) can pick up light (228) reflected by the measuring instrument (100) that was emitted by the first light source (220).
Abstract: A reinforcement element, comprises at least one sensor fiber adapted for strain measurements based on stimulated Brillouin scattering within said sensor fiber.
Abstract: Testing machine for the mechanical testing of material samples comprising a first and a second force engagement device, a first and a second sample engagement device, a first force measuring device which is positioned between the first sample engagement device on the one hand and the force by-pass device together with the first force engagement device on the other hand, an actuator to create the force to be applied, a force by-pass device which is connected to the first force engagement device and which tranfers an applied prestress force acting on one of the force engagement devices to the other while by-passing the sample positioned between the two sample engagement devices, whereby the force by-pass device is stiff, the second sample engagement device is, by way of a length adjustment device, slidably mounted in the direction of the application of force relative to the end of the force by-pass device which is not connected to a force engagement device and whereby the length adjustment device is connected t
Type:
Grant
Filed:
April 6, 1990
Date of Patent:
April 9, 1991
Assignee:
Bundesanstalt fur Materialforschung und -prufung (BAM)