Abstract: A method for the production of electrodes, especially microelectrodes, in which the (micro) electrode consists essentially of an electrically-insulating material through which apertures are formed to reveal the electrically-conducting material, is characterized in that aperture as formed by the use of a light-hardened (photopolymerizing) resist or light-softened (photoinduced breaking of bonds) resist.
Type:
Grant
Filed:
January 27, 1997
Date of Patent:
February 1, 2000
Assignee:
Cambridge Sensors Ltd.
Inventors:
Stephen Charles Williams, Peter Thomas Arnold, Bernadette Yon-Hin