Patents Assigned to Canon Kabushiki Kaisha/Applied Materials Japan Inc.
  • Patent number: 5728278
    Abstract: A plasma processing apparatus has a vacuum container which contains a pair of electrodes for causing a discharge for generating a plasma, and a shielding plate for separating a plasma processing region including a space between the electrodes from a region in contact with the inner wall of the vacuum container in such a manner that both the regions communicate with each other. The apparatus includes a means for causing a pressure difference between the plasma processing region and the region in contact with the inner wall of the vacuum container.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: March 17, 1998
    Assignee: Canon Kabushiki Kaisha/Applied Materials Japan Inc.
    Inventors: Nobuyuki Okamura, Atsushi Yamagami, Tadahiro Ohmi, Haruhiro Harry Goto, Tadashi Shibata