Abstract: Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like). In certain embodiments, the ion sources, systems and methods can enhance the ability to make tips having desired physical attributes (e.g., the number of atoms on the apex of the tip). This can enhance performance (e.g., increase reliability, stability and the like).

Abstract: Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less.

Abstract: Disclosed are systems (2000) and a method for aligning a charged particle beam (2100) in charged particle optics that include a charged particle source (2010) and a charged particle optical column (2040), where at least one electrode (2050, 2060) of the column includes a plurality of segments, and where different electrical potentials are applied to at least some of the segments to correct for source (2010) till and/or displacement errors and to align particle beam (2100) a long axis (2045) of the column (2040). Alternatively, magnetic field-generating elements can be used for aligning.

Abstract: Ion microscope methods and systems are disclosed. In general, the systems and methods involve relatively light isotopes, minority isotopes or both. In some embodiments, He-3 is used.

Abstract: Systems and methods to detect electrons from one or more samples are disclosed. In some embodiments, the systems and methods involve one or more magnetic field sources, for deflecting secondary electrons emitted from the surface of the samples.

Abstract: The disclosure relates to sample inspection using an ion-beam microscope. In some embodiments, the disclosure involves the use of multiple detectors, each of which provides different information about a sample.