Patents Assigned to Carl-Zeiss-Shiftung
  • Projection lens, in particular for microlithography
    Patent number: 6867923
    Abstract: A projection lens (3), in particular for microlithography, is provided with an object plane (7), with an image plane (9), with a lens arrangement (4) and with at least one gas chamber filled with gas or through which gas flows. The gas chamber is constructed as an approximately plane-parallel manipulation chamber (13). The refractive index can be varied in the manipulation chamber (13) by pressure changes and/or changes in gas composition.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: March 15, 2005
    Assignee: Carl-Zeiss-Shiftung
    Inventors: Wolfgang Singer, Karl-Heinz Schuster