Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.

Abstract: A method comprises transporting a first stream of a carrier gas to a delivery device that contains a liquid precursor compound. The method further comprises transporting a second stream of the carrier gas to a point downstream of the delivery device. The first stream after emanating from the delivery device and the second stream are combined to form a third stream, such that the dew point of the vapor of the liquid precursor compound in the third stream is lower than the temperature of the plumbing that transports the vapor to a CVD reactor or a plurality of CVD reactors. The flow direction of the first stream, the flow direction of the second stream and the flow direction of the third stream are unidirectional and are not opposed to each other.

Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.

Abstract: Disclosed herein is a delivery device comprising a chamber; a gas inlet; a gas outlet; and a dip tube contained within the chamber and having an upper portion and a lower portion, the upper portion of the dip tube being in fluid communication with the gas inlet and being operative to permit the entry of a carrier gas; the lower portion of the dip tube extending into the chamber, the lower portion of the dip tube terminating in an outlet end; and a sleeve; where the sleeve has a first end and a second end; the first end being in an interference fit with the lower portion of the dip tube; and where the sleeve vibrates upon being subjected to a disturbance.

Abstract: A liquid mass measurement and fluid transmitting apparatus includes a container for measurement of a mass of fluid therein. A sensor is coupled to the container which measures a mass of fluid within the container independent of variations of pressure within the container. A diaphragm sensor may be located on the bottom of the container whereby electrical signals representing the mass of fluid within the cylinder are created by movement of the diaphragm caused by the mass of fluid thereon. A pressure equalizer which equalizes the pressure within the container to the pressure on the opposite side of the diaphragm allows the measurement of the mass to occur independent of any variations and pressure within the container. Liquid within the mass of liquid within the container can be accurately measured such that a desired mass of liquid may be transmitted for further use. The liquid may be vaporized and transmitted as a vapor.

Abstract: A thermal shield for an XRF measurement tool is formed from a heat shield and a heat shield cowling. These components protect the X-ray head assembly that includes the x-ray generation and detection columns and the head control electronics, communications and cooling systems. The heat shield is directly below the X-ray head, parallel to the x-ray head plane and plane of the PV substrate, and perpendicular to the primary beam output from the x-ray head. The heat shield is fabricated of machined copper with several ports machined through the shield. These ports provide a path for primary beam x-rays through the heat shield and for the return of fluoresced X-rays from the PV substrate back to the detector in the X-ray head, while preventing damage to the X-ray head due to the heat emitted from the PV substrate.

Abstract: An X-ray metrology system for a vacuum deposition chamber includes a vacuum interface assembly mounted through an aperture in the exterior wall of the chamber and extending into the interior of the chamber. The interface assembly is formed from a housing having side walls and a bottom forming an interior chamber, and an X-ray port mounted in an aperture in the bottom of the housing. The X-ray port has two apertures therethrough, with each aperture being covered by a window of beryllium. An X-ray metrology machine having a generator and detector is disposed within the housing, and the apertures in the X-ray port are arranged so that X-rays generated by the generator pass through one of the apertures, and X-rays fluorescing off of a substrate in the deposition chamber travel through the other aperture to the detector.

Abstract: Compositions of the current invention are directed toward inhibiting the growth of microorganisms, particularly fungi. The compositions consist of chemically-synthesized antibiotics comprising certain amino acids. Methods of identifying particular antibiotic compositions from libraries of such compositions are disclosed. In addition, methods for preventing microbial growth in plants and animals are disclosed.