Abstract: A method and apparatus provides a resource capable of affecting the manufacture of a product to a bay and a chase. Clean resource is supplied to the bay where it is used to affect the manufacture of a product in one or more steps highly sensitive to contaminants in the resource. The resource contaminated by the manufacture of the product is then sent to a chase where it is further used to affect the manufacture of the same or a different product in steps that are less sensitive to the contamination of the resource. Because the bay is most sensitive to contaminants in the resource, the impurified resource received at the chase may not adversely affect the manufacture of products in the chase and thus, supplying a clean resource to the chase is unnecessary.

Abstract: A make-up air handler controls temperature, humidity and/or cleanliness of air. The make-up air handler includes a direct expansion chiller system. The direct expansion chiller may be integral to the make-up air handler or remote. A clean room facility uses the make-up air handler to supply air to a clean room. The make-up air handler includes a primary cooling coil and a direct expansion chiller system, and may include a humidifier and a filter. The direct expansion chiller system includes an air stream cooling coil and an air stream heating coil. The heating and cooling coils use a refrigeration fluid which is compressed and circulated by a compressor. Humidity is controlled by removing moisture which is condensed from the air stream by a primary cooling coil and the air stream cooling coil of the direct expansion chiller system. The energy removed by the air stream cooling coil is reintroduced to the air stream by the air stream heating coil. The process of removing moisture directly removes contamination.

Abstract: A method and apparatus provides a resource capable of affecting the manufacture of a product to a bay and a chase. Clean resource is supplied to the bay where it is used to affect the manufacture of a product in one or more steps highly sensitive to contaminants in the resource. The resource contaminated by the manufacture of the product is then sent to a chase where it is further used to affect the manufacture of the same or a different product in steps that are less sensitive to the contamination of the resource. Because the bay is most sensitive to contaminants in the resource, the impurified resource received at the chase may not adversely affect the manufacture of products in the chase and thus, supplying a clean resource to the chase is unnecessary.