Patents Assigned to CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
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Patent number: 11746085Abstract: The present invention discloses a triphenylsulfonium salt compound as shown in the general formula (I), wherein R1 represents an electron-withdrawing group and R2 represents an amplification group. Said compound shows significantly enhanced solubility and photosensitivity compared with unsubstituted triphenylsulfonium salts, and has significantly advantageous performance compared with prior art improved substitutes.Type: GrantFiled: September 27, 2019Date of Patent: September 5, 2023Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronics Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 11555022Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.Type: GrantFiled: November 5, 2020Date of Patent: January 17, 2023Assignees: CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 11535590Abstract: The present invention provides a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition comprising sulfonium salt photoinitiator, and use thereof. The sulfonium salt photoinitiator has a structure represented by formula (I). By modifying the structure of an existing sulfonium salt photoinitiator, a sulfonium salt photoinitiator having a new structure is obtained, which can exhibits a higher photosensitivity and an excellent as well as characteristics of low odor and low toxicity, when being used in a photocurable composition. This is significantly superior to existing similar photoinitiators.Type: GrantFiled: August 27, 2018Date of Patent: December 27, 2022Assignees: Changzhou Tronly New Electronic Materials Co., Ltd., Changzhou Tronly Advanced Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 11118065Abstract: A fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same. The photoinitiator has a compound having a structure as shown in general formula (I) or a derivative compound thereof. The fluorenylaminoketone photoinitiator may effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and may also have high sensitivity and good deep-layer curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring. A UV photocurable composition containing such a fluorenylaminoketone photoinitiator can have an advantage in terms of high sensitivity, no residue after development, good pattern integrity, no or little odor of coating layers after curing, or excellent yellowing resistance.Type: GrantFiled: February 11, 2018Date of Patent: September 14, 2021Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 11054743Abstract: This invention discloses a fluorene polyfunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing the same, the preparation of the same, and uses of the two. This compound has the advantages of simple synthesis, low cost, and good solubility, and has good application effects in photocurable compositions. Compared with conventional small molecule photoinitiators, it is not only excellent in photoinitiation activity, but also has the advantages such as low mobility, low odor, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution, and excellent adaptation to a substrate, and is very suitable for producing a black matrix having high light-shielding property, a high-precision and high quality color filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.Type: GrantFiled: September 28, 2016Date of Patent: July 6, 2021Assignees: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 10995082Abstract: This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance.Type: GrantFiled: August 1, 2017Date of Patent: May 4, 2021Assignees: Changzhou Tronly New Electronic Materials Co., Ltd., Changzhou Tronly Advanced Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 10976660Abstract: A fluorene-based photoinitiator, a preparation method thereof, a photocurable composition having the same, and use thereof in the field of photocuring are disclosed. In some embodiments, the fluorene-based photoinitiator has a structure represented by Formula I, wherein X is -A-(X?)n, wherein A is selected from a heteroatom which is selected from O, N, or S, X? is selected from a C1-C20 linear alkyl group, a C1-C20 branched alkyl group, a C3-C8 cycloalkyl group, a C1-C10 alkyl group substituted with a C3-C8 cycloalkyl group or one or more of carbon atoms in X? are substituted with a heteroatom, and n is 1 or 2; and R4 is a hydroxy group or a N-morpholinyl group. In some embodiments, the fluorene-based photoinitiator comprises a structure represented by Formula II.Type: GrantFiled: January 28, 2019Date of Patent: April 13, 2021Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO , LTD.Inventor: Xiaochun Qian
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Publication number: 20210053929Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.Type: ApplicationFiled: November 5, 2020Publication date: February 25, 2021Applicants: CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 10906882Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.Type: GrantFiled: January 11, 2019Date of Patent: February 2, 2021Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Publication number: 20200264508Abstract: This invention discloses a fluorene polyfunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing the same, the preparation of the same, and uses of the two. This compound has the advantages of simple synthesis, low cost, and good solubility, and has good application effects in photocurable compositions. Compared with conventional small molecule photoinitiators, it is not only excellent in photoinitiation activity, but also has the advantages such as low mobility, low odor, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution, and excellent adaptation to a substrate, and is very suitable for producing a black matrix having high light-shielding property, a high-precision and high quality color filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.Type: ApplicationFiled: September 28, 2016Publication date: August 20, 2020Applicants: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 10642155Abstract: A hybrid photosensitive resin having a structure represented by general formula (I) and contains an oxetanyl functional group and a (meth)acryloxy functional group. The functional groups are coordinated with each other and the functionality is adjustable and controllable. The hybrid photosensitive resin is highly suitable for radical-cation photocuring systems, there is no problem of polymerization inhibition by oxygen, and its cured film has high hardness, good flexibility, excellent adherence, and excellent heat resistance.Type: GrantFiled: January 11, 2019Date of Patent: May 5, 2020Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 10392462Abstract: Provided is a photosensitive composition containing an oxime-ester photoinitiator. The oxime-ester photoinitiator is a compound as shown in formula (I). The composition has the advantages of high curing speed, small exposure dose, less pollution, energy saving, almost no residue defect, etc., and the thickness, clarity and pattern integrity of a cured film thereof are all excellent.Type: GrantFiled: July 9, 2015Date of Patent: August 27, 2019Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 9815823Abstract: A carbazolyl ketoxime ester type photoinitiator having a structure represented by the formula (I) is disclosed. This photoinitiator has excellent application performance and extremely high photosensitive property, and in particular under exposure lamp sources such as LED, LDI, etc., and it exhibits very high photosensing activity, which is obviously superior to the current products.Type: GrantFiled: January 26, 2014Date of Patent: November 14, 2017Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian
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Patent number: 9637444Abstract: A bisoxime ester photoinitiator as represented by general formula (I). By introducing a bisoxime ester group and a cycloalkylalkyl group into the chemical structure, this photoinitiator not only has excellent performance in aspects of storage stability, photosensitivity, developability, pattern integrity, and the like, but also exhibits obviously improved photosensitivity and thermal stability compared to similar photoinitiators.Type: GrantFiled: March 17, 2015Date of Patent: May 2, 2017Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 9630913Abstract: This present invention discloses a nitro-containing bisoxime ester photoinitiator having a structure represented by general formula (I). This photoinitiator has excellent application performances in terms of storage stability, photosensitivity, developability, pattern integrity, etc., and it has good adaptability to single-wavelength UV-LED light sources and exhibits a photosensitive property, which is obviously superior to those of existing photoinitiators, under the irradiation of UV-LEDs.Type: GrantFiled: March 17, 2015Date of Patent: April 25, 2017Assignees: Changzhou Tronly New Electronic Materials Co., Ltd., Changzhou Tronly Advanced Electronic Materials Co., Ltd.Inventor: Xiaochun Qian
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Patent number: 9383480Abstract: A photocurable acrylate composition, containing a compound of formula (I) as a photoinitiator and the components adapted to the photoinitiator. The photocurable composition has very good storage stability and very high light sensitivity, can be cross-linked and cured at a very low exposure dose, and has a very good curing effect; a film made from the composition has a smooth edge, no defect and scum, and good integrity throughout the whole pattern, and is a high-hardness resist film, and an optical filter made therefrom has high optical transparency and no light leakage.Type: GrantFiled: January 26, 2014Date of Patent: July 5, 2016Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.Inventor: Xiaochun Qian