Abstract: The present invention is to provide a mask blank enabling fabrication of a photomask having a structure where electrostatic breakdown is effectively prevented. To accomplish the object, the invention discloses a mask blank comprising a mask substrate, an electrostatic breakdown prevention film fully covering one side of the mask substrate, and a shading film formed on the electrostatic breakdown prevention film. The electrostatic breakdown prevention film is made of titanium, tantalum, titanium compound or tantalum compound. The transparent rate of the electrostatic breakdown prevention film is not less than 75%, for the wavelength of light in an exposure. The sheet resistance of the electrostatic discharge prevention film is not more than 100K?/?.

Abstract: The present invention is to provide a mask blank enabling fabrication of a photomask having a structure where electrostatic breakdown is effectively prevented. To accomplish the object, the invention discloses a mask blank comprising a mask substrate, an electrostatic breakdown prevention film fully covering one side of the mask substrate, and a shading film formed on the electrostatic breakdown prevention film. The electrostatic breakdown prevention film is made of titanium, tantalum, titanium compound or tantalum compound. The transparent rate of the electrostatic breakdown prevention film is not less than 75%, for the wavelength of light in an exposure. The sheet resistance of the electrostatic discharge prevention film is not more than 100K?/?.

Abstract: A carrier for a flat photomask substrate having peripheral edges comprises a frame, a handle, a shaft, primary rings, and a spring. The frame has two ends, a periphery, and a shape with one side open. The handle has two ends and is journaled to one of the two ends of the frame. The shaft is provided through the one end of the frame and one end of the handle. This shaft allows the one end of the frame to pivot in a freely rotatable manner about the one end of the handle. The primary rings are arranged at the other end of the frame and at the one end of the handle. Such primary rings support the peripheral edges of the flat photomask substrate. The spring extends between the one end of the frame and the one end of the handle. This spring presses the primary rings into contact with the peripheral edges of the flat photomask substrate.