Patents Assigned to Cryogenic and Vacuum Technology Limited
  • Manifold assembly
    Patent number: 4869284
    Abstract: A gas handling manifold for use in metal-organic chemical vapor deposition systems, the manifold having a radial configuration with each vent/run valve equidistant from the center. Ensuring that gases switched simultaneously arrive in a reactor vessel substantially simultaneously, alleviating problems caused by intermediate reactions in the manifold. The manifold has minimal unflushed area (dead volumes) allowing incompatible materials to be handled in tandem.
    Type: Grant
    Filed: August 28, 1987
    Date of Patent: September 26, 1989
    Assignees: Plessey Overseas Limited, Cryogenic and Vacuum Technology Limited
    Inventors: Darak M. Scott, Richard Davies