Abstract: A vacuum chemical epitaxy apparatus comprising a first mixing chamber having an inlet for introducing a metal-organic gaseous materials and n-type and p-type dopants, and a plurality of outlets for directing the flow of said metal-organic gases and n-type and p-type dopants toward a substrate; a second mixing chamber disposed below said first chamber having an inlet for introducing a metal-organic gaseous material and n-type and p-type dopants, and a plurality of passages through said first chamber and an outlet for each passage, wherein the passage outlets are in substantially the same plane with the outlets of the first chamber; and means for exhausting the metal-organic gaseous materials and n-type and p-type dopants from the second chamber.

Abstract: An injection block having a plurality of geometrically arranged injection sources for gaseous Group III metal organic compounds is oriented substantially perpendicular to the placement of at least one semiconductor wafer substrate within a vacuum reaction chamber. The injector sources are sized to provide disbursing flow of the compounds capable of depositing a layer of about 5% uniform thickness or less over substantially the entire semiconductor wafer. An injection source of Group V compounds is located centrally within the geometrically arranged injection sources for the Group III compounds. The Group V injection source is sized to supply an excess of the Group V compounds required to react with the Group III compounds in order to form Group III-V semiconductor layers on the substrate and partition the Group III sources into groups having substantially equal numbers of injection sources. An excess of Group V comounds is injected.

Abstract: A heater apparatus particularly suitable for use in a vacuum deposition apparatus is disclosed. The heater apparatus contains an open structure surrounding the heating element to permit quick evacuation of the apparatus and avoid memory problems attendant with sealed heater tubes used in a high vacuum environment which is repeatedly cycled from vacuum to ambient pressure.

Abstract: Contacting a mixture of hydrogen, carbon monoxide and/or carbon dioxide with an intimate mixture of a carbon monoxide and/or carbon dioxide reducing catalyst such as a Fischer-Tropsch catalyst, and a catalyst carrier comprising a metal oxide having a very narrow pore size distribution in the micropores within the range of between 10 and 100 Angstroms, to produce hydrocarbon mixtures useful in the manufacture of gasoline kerosene and light oil.