Patents Assigned to Daito Chemix Corporation
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Patent number: 9573887Abstract: The present invention provides compounds which can regulate VCP activity. The present invention provides the compound of formula (I) (R is as defined in the description) or oxides, esters, prodrugs, pharmaceutically acceptable salts or solvates thereof. The compounds can regulate VCP activity, and thus are useful for treating VCP-mediated diseases such as neurodegenerative diseases.Type: GrantFiled: July 28, 2011Date of Patent: February 21, 2017Assignees: Daito Chemix Corporation, Kyoto UniversityInventors: Akira Kakizuka, Seiji Hori, Toshiyuki Shudo, Tomohiro Fuchigami
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Patent number: 9206129Abstract: The present invention provides agents effective to treat eye diseases, pharmaceutical compositions comprising them, methods for preparing pharmaceuticals for treatment of eye diseases comprising using the agents, use of the agents in manufacture of pharmaceuticals for treatment of eye diseases and methods for treating eye diseases comprising administering the agents or the pharmaceutical compositions. The eye diseases treated by the present invention include particularly glaucoma, especially normal tension glaucoma, or retinitis pigmentosa. The present invention provides the compound of formula (I) wherein R is as defined in the description.Type: GrantFiled: September 30, 2011Date of Patent: December 8, 2015Assignees: Daito Chemix Corporation, Kyoto UniversityInventors: Akira Kakizuka, Seiji Hori, Hanako Ikeda, Nagahisa Yoshimura, Noriko Nakano, Toshiyuki Shudo, Tomohiro Fuchigami
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Publication number: 20150259321Abstract: According to an embodiment of the present invention, there is provided a novel fluorene-based compound and a photopolymerization initiator using the fluorene-based compound. The fluorene-based compound according to an embodiment of the present invention is represented by the general formula (1). A photopolymerization initiator having additionally high sensitivity can be provided by using the fluorene-based compound. In addition, a photopolymerization initiator that can impart additionally excellent characteristics can be provided by appropriately selecting, for example, a substituent.Type: ApplicationFiled: September 20, 2013Publication date: September 17, 2015Applicant: DAITO CHEMIX CORPORATIONInventors: Makoto Harihara, Tomohiko Yamazaki, Katsuji Kuwamura
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Publication number: 20140148416Abstract: The present invention provides agents effective to treat eye diseases, pharmaceutical compositions comprising them, methods for preparing pharmaceuticals for treatment of eye diseases comprising using the agents, use of the agents in manufacture of pharmaceuticals for treatment of eye diseases and methods for treating eye diseases comprising administering the agents or the pharmaceutical compositions. The eye diseases treated by the present invention include particularly glaucoma, especially normal tension glaucoma, or retinitis pigmentosa. The present invention provides the compound of formula (I) wherein R is as defined in the description.Type: ApplicationFiled: September 30, 2011Publication date: May 29, 2014Applicants: KYOTO UNIVERSITY, DAITO CHEMIX CORPORATIONInventors: Akira Kakizuka, Seiji Hori, Hanako Ikeda, Nagahisa Yoshimura, Noriko Nakano, Toshiyuki Shudo, Tomohiro Fuchigami
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Patent number: 8519073Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.Type: GrantFiled: October 15, 2007Date of Patent: August 27, 2013Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix CorporationInventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
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Patent number: 8324331Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).Type: GrantFiled: December 16, 2009Date of Patent: December 4, 2012Assignee: Daito Chemix CorporationInventors: Toshiharu Shimamaki, Kenji Uenaga
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Publication number: 20100168358Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).Type: ApplicationFiled: December 16, 2009Publication date: July 1, 2010Applicant: DAITO CHEMIX CORPORATIONInventors: Toshiharu SHIMAMAKI, Kenji UENAGA
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Publication number: 20100069590Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.Type: ApplicationFiled: October 15, 2007Publication date: March 18, 2010Applicants: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix CorporationInventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
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Patent number: 7432391Abstract: The present invention is to provide a safe process for the production of tert-butyl N-(2-bromoethyl)carbamate where operation is simple, handling of the final product is easy, working efficiency is good and yield is high. A process for the production of tert-butyl N-(2-bromoethyl)carbamate, characterized in that, 2-bromoethylamine or a salt thereof is made to react with an agent for introducing a tert-butoxy carbonyl group in a water-soluble solvent in the presence of sodium hydroxide and then water as a crystallizing solvent and seed crystals are added to the reaction solution whereby crystals of tert-butyl N-(2-bromoethyl)carbamate are separated out therefrom.Type: GrantFiled: May 24, 2005Date of Patent: October 7, 2008Assignee: Daito Chemix CorporationInventors: Makoto Momomoto, Yoshiaki Suzuki, Minoru Yamagami, Keisuke Matsumoto, Yusuke Sakaguchi
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Patent number: 6153733Abstract: Disclosed is a poly(disulfonyl diazomethane) compound as a class of novel compounds represented by the general formula ##STR1## in which the subscript n is 1 to 5, each R is a monovalent hydrocarbon group and Z is a divalent hydrocarbon group. The invention also discloses a chemical-amplification positive-working photoresist composition which comprises the above mentioned poly(disulfonyl diazomethane) compound as the radiation-sensitive acid-generating agent in combination with a film-forming resin capable of being imparted with increased solubility in an aqueous alkaline solution by the interaction with an acid, such as a polyhydroxystyrene resin of which a part of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups, e.g., tert-butoxycarbonyl groups.Type: GrantFiled: May 13, 1999Date of Patent: November 28, 2000Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix CorporationInventors: Hiroto Yukawa, Waki Ohkubo, Kouki Tamura, Toshiharu Shimamaki, Kei Mori
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Patent number: 5945517Abstract: Proposed is a positive- or negative-working chemical-sensitization photoresist composition having advantages in respect of the contrast and resolution of patterning, photo-sensitivity and cross sectional profile of the patterned resist layer as well as in respect of stability of the latent image formed by pattern-wise exposure to light before post-exposure baking treatment. The composition comprises: (A) 100 parts by weight of a film-forming resinous ingredient which causes a change, i.e. increase or decrease, of solubility in an aqueous alkaline solution by the interaction with an acid; and (B) from 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent which is a diazomethane compound represented by the general formulaR.sup.1 --SO.sub.2 --C(=N.sub.2)--SO.sub.2 --R.sup.2,in which R.sup.1 and R.sup.2 are each, independently from the other, a monovalent cyclic group substituted on the cyclic nucleus by an acid-dissociable group such as a tert-butoxycarbonyl and acetal groups.Type: GrantFiled: July 21, 1998Date of Patent: August 31, 1999Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix CorporationInventors: Kazuyuki Nitta, Kazufumi Sato, Toshiharu Shimamaki, Kunio Hayakawa, Shin-ya Kuramoto