Patents Assigned to Daito Chemix Corporation
  • Patent number: 9573887
    Abstract: The present invention provides compounds which can regulate VCP activity. The present invention provides the compound of formula (I) (R is as defined in the description) or oxides, esters, prodrugs, pharmaceutically acceptable salts or solvates thereof. The compounds can regulate VCP activity, and thus are useful for treating VCP-mediated diseases such as neurodegenerative diseases.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: February 21, 2017
    Assignees: Daito Chemix Corporation, Kyoto University
    Inventors: Akira Kakizuka, Seiji Hori, Toshiyuki Shudo, Tomohiro Fuchigami
  • Patent number: 9206129
    Abstract: The present invention provides agents effective to treat eye diseases, pharmaceutical compositions comprising them, methods for preparing pharmaceuticals for treatment of eye diseases comprising using the agents, use of the agents in manufacture of pharmaceuticals for treatment of eye diseases and methods for treating eye diseases comprising administering the agents or the pharmaceutical compositions. The eye diseases treated by the present invention include particularly glaucoma, especially normal tension glaucoma, or retinitis pigmentosa. The present invention provides the compound of formula (I) wherein R is as defined in the description.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: December 8, 2015
    Assignees: Daito Chemix Corporation, Kyoto University
    Inventors: Akira Kakizuka, Seiji Hori, Hanako Ikeda, Nagahisa Yoshimura, Noriko Nakano, Toshiyuki Shudo, Tomohiro Fuchigami
  • Publication number: 20150259321
    Abstract: According to an embodiment of the present invention, there is provided a novel fluorene-based compound and a photopolymerization initiator using the fluorene-based compound. The fluorene-based compound according to an embodiment of the present invention is represented by the general formula (1). A photopolymerization initiator having additionally high sensitivity can be provided by using the fluorene-based compound. In addition, a photopolymerization initiator that can impart additionally excellent characteristics can be provided by appropriately selecting, for example, a substituent.
    Type: Application
    Filed: September 20, 2013
    Publication date: September 17, 2015
    Applicant: DAITO CHEMIX CORPORATION
    Inventors: Makoto Harihara, Tomohiko Yamazaki, Katsuji Kuwamura
  • Publication number: 20140148416
    Abstract: The present invention provides agents effective to treat eye diseases, pharmaceutical compositions comprising them, methods for preparing pharmaceuticals for treatment of eye diseases comprising using the agents, use of the agents in manufacture of pharmaceuticals for treatment of eye diseases and methods for treating eye diseases comprising administering the agents or the pharmaceutical compositions. The eye diseases treated by the present invention include particularly glaucoma, especially normal tension glaucoma, or retinitis pigmentosa. The present invention provides the compound of formula (I) wherein R is as defined in the description.
    Type: Application
    Filed: September 30, 2011
    Publication date: May 29, 2014
    Applicants: KYOTO UNIVERSITY, DAITO CHEMIX CORPORATION
    Inventors: Akira Kakizuka, Seiji Hori, Hanako Ikeda, Nagahisa Yoshimura, Noriko Nakano, Toshiyuki Shudo, Tomohiro Fuchigami
  • Patent number: 8519073
    Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: August 27, 2013
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
  • Patent number: 8324331
    Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: December 4, 2012
    Assignee: Daito Chemix Corporation
    Inventors: Toshiharu Shimamaki, Kenji Uenaga
  • Publication number: 20100168358
    Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).
    Type: Application
    Filed: December 16, 2009
    Publication date: July 1, 2010
    Applicant: DAITO CHEMIX CORPORATION
    Inventors: Toshiharu SHIMAMAKI, Kenji UENAGA
  • Publication number: 20100069590
    Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.
    Type: Application
    Filed: October 15, 2007
    Publication date: March 18, 2010
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
  • Patent number: 7432391
    Abstract: The present invention is to provide a safe process for the production of tert-butyl N-(2-bromoethyl)carbamate where operation is simple, handling of the final product is easy, working efficiency is good and yield is high. A process for the production of tert-butyl N-(2-bromoethyl)carbamate, characterized in that, 2-bromoethylamine or a salt thereof is made to react with an agent for introducing a tert-butoxy carbonyl group in a water-soluble solvent in the presence of sodium hydroxide and then water as a crystallizing solvent and seed crystals are added to the reaction solution whereby crystals of tert-butyl N-(2-bromoethyl)carbamate are separated out therefrom.
    Type: Grant
    Filed: May 24, 2005
    Date of Patent: October 7, 2008
    Assignee: Daito Chemix Corporation
    Inventors: Makoto Momomoto, Yoshiaki Suzuki, Minoru Yamagami, Keisuke Matsumoto, Yusuke Sakaguchi
  • Patent number: 6153733
    Abstract: Disclosed is a poly(disulfonyl diazomethane) compound as a class of novel compounds represented by the general formula ##STR1## in which the subscript n is 1 to 5, each R is a monovalent hydrocarbon group and Z is a divalent hydrocarbon group. The invention also discloses a chemical-amplification positive-working photoresist composition which comprises the above mentioned poly(disulfonyl diazomethane) compound as the radiation-sensitive acid-generating agent in combination with a film-forming resin capable of being imparted with increased solubility in an aqueous alkaline solution by the interaction with an acid, such as a polyhydroxystyrene resin of which a part of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups, e.g., tert-butoxycarbonyl groups.
    Type: Grant
    Filed: May 13, 1999
    Date of Patent: November 28, 2000
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Hiroto Yukawa, Waki Ohkubo, Kouki Tamura, Toshiharu Shimamaki, Kei Mori
  • Patent number: 5945517
    Abstract: Proposed is a positive- or negative-working chemical-sensitization photoresist composition having advantages in respect of the contrast and resolution of patterning, photo-sensitivity and cross sectional profile of the patterned resist layer as well as in respect of stability of the latent image formed by pattern-wise exposure to light before post-exposure baking treatment. The composition comprises: (A) 100 parts by weight of a film-forming resinous ingredient which causes a change, i.e. increase or decrease, of solubility in an aqueous alkaline solution by the interaction with an acid; and (B) from 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent which is a diazomethane compound represented by the general formulaR.sup.1 --SO.sub.2 --C(=N.sub.2)--SO.sub.2 --R.sup.2,in which R.sup.1 and R.sup.2 are each, independently from the other, a monovalent cyclic group substituted on the cyclic nucleus by an acid-dissociable group such as a tert-butoxycarbonyl and acetal groups.
    Type: Grant
    Filed: July 21, 1998
    Date of Patent: August 31, 1999
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Kazuyuki Nitta, Kazufumi Sato, Toshiharu Shimamaki, Kunio Hayakawa, Shin-ya Kuramoto