Patents Assigned to Dendritech Incorporated
  • Patent number: 6077500
    Abstract: Higher generation radially layered copolymeric dendrimers having a hydrophilic poly(amidoamine) or a hydrophilic poly(propyleneimine) interior and a hydrophobic organosilicon exterior are prepared by first reacting a hydrophilic dendrimer having --NH.sub.2 surface groups with an organosilicon compound, and then hydrosilating the resulting copolymeric dendrimer with another organosilicon compound in the presence of a noble metal catalyst. In an alternate embodiment, the radially layered copolymeric dendrimers are prepared by reacting a hydrophilic dendrimer having --NH.sub.2 surface groups directly with an organosilicon dendron or organosilicon hyperbranched polymer.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: June 20, 2000
    Assignees: Dow Corning Corporation, Dendritech, Incorporated
    Inventors: Petar R. Dvornic, Agnes M. deLeuze-Jallouli, Michael James Owen, Susan Victoria Perz
  • Patent number: 5714166
    Abstract: Dendritic polymer conjugates which are composed of at least one dendrimer in association with at least one unit of a carried material, where the carrier material can be a biological response modifier, have been prepared. The conjugate can also have a target director present, and when it is present then the carried material may be a bioactive agent. Preferred dendritic polymers are dense star polymers, which have been complexed with biological response modifiers. These conjugates and complexes have particularly advantageous properties due to their unique characteristics.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: February 3, 1998
    Assignees: The Dow Chemical Company, Dendritech Incorporated, The Regents of the University of Michigan
    Inventors: Donald A. Tomalia, James R. Baker, Roberta C. Cheng, Anna U. Bielinska, Michael J. Fazio, David M. Hedstrand, Jennifer A. Johnson, Donald A. Kaplan, deceased, Scott L. Klakamp, William J. Kruper, Jr., Jolanta Kukowska-Latallo, Bartley D. Maxon, Lars T. Piehler, Ian A. Tomlinson, Larry R. Wilson, Rui Yin, Herbert M. Brothers, II