Patents Assigned to Diafoil Hoechst Company, Ltd.
  • Patent number: 5863641
    Abstract: A biaxially orientated polyester film for sublimitation type thermal transfer printing having a coating layer and a sublimation type ink layer formed on the coating layer. The coating layer comprises an aqueous acrylic resin (A), an aqueous polyester (B) and an aqueous epoxy compound (C), weights of which satisfy the relationships: (1) 0.30.ltoreq.W.sub.A .ltoreq.0.90, (2) 0.10.ltoreq.W.sub.B .ltoreq.0.50, (3) 0.05.ltoreq.W.sub.C .ltoreq.0.30, and (4) 0.25.ltoreq.W.sub.C /W.sub.B .ltoreq.2 in which W.sub.A, W.sub.B and W.sub.C are weight ratios of the aqueous acrylic resin (A), the aqueous polyester (B), and the aqueous epoxy compound (C), respectively based the whole weight of the coating layer.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: January 26, 1999
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventors: Seiji Sakamoto, Jun Takahashi
  • Patent number: 5670236
    Abstract: A biaxially oriented polyester film for a magnetic recording medium contains: 1) at least two different sizes of synthetic calcium carbonate particles; and 2) aluminum oxide particles to produce a film with excellent surface uniformity, running properties, and slittability wherein the film generates few scratches and low amounts of abrasion dust. The synthetic calcium carbonate particles are surface treated with a polycarboxylic acid, followed by treatment with a phosphorus compound. The biaxially oriented polyester film can comprise a layer in a multilayer film.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: September 23, 1997
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventors: Tomoyuki Kotani, Kazuo Endo, Seiji Sakamoto, Takashi Harada, Narihiro Masuda, Masashi Inagaki, Chikakazu Kawaguchi
  • Patent number: 5648159
    Abstract: The disclosure describes a dry resist comprising:a biaxially oriented laminated polyester film whose surface layer on at least one side contains particles having an average particle diameter of 0.01 to 3.0 .mu.m, and has a center line average roughness of not less than 0.005 .mu.m and a maximum height of less than 1.5 .mu.m, and which has a haze of not more than 1.5%;a photoresist layer formed on said biaxially oriented laminated polyester film; anda protective film formed on said photoresist layer.
    Type: Grant
    Filed: June 12, 1995
    Date of Patent: July 15, 1997
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventor: Yoshinori Sato
  • Patent number: 5466521
    Abstract: Disclosed is a film for high heat-sensitive stencil paper, comprising a biaxially oriented film having a thickness of 0.5 to 6.0 .mu.m and formed from a polyester composition comprising polybutylene terephthalate and another polyester,a ratio of the polybutylene terephthalate in the whole polyester being 20 to 80 wt %, a maximum value of average heat shrinkage stresses in the machine and transverse directions of the film measured at a film temperature of 60.degree. to 140.degree. C. being more than 300 g/mm.sup.2, and a heat shrinkage of the film by treatment at 100.degree. C. for 3 minutes being not less than 20%.
    Type: Grant
    Filed: March 23, 1994
    Date of Patent: November 14, 1995
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventors: Yoshinori Sato, Megumi Komiyama, Kazuo Endo, Masashi Tate
  • Patent number: 5370930
    Abstract: A polyester film having a coating layer provided with excellent mold release property, slipperiness, heat resistance and flatness is disclosed.The laminated polyester film is prepared by applying at least on one surface of a polyester film an aqueous solution or dispersion containing a polysiloxane-polyvinyl graft copolymer which comprises a silane comprising structural units of the formulas (1) and (2) indicated below or the hydrolysate thereof and in which not less than 80 wt % of the siloxane portions are dimethylsiloxane, and, thereafter, stretching and drying.R.sup.1.sub.n SiO.sub.(4-n)/2 (1)R.sup.2.sub.m SiO.sub.(3-m)/2 --A--B (2)wherein R.sup.1 and R.sup.2 are respectively and independently an unsubstituted or substituted hydrocarbyl group which has a carbon atom directly connected to the Si atom and has no radical polymerizability; n is 1 or 2 and when n is 2 R.sup.
    Type: Grant
    Filed: November 6, 1992
    Date of Patent: December 6, 1994
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventor: Yoshihiko Ito
  • Patent number: 5360665
    Abstract: A novel film material for thermal stencil sheets is disclosed. The film comprises a biaxially stretched polyester film which contains 0.1-5.0% of fine particles having an average diameter of 0.05-2.0 .mu.m and has a melting point of 170.degree.-230.degree. C. and a thickness of 0.5-2.5 .mu.m and the maximum value of an average longitudinal and transversal thermal construction stress of the film at a temperature of 100.degree.-160.degree. C. is 500-1500 g/mm.sup.2. The film for heat-sensitive mimeographic printing stencil sheets of the present invention is excellent in handling property sensitivity to thermal perforation, resolution in printing, tone property and curling resistance and thus the invention is industrially very significant.
    Type: Grant
    Filed: August 20, 1992
    Date of Patent: November 1, 1994
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventors: Yoshinori Sato, Yoshitugu Funada, Yoshitaka Houseki, Koji Nagura
  • Patent number: 5324574
    Abstract: A novel biaxially stretched polyester film having excellent transparency and slipperiness is disclosed. The biaxially stretched polyester comprises a polyester composition which exhibits a film haze of not more than 1% after it is made into a film having a thickness of 100 .mu.m and 50-500 ppm on the basis of the weight of monodispersed cross-linked high polymer particles having an average particle diameter of 0.8-1.4 .mu.m and exhibits a deformability of 1.2-5.0 in a biaxially stretched polyester film.
    Type: Grant
    Filed: April 23, 1992
    Date of Patent: June 28, 1994
    Assignee: Diafoil Hoechst Company, Ltd.
    Inventors: Seiji Sakamoto, Chikakazu Kawaguchi, Takahashi Harada