Patents Assigned to Dynamic Micro System Semiconductor Equipment GmbH
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Patent number: 10672633Abstract: The present invention discloses apparatuses and method for configuring a compartmentable equipment to accommodate emergency responses. An exemplary equipment comprises a plurality of removable compartments for storing workpieces so that in emergency events, such as power failure or equipment failure, the workpieces can be removed from the equipment for continuing processing without disrupting the flow of the fabrication facility. The compartmentable equipment can comprise emergency access ports, including mating interface to a portable workpiece removal equipment to allow accessing the individual compartments without compromising the quality, defects and yield of the workpieces stored in the stocker.Type: GrantFiled: June 16, 2014Date of Patent: June 2, 2020Assignee: DYNAMIC MICRO SYSTEMS SEMICONDUCTOR EQUIPMENT, GmbHInventor: Lutz Rebstock
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Publication number: 20140356546Abstract: Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.Type: ApplicationFiled: August 4, 2014Publication date: December 4, 2014Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Lutz Rebstock, Klaus Conrad Wolke
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Patent number: 8868229Abstract: A buffer station provides potential improvement for the operation of a facility. By storing to-be-accessed workpieces in the buffer stations of an equipment, the operation of the facility is not interrupted when the equipment is down. The workpieces can be retrieved through emergency access port of the buffer station, thus ensure the continuous supply of workpieces for the workpiece flow of the facility. Algorithm for getting the needed workpieces to the buffer station is also provided through a controller or a computer mechanism. The buffer station can be incorporated in a stocker, such as wafer stocker or reticle stocker.Type: GrantFiled: July 25, 2007Date of Patent: October 21, 2014Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20140259498Abstract: Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.Type: ApplicationFiled: June 2, 2014Publication date: September 18, 2014Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Lutz Rebstock, Klaus Conrad Wolke
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Publication number: 20140261164Abstract: Coating rollers accepting liquid media provide liquid chemicals to substrates for depositing a thin coating layer on the flat substrates, such as semiconductors or panels. The liquid media is cooled to a life-preserving temperature while shielded from the thermal energy heating the substrates to prevent degrading the liquid media. Physical barrier or temperature barrier can be established in vicinities of the rollers to further limit exposing the liquid media to high temperature.Type: ApplicationFiled: May 10, 2014Publication date: September 18, 2014Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20140219750Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70 C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: ApplicationFiled: April 11, 2014Publication date: August 7, 2014Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8764370Abstract: Scalable storage can be achieved with linear array storage of wafers, comprising two linear arrays of storage compartments on opposite walls, with a middle transfer mechanism. Together with a buffer station for automatic material handling system, a scalable bare wafer stocker can provide flexible and uninterrupted services to a fabrication facility.Type: GrantFiled: October 30, 2011Date of Patent: July 1, 2014Assignee: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8757026Abstract: A robot with improved cleanliness for use in a clean environment is disclosed, having a uniform flow through the open interface between the clean environment and the interior of the robot housing, passing the particle generation area to an exhaust port, keeping the particles from the clean environment. The uniform flow reduces or eliminates the back flow, and further allows the scalability of the open interface to prevent particles generated from moving mechanisms within the robot housing to contaminate the clean environment. The uniform flow can be established by designing the flow dynamic, centering the exhaust port, or by restricting the flow along the elongated slot, for example, by uniformly restricting the flow along the elongated slot, or by implementing a restrictor along the elongated slot.Type: GrantFiled: April 15, 2008Date of Patent: June 24, 2014Assignee: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: David Barker, Robert T. LoBianco, Bhavesh Amin
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Patent number: 8753063Abstract: The present invention discloses apparatuses and method for configuring a compartmentable equipment to accommodate emergency responses. An exemplary equipment comprises a plurality of removable compartments for storing workpieces so that in emergency events, such as power failure or equipment failure, the workpieces can be removed from the equipment for continuing processing without disrupting the flow of the fabrication facility. The compartmentable equipment can comprise emergency access ports, including mating interface to a portable workpiece removal equipment to allow accessing the individual compartments without compromising the quality, defects and yield of the workpieces stored in the stocker.Type: GrantFiled: June 2, 2011Date of Patent: June 17, 2014Assignee: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8739728Abstract: Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.Type: GrantFiled: April 7, 2011Date of Patent: June 3, 2014Assignee: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Lutz Rebstock, Klaus Conrad Wolke
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Patent number: 8720370Abstract: Coating rollers accepting liquid media provide liquid chemicals to substrates for depositing a thin coating layer on the flat substrates, such as semiconductors or panels. The liquid media is cooled to a life-preserving temperature while shielded from the thermal energy heating the substrates to prevent degrading the liquid media. Physical barrier or temperature barrier can be established in vicinities of the rollers to further limit exposing the liquid media to high temperature.Type: GrantFiled: August 16, 2011Date of Patent: May 13, 2014Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8696042Abstract: In an embodiment, the present invention discloses a EUV cleaner system and process for cleaning a EUV carrier. The euv cleaner system comprises separate dirty and cleaned environments, separate cleaning chambers for different components of the double container carrier, gripper arms for picking and placing different components using a same robot handler, gripper arms for holding different components at different locations, horizontal spin cleaning and drying for outer container, hot water and hot air (70C) cleaning process, vertical nozzles and rasterizing megasonic nozzles for cleaning inner container with hot air nozzles for drying, separate vacuum decontamination chambers for outgassing different components, for example, one for inner and one for outer container with high vacuum (e.g., <10?6 Torr) with purge gas, heaters and RGA sensors inside the vacuum chamber, purge gas assembling station, and purge gas loading and unloading station.Type: GrantFiled: June 23, 2012Date of Patent: April 15, 2014Assignee: DYNAMIC MICRO SYSTEM Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130058743Abstract: The present invention relates to apparatuses and methods to store and transfer objects, and more particularly to workpiece stocker configurations such as stocker for semiconductor wafers, reticles or carrier boxes.Type: ApplicationFiled: September 5, 2011Publication date: March 7, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Patent number: 8376428Abstract: An integrated grip arm comprises a plurality of grippers to accommodate a plurality of reticles and carrier boxes without the need of separate arm or gripper changes. The integrated grip arm can comprise an edge gripper for gripping a reticle or a carrier box at the edges, and a fork gripper for gripping a reticle or a carrier box at a top and a bottom portions. The integrated grip arm can comprise an edge gripper for gripping a wafer from the edges and an end effector for holding a wafer from the bottom. The integrated grip arm can comprise a vertical gripper for gripping a workpiece from a vertical position and a horizontal gripper for gripping a workpiece from a horizontal position.Type: GrantFiled: July 25, 2007Date of Patent: February 19, 2013Assignee: Dynamic Micro System Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130028691Abstract: An integrated robotic mechanism is disclosed for improving transport equipment, integrating an object movement with other functionalities such as alignment or identification. The disclosed integrated robot assembly can comprise a multiple end effector for moving a plurality of workpieces, a single end effector for moving a single workpiece, a rotation chuck incorporated on the robot body to provide alignment capability, and an optional identification subsystem for identify the object during transport. The present invention robot assembly can be used in a sorter or stocker equipment, in processing equipment, and a transfer system.Type: ApplicationFiled: October 1, 2012Publication date: January 31, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventors: Farzad Tabrizi, David Barker
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Publication number: 20130021465Abstract: The present invention discloses apparatuses and methods for simultaneous viewing and reading top and bottom images from a workpiece. The present ID reader can comprise an enclosure covering a top and bottom section of the workpiece with optical elements to guide the light from the workpiece images to a camera. The optical element can be disposed to receive images from a high angle with respect to the surface of the workpiece. The present ID reader can further comprise a light source assembly to illuminate the image. The light source assembly can utilize a coaxial light path with the images, preferably for bright field illumination. The light source assembly can also utilize a non-coaxial light path, preferably for dark field illumination.Type: ApplicationFiled: July 25, 2012Publication date: January 24, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: David Barker
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Publication number: 20130004270Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130000676Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130000254Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock
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Publication number: 20130004268Abstract: In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.Type: ApplicationFiled: June 28, 2012Publication date: January 3, 2013Applicant: Dynamic Micro Systems, Semiconductor Equipment GmbHInventor: Lutz Rebstock