Abstract: Provided is a cup-shaped plating apparatus which can plate the whole area of a plating target surface with a uniform film thickness. In a cup-shaped plating apparatus including a placement portion of an object to be plated which is provided at an opening end of a plating tank, means for supplying a plating solution into the plating tank, a plating solution outlet port which is formed in the plating tank, a cavity portion into which the plating solution which has flown out of the outlet port flows, a plating solution discharge port within the cavity portion, and a collection tank for the plating solution discharged from the discharge port, which subjects the object to be plated to plating treatment while supplying the plating solution into the plating tank, the shape and/or opening area of the discharge port formed on the downstream side of the cavity portion can be changed.

Abstract: An automatic wafer plating equipment for automatically plating wafers and more particularly, for automatically plating a small lot of wafers is disclosed. The automatic wafer plating equipment includes a transfer robot provided with a holding arm for pivoting, vertical movement, extending and extracting, a load stage, an orientation stage, a plating stage, a recovery stage, and a cleaning stage. The transfer robot carries out a series of the following operations for plating process. The wafers are picked up one by one from a supply cassette loaded to the load stage. The wafer is then fed to the orientation stage. The wafer orientated at the orientation stage is conveyed to the plating stage. The plated wafer is transferred from the plating stage to the recovery stage. When residue of a plating liquid has been recovered at the recovery stage, the wafer is conveyed to the cleaning stage.

Abstract: Based on the fact that those portions of a lead frame which are liable to undergo deformation are the to-be-nonplated portions, the to-be-nonplated portions defined around the to-be-plated portions are covered with an adhesive tape or a resin film before the lead frame is subjected to a plating treatment, whereby to prevent deformation of the lead frame from the stage preceding to the surface treating step.

Abstract: A plating device for a wafer employs an air bag 6, 20 as a holding means for downwardly depressing the wafer 8 upon performing plating on the wafer 8. The air bag 6, 20 constrain only the upper surface 13 of the circumferential edge of the wafer at an expanded state and releases the constraint by contracting to restore an initial configuration at a non-expanded state. By this, the holding means will not occupy the upper side space of the wafer both during plating process and during non-plating process so as to avoid adhering of dust and foreign matter onto the wafer 8.

Abstract: This invention provides a platinum alloy electrodeposition bath which, by alloying platinum with other metals, enables thick plating and can give platinum alloy layers having superior luster and hardness, and also provides a process for manufacturing a platinum alloy electrodeposited product using the same.The platinum alloy electrodeposition bath according to this invention contains 2 to 100 g/lit. of platinum in the form of Pt(OH).sub.6.sup.2- complex ion and at least one of Sn, Zn and Pd in an amount of 1 mg/lit or more.

Abstract: While a rectangular sheet is being passed between a masking packing having at least one opening of a configuration corresponding to the selected area of the sheet to be plated and a pressure packing, a jet of plating solution is continuously directed from a nozzle against the masking packing opening or a jet of plating solution is intermittently directed from a specially designed nozzle against the opening in response to the intermittent movement of the rectangular sheet, thereby selectively plating the rectangular sheet in the lengthwise direction continuously or intermittently.

Abstract: Excellent high speed nickel plating is achieved by using insoluble anode, detecting changes in the pH value of the plating bath during the plating operation, and supplying nickel ions to the plating bath in response to the detected changes by forcibly contacting the plating bath with metallic nickel pieces.